10 resultados para LIB3O5


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ZrO2 thin films were deposited bill using an electron beam evaporation technique on three kinds of lithium triborate (LiB3O5 or LBO) substrates with the surfaces at specified crystalline orientations. The influences of the LBO structure on the structural and optical properties of ZrO2 thin films are studied by spectrophotometer and x-ray diffraction. The results indicate that the substrate structure has obvious effects on the structural end optical properties of the film: namely. the ZrO2 thin film deposited on the X-LBO, Y-LBO and Z-LBO orients to m(-212), m(021) and o(130) directions. It is also found that the ZrO2 thin film with m(021) has the highest refractive index and the least lattice misfit.

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采用矢量法设计了三硼酸锂(LiB3O5,LBO)晶体上1064nm、532nm、355nm和266nm四倍频增透膜.结果表明,在1064nm、532nm、355nm和266nm波长的剩余反射率分别为0.0019%、0.0031%、0.0061%和0.0047%.根据容差分析,薄膜制备时沉积速率准确度控制在+6.5%时,基频、二倍频、三倍频和四倍频波长的剩余反射率分别增加至0.24%、0.92%、2.38%和4.37%.当薄膜材料折射率的变化控制在+3%时,1064nm波长的剩余反射率增大为0.18%,532nm、355nm和266nm波长分别达0.61%,0.59%,0.20%.与薄膜物理厚度相比,膜层折射率对剩余反射率的影响大.对膜系敏感层的分析表明,在1064nm和266nm波长,从入射介质向基底过渡的第二层膜厚度变化对剩余反射率的影响最大,其次是第一膜层.在532nm和355nm波长,从入射介质向基底过渡的第一和第四膜层是该膜系的敏感层.误差分析也表明,薄膜材料的色散对特定波长的剩余反射率具有明显影响,即1064nm、532nm、355nm和266nm波长的剩余反射率分别增加至0.30%、0.23%、0.58%和3.13%.

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The frequency and temperature dependences of the dielectric constant and the electrical conductivity of the transparent glasses in the composition Li2O-3B(2)O(3) were investigated in the 100 Hz-10 MHz frequency range. The dielectric constant and the loss in the low frequency regime were electrode material dependent. Dielectric and electrical relaxations were, respectively, analyzed using the Cole-Cole and electric modulus formalisms. The dielectric relaxation mechanism was discussed in the framework of electrode and charge carrier (hopping of the ions) related polarization using generalized Cole-Cole expression. The frequency dependent electrical conductivity was rationalized using Jonscher's power law. The activation energy associated with the dc conductivity was 0.80 +/- 0.02 eV, which was ascribed to the motion of Li+ ions in the glass matrix. The activation energy associated with dielectric relaxation was almost equal to that of the dc conductivity, indicating that the same species took part in both the processes. Temperature dependent behavior of the frequency exponent (n) suggested that the correlated barrier hopping model was the most apposite to rationalize the electrical transport phenomenon in Li2O-3B(2)O(3) glasses. These glasses on heating at 933 K/10 h resulted in the known nonlinear optical phase LiB3O5.

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The frequency and temperature dependences of the dielectric constant and the electrical conductivity of the transparent glasses in the composition Li2O–3B2O3 were investigated in the 100 Hz–10 MHz frequency range. The dielectric constant and the loss in the low frequency regime were electrode material dependent. Dielectric and electrical relaxations were, respectively, analyzed using the Cole–Cole and electric modulus formalisms. The dielectric relaxation mechanism was discussed in the framework of electrode and charge carrier (hopping of the ions) related polarization using generalized Cole–Cole expression. The frequency dependent electrical conductivity was rationalized using Jonscher’s power law. The activation energy associated with the dc conductivity was 0.80±0.02 eV, which was ascribed to the motion of Li+ ions in the glass matrix. The activation energy associated with dielectric relaxation was almost equal to that of the dc conductivity, indicating that the same species took part in both the processes. Temperature dependent behavior of the frequency exponent (n) suggested that the correlated barrier hopping model was the most apposite to rationalize the electrical transport phenomenon in Li2O–3B2O3 glasses. These glasses on heating at 933 K/10 h resulted in the known nonlinear optical phase LiB3O5.

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采用矢量合成法设计了LiB3O5(LBO)晶体上1064nm,532nm二倍频增透膜,在1064nm处的反射率为0.0014%,532nm处的反射率为0.0004%。根据误差分析,薄膜制备时沉积速率精度控制在+6.5%时,1064nm处的反射率增加至0.22%,532nm处增加至0.87%。材料折射率的变化控制在+3%时,1064nm处的反射率达0.24%,532nm处达0.22%。沉积速率和折射率控制的负变化不增大特定波长处的剩余反射率。与膜层折射率相比,薄膜物理厚度对剩余反射率的影响小。低折射率膜层的

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晶体折射率的准确测定是晶体上薄膜器件设计的基础。介绍了利用分光光度计测量晶体折射率的方法,通过背面影响系数法、背面镀增透膜和将两者结合起来的方法消除晶体反射率测量时背面反射带来的影响,给出了具体的步骤并对测量误差进行了分析。由于晶体的光学各向异性,采用起偏器扫描的方法测量晶体光学性质随方向的变化。通过对LiB3P5晶体的折射率的测量,证实了该方法的可行性并可用于其他光学晶体折射率的测量。

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用电子柬蒸发方法在三种不同取向的三硼酸锂(LiB3O3,简称LBO)晶体上沉积了ZrO2薄膜。采用分光光度计和X射线衍射技术对LBO晶体基底结构对薄膜光学性质和显微结构的影响进行了研究。实验结果表明:基底结构对薄膜的显微结构和光学性质具有明显影响,即X-LBO,Y-LBO和Z-LBO上沉积的ZrO3薄膜分别沿m(-212),m(021)和o(130)择优生长,且m(021)择优取向的ZrO3薄膜具有最高的折射率和最小的晶格不匹配。

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采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017%、0.0002%和0.0013%。根据误差分析,薄膜制备时沉积速率精度控制在+5.5%时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20%、0.84%和1.89%。当材料折射率的变化控制在+3%时,1064 nm处的剩余反射率增大为0.20%,532 nm和355 nm处分别达0.88%和0.24%。与薄膜

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Design and preparation of frequency doubling antireflection coating with different thicknesses of interlayer were investigated for LiB3O5 (LBO) substrate. The design was based on the vector method. The thickness of the inserted SiO2 interlayer could be changed in a wide range for the four-layer design with two zeros at 1064 and 532 nm. The coatings without any interlayer and with 0.1 quarter-wave (λ/4), 0.3 λ/4, 0.5 λ/4 SiO2 interlayer were deposited respectively on LBO by using electron beam evaporation technique. All the prepared coatings with SiO2 interlayer indicated satisfying optical behavior. This expanded our option for the thickness of an interlayer when coating on LBO substrate. The prepared films with SiO2 interlayer showed better adhesion than that without any interlayer. The thickness of the interlayer affected the adhesion, the adhesion for the coating with 0.5 λ/4 SiO2 interlayer was not as good as the other two.}

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From the chemical bond viewpoint, LiB3O5 (LBO) crystal has been studied by using the bond valence theory of complex crystals. Chemical bond parameters and linear and nonlinear optical (NLO) properties of each type of constituent chemical bonds are quantitatively determined. Because of the different crystal structure characteristics of LBO from those of beta-BaB2O4 (BBO), the two anionic groups, (B3O7)(5-) in LBO and (B3O6)(3-) in BBO, play different roles in contributions to their own total NLO tensor coefficients of LBO and BBO, respectively. By comparison, we find that planar (B3O6)(3-) groups are the ideal structure model, leading to little cancellation of contributions of each kind of bond in these groups, and this gives us a useful guide to design new NLO materials in the future.