94 resultados para 796.325


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Immersion lithography has been considered as the mainstream technology to extend the feasibility of optical lithography to further technology nodes. Using proper polarized illumination in an immersion lithographic tool is a powerful means to enhance the image quality and process capability for high numerical aperture (NA) imaging. In this paper, the impact of polarized illumination on high NA imaging in ArF immersion lithography for 45 nm dense lines and semi-dense lines is studied by PROLITH simulation. The normalized image log slope (NILS) and exposure defocus (ED) window are simulated under various polarized illumination modes, and the impact of polarized illumination on image quality and process latitude is analyzed. (C) 2007 Elsevier GmbH. All rights reserved.

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为提高国内惯性约束聚变(ICF)装置的焦斑平滑能力,在对光谱色散平滑(SSD)技术理论分析的基础上,开展相关实验并研究其平滑机制。实验结合另一种焦斑平滑技术——分布式相位板(DPP)比较分析光谱色散平滑技术应用下的焦斑均匀性的变化。实验表明,利用光谱色散平滑技术中的正弦相位调制对光谱展宽并色散后,在色散方向上的焦斑均匀性有明显改善,120μm内的光强调制被平滑,其平滑能力依赖于光谱色散平滑技术参量的选择;焦斑的低频光谱强度变化很小,但中高频光谱强度下降,焦斑质量有良好的改善,焦斑的不均匀性从40%降低到1

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合成了2-(2-氨基-6-乙氧基苯并噻唑基偶氮)-5-(N,N-二乙基氨基)三氟甲基磺酰苯胺偶氮染料(EBTDATFS)及其与乙酸镍、乙酸钴、乙酸铜、乙酸锌等金属盐鏊合的金属鏊合物。通过红外光谱、紫外-可见吸收光谱和MALDI质谱等对染料及其金属鏊合物进行了结构表征;使用旋涂方法在K9玻璃和抛光的单晶硅基片上制备薄膜;研究了镍金属鏊合物的热学性能;使用椭偏仪研究了Ni和Zn鏊合物的光学常数。结果表明:4种金属鏊合物薄膜最大吸收光谱为621-629nm,且长波边吸收峰陡峭;TGA-DSC测试结果表明镍金属鏊

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本文比较了考虑与不考虑激光下能级弛豫过程的两种形式的调Q速率方程,并以二极管激光侧面泵浦电光调QNd:YAG为例,分别采用两种形式的调Q速率方程,分析了调Q过程中上、下能级粒子数变化过程,计算了输出调Q激光脉冲波形、峰值功率以及能量,进行了比较分析,并解释了调Q“子脉冲”与拖尾现象。

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Intense Tm3+ blue upconversion emission has been observed in Tm3+-Yb3+ codoped oxyfluoride tellurite glass under excitation with a diode laser at 976 nm. Three emission bands centered at 475, 650 and 796 nm corresponding to the transitions (1)G(4) -> H-3(6), (1)G(4) -> H-3(4) and F-3(4) -> H-3(6), respectively, simultaneously occur. The dependence of upconversion intensities on Tm3+ ions concentration and excitation power are investigated. For fixed Yb2O3 concentrations of 5.0 mol%, the maximum upconversion intensity was obtained with Tm2O3 concentration of about 0.1 mol%. The blue upconversion luminescence lifetimes of the Tm3+ transitions (1)G(4) -> H-3(6) are measured. The results are evaluated by the possible upconversion mechanisms.

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Variations of peak position of the rocking curve in the Bragg case are measured from a Ge thin crystal near the K-absorption edge. The variations are caused by a phase change of the real part of the atomic scattering factor. Based on the measurement, the values of the real part are determined with an accuracy of better than 1%. The values are the most reliable ones among those reported values so far as they are directly determined from the normal atomic scattering factors.

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Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L) (boolean AND) 9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design. (c) 2005 Elsevier GmbH. All rights reserved.

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渐变折射率薄膜因为消除了界面而克服了传统的分层介质膜的固有弊端。探讨了一种基于这种渐变膜系的设计方法。从小波理论及渐变折射率增透理论出发,以分层介质高反膜系为参照,给出了采用梳状(Rugate)滤光片设计不同类型颜色滤光片的设计原理,并以目前背投系统中使用的红、绿、蓝颜色滤光片为指标,理论设计出了具有优良光谱特性的红、绿、蓝颜色滤光片;对该设计结果进行了角度敏感性分析、偏振效应分析并与传统的反射膜叠加法得到的分层膜系进行比较,发现通过梳状滤光片理论设计的滤光片较传统的多层膜滤光片具有更小的角度敏感性和较小

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激光预处理是提高光学薄膜激光损伤阈值的有效方法之一。本文就激光预处理前后增透膜损伤阈值的变化、破斑深度的变化、膜层中电场分布情况,分析了激光预处理对阈值的影响及原因。