EFFECT OF PROCESSING PARAMETERS ON AR+ LASER-RECRYSTALLIZED POLY-SI-SIO2 INTERFACE CHARACTERISTICS

Autoria(s): HUANG XF; BAO XM; JIANG XP; WEN J; CHU YM
Data(s)

1987
Identificador

http://ir.semi.ac.cn/handle/172111/14631

http://www.irgrid.ac.cn/handle/1471x/101350
Idioma(s)

英语
Fonte

HUANG XF; BAO XM; JIANG XP; WEN J; CHU YM.EFFECT OF PROCESSING PARAMETERS ON AR+ LASER-RECRYSTALLIZED POLY-SI-SIO2 INTERFACE CHARACTERISTICS,CHINESE PHYSICS ,1987,7(3):828-834
Palavras-Chave #半导体物理
Tipo

期刊论文
Acesso ao item digital