高频等离子法制取超细Si_3N_4粉末

本文述及高频等离子法制取超细Si_3N_4粉末的原理、装置,工艺参数及粉末性能的一些检测结果。利用SiCl_4+NH_3气-气相反应,所得白色粉末含有NH_4Cl晶体,热重分析表明350℃失重停止,280℃失重速率最快,经400～700℃处理后的粉末仍为非晶,不含NH_4Cl,BET测得比表面积为75.8 m~2/g,X光小角度散射法测粒子半径分布主峰R为100～150,且符合正态对数分布规律,平均直径=527;1400℃处理后,X光衍射测得主相为α-Si_3N_4、次相为Si_2N_2O,粒径明显长大,平均直径达1700。

高频等离子体合成Si_3N_4超细粉料

本文研究了用高频等离子体合成Si_3N_4超细粉料.进行了合成系统的设计、参数选择,发展了利用“磁泵”效应把反应气体送入弧区和用氢气调整高频机——等离子体负载匹配的方法,分析了反应过程,作了数值计算,并制取了Si_3N_4超细粉料.

Size Effect and Geometrical Effect of Solids in Micro-Indentation Test

Micro-indentation tests at scales of the order of sub-micron show that the measured hardness increases strongly with decreasing indent depth or indent size, which is frequently referred to as the size effect. At the same time, at micron or sub-micron scale, another effect, which is referred to as the geometrical size effects such as crystal grain size effect, thin film thickness effect, etc., also influences the measured material hardness. However, the trends are at odds with the size-independence implied by the conventional elastic-plastic theory. In the present research, the strain gradient plasticity theory (Fleck and Hutchinson) is used to model the composition effects (size effect and geometrical effect) for polycrystal material and metal thin film/ceramic substrate systems when materials undergo micro-indenting. The phenomena of the "pile-up" and "sink-in" appeared in the indentation test for the polycrystal materials are also discussed. Meanwhile, the micro-indentation experiments for the polycrystal Al and for the Ti/Si_3N_4 thin film/substrate system are carried out. By comparing the theoretical predictions with experimental measurements, the values and the variation trends of the micro-scale parameter included in the strain gradient plasticity theory are predicted.

反应烧结Si_3 N_4陶瓷断裂韧性的实验研究

本文对反应烧结氦化硅 Si_3N_4陶瓷的断裂韧性进行实验研究,用三种不同试件进行了测试,这三种试件是:山形切口双悬臂粱试件,山形切口三点弯曲梁试件和直穿透切口三点弯曲梁试件.用有限元方法分析了直穿透切口三点弯曲梁切口宽度对应力强度因子的影响,结合断裂载荷测定值估算了材料的断裂韧性值,指出直切口无预制裂纹试件的测定值必须用有限元法进行修正才能得到正确结果.

纳米二氧化钒薄膜的制备及红外光学性能

采用双离子束溅射方法在Si_3N_4/SiO_2/Si基底表面沉积氧化钒薄膜,在氮气气氛下热处理获得二氧化钒薄膜.利用x射线衍射(XRD)、扫描电子显微镜(SEM)和X射线光电子能谱(XPS)研究了热处理温度对氧化钒薄膜晶体结构、表面形貌和组分的影响,利用傅里叶变换红外光谱(FT-IR)对二氧化钒薄膜的红外透射性能进行了测试分析.结果表明,所制备的氧化钒薄膜以非晶态V_2O_5;和四方金红石结构VO_2为主,经400℃、2 h热处理后获得了(011)择优取向的单斜金红石结构纳米VO_2薄膜,提高热处理温度至450℃,纳米结构VO_2薄膜的晶粒尺寸减小.FT-IR结果显示,纳米VO_2薄膜透射率对比因子超过0.99,高温关闭状态下透射率接近0.小晶粒尺寸纳米VO_2:薄膜更适合在热光开关器件领域应用.