Cl2／Ar／BCl3ICP刻蚀对AIGaN的损伤研究

感应耦合等离子体（ICP）刻蚀在AlGaN基紫外探测器台面制作中起着重要作用，初步研究了Cl2／Ar／BCl3ICP刻蚀对A1GaN材料的损伤。运用X射线光电子能谱（XPS）对ICP刻蚀前后的n型Al0.45Ga0．55N表面进行了分析，并对刻蚀后AlGaN材料在N2气中快速热退火进行了研究。结果表明，在N2气中550℃退火3min对材料的电学性能有明显的改善作用。

Formation of Au nanoparticles in sapphire by using Ar ion implantation and thermal annealing

In this paper, we present results of the synthesis of gold nanoclusters in sapphire, using Ar ion implantation and annealing in air. Unlike the conventional method of Au implantation followed by thermal annealing, Au was deposited on the surface of m- and a- cut sapphire single crystal samples including those pre-implanted with Ar ions. Au atoms were brought into the substrate by subsequent implantation of Ar ions to form Au nanoparticles. Samples were finally annealed stepwisely in air at temperatures ranging from 400 to 800 C and then studied using UV–vis absorption spectrometry, transmission electron microscopy and Rutherford backscattered spectrometry. Evidence of the formation Au nanoparticles...