92 resultados para CARRIER


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We report on chip-scale optical gates based on the integration of evanescent waveguide unitraveling-carrier photodiodes (EC-UTC-PDs) and intra-step quantum well electroabsorption modulators (IQW-EAMs) on n-InP substrates. These devices exhibit simultaneously 2.1 GHz and -16.2 dB RF-gain at 21 GHz with a 450 Omega thin-film resistor and a bypass capacitor integrated on a chip.

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A rapid algorithm for phase and amplitude reconstruction from a single spatial-carrier interferogram is proposed by bringing a phase-shifting mechanism into reconstruction of a carrier-frequency interferogram. The algorithm reconstructs phase through directly obtaining and integrating its real-value derivatives, avoiding a phase unwrapping process. The proposed method is rapid and easy to implement and is made insensitive to the profile of the interferogram boundaries by choosing a suitable integrating path. Moreover, the algorithm can also be used to reconstruct the amplitude of the object wave expediently without retrieving the phase profile in advance. The feasibility of this algorithm is demonstrated by both numerical simulation and experiment. (c) 2008 Optical Society of America.

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We have investigated the temperature dependence of photoluminescence (PL) properties of a number of self-organized InAs/GaAs heterostructures with InAs layer thickness ranging from 0.5 to 3 ML. The temperature dependence of InAs exciton emission and linewidth was found to display a significant difference when the InAs layer thickness is smaller or larger than the critical thickness around 1.7 ML. The fast redshift of PL energy and an anomalous decrease of linewidth with increasing temperature were observed and attributed to the efficient relaxation process of carriers in multilayer samples, resulting from the spread and penetration of the carrier wave functions in coupled InAs quantum dots. The measured thermal activation energies of different samples demonstrated that the InAs wetting layer may act as a barrier for the thermionic emission of carriers in high-quality InAs multilayers, while in InAs monolayers and submonolayers the carriers are required to overcome the GaAs barrier to escape thermally from the localized states.

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ZnO nanorod arrays with different morphologies were grown by metalorganic chemical vapor deposition (MOCVD). The diameters of nanorods range from 150 nm to 20 nm through changing the carrier gas flux during the growth process. Measurements such as scanning electron microscope (SEM), X-ray diffraction (XRD), Raman scattering and photoluminescence (pL) spectrum were employed to analyze the differences of these nanorods. It was found that when both carrier gas flux of Zn and O reactant are 1 SLM, we can obtain the best vertically aligned and uniform nanorods. Furthermore, the PL spectrum reveals a blueshift of UV emission peak, which may be assigned to the increase of surface effect.