Growth of nonpolar a-plane GaN on nano-patterned r-plane sapphire substrates
Data(s) |
2009
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Resumo |
Sapphire substrates were nano-patterned by inductive coupled plasma etching process. Nonpolar a-plane GaN films were grown on planar and nano-patterned r-plane sapphire substrates by metal organic chemical vapor deposition. The anisotropic characteristic and the crystalline quality of the a-plane GaN films were studied through XRD rocking curves. The cross section and surface morphologies of the a-plane GaN films were studied using SEM and AFM measurements, respectively. The crystal quality and surface flatness of the nonpolar a-plane GaN were greatly improved through the usage of the nano-patterned r-plane sapphire substrates. (C) 2008 Elsevier B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Gao HY ; Yan FW ; Zhang Y ; Li JM ; Zeng YP ; Wang JX .Growth of nonpolar a-plane GaN on nano-patterned r-plane sapphire substrates ,APPLIED SURFACE SCIENCE,2009 ,255(6):3664-3668 |
Palavras-Chave | #半导体材料 #GaN #Nonpolar #MOCVD #Nano-patterned |
Tipo |
期刊论文 |