171 resultados para Feyerabend, Paul K.
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文本聚类在信息过滤,网页分类中有着很好的应用。但它面临数据量大,特征维度高的难点。由于K均算法易于实现,对数据依赖度底,在文本聚类中得到应用。然而,传统K均以及它的变种会产生有较大波动的聚类结果。因此对K均算法进行了改进,通过优化聚类初始中心的选择,得到一种适合对文本数据聚类分析的改进算法。大量实验显示,该算法可以生成质量较高而且聚类质量波动性较小的结果。
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The characteristics of K alpha X-ray sources generated by p-polarized femtosecond laser-solid interactions are experimentally studied in the relativistic regime. By use of knife-edge image technique and a single-photon-counting X-ray CCD camera, we obtaine the source size, the spectrum and the conversion efficiency of the Ka X-ray sources. The experimental results show that the conversion efficiency of Ka photons reaches an optimum value of 7.08 x 10(-6)/sr at the laser intensity of 1.6 x 10(18) W/cm(2), which is different from the Reich's simulation results (Reich et al., 2000 Phys. Rev. Lett. 84 4846). We find that about 10% of laser energy is converted into the forward hot electrons at the laser intensity of 1.6 x 10(18) W/cm(2).
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本工作完成了磷酸盐化合物ABLa(PO_4)_2的合成,这些磷盐均可在900 ℃左右合成;对其进行了结构测试与表征,发现这些磷酸盐属于单斜晶系独居石结构,与LaPO_4同构,具有很相近的晶胞参数;系统地研究了RE~(3+)离子(RE = Ce,Tb,Dy)在ABLa(PO_4)_2基质中的发光与能量传递规律,研究了Ce~(3+)、Tb~(3+)离子发光中心与基质晶格之间的相互作用,计算了这些稀土离子之间能量传递的临界距离Rc(dd),结果表明ABLa(PO_4)_2基质中Ce~(3+)离子与基质晶格之间的相互作用属于中等程度耦合,Tb~(3+)离子与基质晶格之间的相互作用属于无辐射多声子过程,Ce~(3+)→Ce~(3+)、Ce~(3+)→Tb~(3+)能量迁移临界距离均与LaPO_4中相近,Ce~(3+) → Ce~(3+)相对于Ce~(3+) → Tb~(3+)属于快过程,Ce~(3+) → Ce~(3+)能量传递对ABLa(PO_4)_2:Ce,Tb荧光体的Tb~(3+)绿色发光起了重要的作用,ABLa(PO_4)_2基质是Ce~(3+),Ce~(3+)-Tb~(3+),Ce~(3+)-Dy~(3+)的优良发光基质;最后探讨了绿色荧光体ABLa(PO_4)_2:Ce,Tb的调制途径,主要研究了Ce~(3+)、Tb~(3+)离子的浓度效应,掺杂B_2O_3、Dy~(3+)、SiO_2对荧光体发光的影响及NH_4Cl的作用,结果表明Ce~(3+)、Tb~(3+)离子的适宜浓度分别为0.2~0.5和0.08~0.2,掺杂适量的B_2O_3、Dy~(3+)能很好地提高荧光体的发光,掺杂SiO_2、NH_4Cl不利荧光体发光。
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The geometrical parameters and electronic structures of C60, (A partial derivative C60) (A = Li, Na, K, Rb, Cs) and (H partial derivative C60) (H = F, Cl, Br, I) have been calculated by the EHMO/ASED (atom superposition and electron delocalization) method. When putting a central atom into the C60 cage, the frontier and subfrontier orbitals of (A partial derivative C60) (A = Li, Na, K, Rb, Cs) and (H partial derivative C60) (H = F, Cl) relative to those of C60 undergo little change and thus, from the viewpoint of charge transfer, A (A = Li, Na, K, Rb, Cs) and H (H = F, Cl) are simply electron donors and acceptors for the C60 cage resPeCtively. Br is an electron acceptor but it does influence the frontier and subfrontier MOs for the C60 cage, and although there is no charge transfer between I and the C60 cage, the frontier and subfrontier MOs for the C60 cage are obviously influenced by I. The stabilities DELTAE(X) (DELTAE(X) = (E(X) + E(C60)) - E(x partial derivative C60)) follow the sequence I < Br < None < Cl < F < Li < Na < K < Rb < Cs while the cage radii r follow the inverse sequence. The stability order and the cage radii order have been explained by means of the (exp-6-1) potential.
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Direct current SQUIDs (superconducting quantum interference devices) have been successfully fabricated by using a Pb-doped BiSrCaCuO superconducting thin film made by mixed evaporation of a single source composed of related components with a resistance heater. The dc SQUID comprises a square washer with a small hole. These SQUIDs show perfectly periodic voltage-flux characteristics without magnetic shield, that is, typically, the flux noise and energy resolution at a frequency range from dc to 1 Hz and at 78 K being 1.7 x 10(-3) PHI-0/ square-root Hz and 3.6 x 10(-26) J/Hz, respectively. Meanwhile, we have found out that one of the SQUIDs still was able to operate on flux-locked mode without bias currents and showed voltage-flux second harmonic characteristics. This phenomenon is not well understood, but it may be related to I-V (current-voltage) characteristics of the dc SQUID.
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A new technique is reported for the rapid determination of interstitial oxygen in heavily Sb-doped silicon. This technique includes wafer thinning and low-temperature 10 K infrared measurement on highly thinned wafers. The fine structure of the interstitial oxygen absorption band around 1136 cm(-1) is obtained. Our results show that this method efficiently reduces free-carrier absorption interference, allowing a high reliability of measurement, and can be used at resistivities down to 1 x 10(-2) Omega cm for heavily Sb-doped silicon.
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The effect of molecular nitrogen exposure on the InP(100) surface modified by the alkali metal K overlayer is investigated by core-level photoemission spectroscopy using synchrotron radiation. The alkali metal covered surface exhibits reasonable nitrogen uptake at room temperature, and results in the formation of a P3N5 nitride complex. Flash annealing at 400 degrees C greatly enhanced the formation of this kind of nitride complex. Above 500 degrees C, the nitride complex dissolved completely. (C) 1997 American Vacuum Society.
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The effect of a potassium overlayer on nitridation and oxidation of the InP(100) surface is investigated by core-level and valence-band photoemission spectroscopy using synchrotron radiation. In comparison with the K-promoted nitridation of the InP(110) surface obtained by cleavage in situ, we found that the promotive effect for the InP(100) surface cleaned by ions bombardment is much stronger and that the nitridation products consist of two kinds of complexes: InPNx and InPNx+y. The results confirmed that surface defects play an important part in the promotive effect. Furthermore, in contrast with K-promoted oxidation of InP(100) where bonding is observed between indium and oxygen, indium atoms did not react directly with nitrogen atoms during the K-promoted nitridation of InP(100). (C) 1995 American Vacuum Society.
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The effect of molecular nitrogen exposure on the surfaces of InP(100) modified by potassium overlayers is investigated by core-level and valence-band photoemission spectroscopy using Synchrotron radiation. In comparison with InP(110) surface, we found the promotion is much stronger for InP(100) surface due to the central role of surface defects in the promotion; furthermore, in contrast with K-promoted oxidation of InP(100) where the bonding is observed between indium and oxygen, indium atoms did not react directly with nitrogen atoms during the K-promoted nitridation of InP(100).
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介绍了一种可用于低温装置内的补偿式光纤位移传感器(CFODS),讨论了该传感器在低温下的输出特性并在液氮温度(77 K)和液氦温度(4.2 K)下进行了实验研究.结果表明,该传感器在液氮温度下的灵敏度0.311 mm~(-1),高于液氦温度下的灵敏度0.278 mm~(-1).
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The K-best detector is considered as a promising technique in the MIMO-OFDM detection because of its good performance and low complexity. In this paper, a new K-best VLSI architecture is presented. In the proposed architecture, the metric computation units (MCUs) expand each surviving path only to its partial branches, based on the novel expansion scheme, which can predetermine the branches' ascending order by their local distances. Then a distributed sorter sorts out the new K surviving paths from the expanded branches in pipelines. Compared to the conventional K-best scheme, the proposed architecture can approximately reduce fundamental operations by 50% and 75% for the 16-QAM and the 64-QAM cases, respectively, and, consequently, lower the demand on the hardware resource significantly. Simulation results prove that the proposed architecture can achieve a performance very similar to conventional K-best detectors. Hence, it is an efficient solution to the K-best detector's VLSI implementation for high-throughput MIMO-OFDM systems.
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随着大规模集成电路的发展,需要一种高介质材料来代替传统的SiO2,介绍了可能替代SiO2的几种二元材料的研究现状,主要包括Si3N4,Ta2O5,TiO2,ZrO2,Y2O3,Gd2O3和CeO2几种材料的结构和电学性能,以及制备薄膜的几种方法;蒸发法,化学气相沉积和离子束沉积。
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该文介绍了一种可以实用的侧墙式GaAs量子线及其列阵结构。沿〔01-1〕方向腐蚀条形的(311)A衬底上,分子束外延生长的各向异性导致了侧墙量子线结构的形成。用光栅刻蚀方法,制备了横向周期为1μm、纵向三层叠加的三维侧墙量子线列阵。阴极荧光谱研究表明
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于2010-11-23批量导入
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国家自然科学基金