Magnetic property and interface structure of Ta/NiO/NiFe/Ta
Data(s) |
2001
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Resumo |
Ta/NiO/NiFe/Ta multilayers, utilizing Ta as buffer layer, were prepared by rf reactive and de magnetron sputtering. The exchange coupling field between NiO and NiFe reached a maximum value of 9.6x10(3) A/m at a NiO film thickness of 50 nm. The composition and chemical states at interface region of Ta/NiO/Ta were studied by using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an "intermixing layer" at the Ta/NiO land NiO/Ta) interface due to a thermodynamically favorable reaction 2Ta + 5NiO = 5Ni + Ta2O5. This interface reaction has a great effect on exchange coupling. The thickness of Ni+NiO estimated by XPS depth. profiles is about 8-10 nm. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Yu GH; Chai CL; Zhu FW; Xiao JM .Magnetic property and interface structure of Ta/NiO/NiFe/Ta ,CHINESE SCIENCE BULLETIN,2001 ,46(5):438-440 |
Palavras-Chave | #半导体物理 #NiO #interface reaction #X-ray photoelectron spectroscopy #exchange coupling #NIO #FILMS #LAYERS |
Tipo |
期刊论文 |