High-brightness GaN-based blue LEDs grown on a wet-patterned sapphire substrate - art. no. 68410T


Autoria(s): Zhang, Y; Yan, FW; Gao, HY; Li, JM; Zeng, YP; Wang, GH; Yang, FH
Data(s)

2008

Resumo

Patterning sapphire substrate can relax the stress in the nitride epilayer, reduce the threading dislocation density, and significantly improve device performance. In this article, a wet-etching method for sapphire substrate is developed. The effect of substrate surface topographies on the quality of the GaN epilayers and corresponding device performance are investigated. The GaN epilayers grown on the wet-patterned sapphire substrates by MOCVD are characterized by means of scanning electrical microscopy (SEM), atomic force microscopy (AFM), high-resolution x-ray diffraction (HRXRD), and photoluminescence (PL) techniques. In comparison with the planar sapphire substrate, about a 22% increase in device performance with light output power of 13.31 mW@20mA is measured for the InGaN/GaN blue LEDs grown on the wet-patterned sapphire substrate.

Patterning sapphire substrate can relax the stress in the nitride epilayer, reduce the threading dislocation density, and significantly improve device performance. In this article, a wet-etching method for sapphire substrate is developed. The effect of substrate surface topographies on the quality of the GaN epilayers and corresponding device performance are investigated. The GaN epilayers grown on the wet-patterned sapphire substrates by MOCVD are characterized by means of scanning electrical microscopy (SEM), atomic force microscopy (AFM), high-resolution x-ray diffraction (HRXRD), and photoluminescence (PL) techniques. In comparison with the planar sapphire substrate, about a 22% increase in device performance with light output power of 13.31 mW@20mA is measured for the InGaN/GaN blue LEDs grown on the wet-patterned sapphire substrate.

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SPIE.; Chinese Opt Soc.

[Zhang, Yang; Yan, Fawang; Gao, Haiyong; Li, Jinmin; Zeng, Yiping; Wang, Guohong; Yang, Fuhua] Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China

SPIE.; Chinese Opt Soc.

Identificador

http://ir.semi.ac.cn/handle/172111/7832

http://www.irgrid.ac.cn/handle/1471x/65731

Idioma(s)

英语

Publicador

SPIE-INT SOC OPTICAL ENGINEERING

1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA

Fonte

Zhang, Y ; Yan, FW ; Gao, HY ; Li, JM ; Zeng, YP ; Wang, GH ; Yang, FH .High-brightness GaN-based blue LEDs grown on a wet-patterned sapphire substrate - art. no. 68410T .见:SPIE-INT SOC OPTICAL ENGINEERING .SOLID STATE LIGHTING AND SOLAR ENERGY TECHNOLOGIES,1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA ,2008,6841: T8410-T8410

Palavras-Chave #光电子学 #GaN #nitrides #LED #MOCVD #patterned sapphire substrate #wet etching
Tipo

会议论文