Biossensores de pH, ureia e glicose utilizando a microeletrônica de filmes finos de AZO e TIO2

Este trabalho apresenta o desenvolvimento de biossensores de pH, ureia e glicose, utilizando óxidos como plataforma para a parte seletiva. Os filmes finos de óxidos condutores foram produzidos por diferentes técnicas de deposição, como spin-coat, dip-coat, spray-pyrolysis e casting. Os materiais fabricados foram AZO e TiO2, ambos depositados sobre substratos de FTO, ITO ou vidro hidroflilizado. O número de camadas foi variado para cada técnica e as caracterizações morfológicas e estruturais foram feitas por MEV, DRX e FTIR. As caracterizações elétricas foram feitas por EGFET e voltametria cíclica. Os filmes foram testados como sensores de pHs na faixa de 2 a 8. O filme depositado com AZO em substrato de FTO pela técnica de spray-pyrolysis apresentou melhor resposta, com sensibilidade de 31,7 mV/pH entre toda a faixa de pHs do 2 ao 8. Já para os filmes de TiO2, o filme produzido por dip-coat com 5 camadas em substrato de FTO apresentou sensibilidade de 37,8 mV/pH entre a faixa de pHs de 2 a 8. Paralelamente, os filmes tiveram suas superfícies funcionalizadas com proteínas como urease ou glicose oxidase. Neste caso, os dispositivos foram testados entre as concentrações de 5 a 200 mg/dL de ureia e glicose. Como biossensor de ureia, o filme de TiO2 depositado por spin-coat com 5 camadas em substrato de FTO apresentou a maior sensibilidade, com valor 3,32 mV/(mg/dL) entre as concentrações de 5 a 120 mg/dL. Para os filmes estudados como biossensores de glicose, o melhor resultado também foi obtido pelo filme de TiO2 depositado por spin-coat com 5 camadas em substrato de FTO, apresentando sensibilidade em torno de 6,18 mV/(mg/dL) entre as concentrações de 5 a 200 mg/dL. Alguns resultados encontrados foram iguais ou melhores aos encontrados na literatura vigente, mesmo que os dispositivos ainda são passíveis de otimização.

Estudo da cristalinidade de filmes finos de nitreto de índio e simulado pelo pacote de programas Wien2k

Neste trabalho, foi utilizado o método de deposição assistida por feixe de íons (IBAD na sigla em inglês) para produção de filmes finos de nitreto de índio em substratos de silício (111) e Safira-C. Variando as condições de deposição e utlilizando a técnica de difração de raios-X, investigou-se com o intuito de obter os parâmetros que resultam em filmes finos com melhor grau de cristalinidade. Os filmes produzidos a 380C apresentaram alta cristalinidade, superior àqueles a 250C. Temperaturas muito superiores a 380C não ocasionam a formação de filme cristalino de InN, como foi observado ao utilizar a temperatura de 480C; o mesmo se observa ao utilizar temperatura ambiente. Na temperatura considerada adequada ,de 380C, obteve-se que a utilização de Ra, ou seja, a razão de fluxo de partículas entre o nitrogênio e índio, em torno de 2,3 permite obter um melhor grau de cristalinização, o qual decresce conforme se diverge desse valor. A comparação entre difratogramas de amostras produzidas com e sem a evaporação prévia de titânio, o qual é possível observar um deslocamento dos picos do InN, indicam que o efeito Gettering permite a redução de impurezas no filme, principalmente de oxigênio. Utilizou-se a técnica de Retroespalhamento de Rutherford para obtenção da composição dos elementos e o perfil de profundidade. Notou-se uma forte mistura dos elementos do substrato de silício e safira com o nitreto de índio mesmo próximos a superfície. A presença indesejável de impurezas, principalmente o oxigênio, durante a deposição de filmes finos é praticamente inevitável. Desta forma, cálculos ab initio baseados na Teoria do Funcional da Densidade (DFT) foram realizados para investigar defeitos isolados e complexos de oxigênio no nitreto de índio e a sua influência nas propriedades óticas. Considerou-se diferentes concentrações de oxigênio (x=2,76, 8,32, 11,11 e 22,22%) aplicando-se o método PBEsolGGA e TB-mBJ para o tratamento da energia e potencial de troca e correlação. Obteve-se que é energeticamente favorável o oxigênio existir principalmente como defeito carregado e isolado. Os resultados utilizando a aproximação de TB-mBJ indicam um estreitamento do bandgap conforme a concentração de oxigênio aumenta. Entretanto, a alta contribuição do efeito de Moss-Burstein resulta num efetivo alargamento do band gap, gerando valores de band gap ótico maiores que no do bulk de nitreto de índio.

Produção e análise do desempenho óptico e elétrico de filmes finos de SnO2:F para aplicações fotovoltaicas

Conselho Nacional de Desenvolvimento Científico e Tecnológico - CNPq

Influência da desordem estrutural nas propriedades magnéticas de filmes finos de Co2FeAl

Thin films of Co2FeAl (CFA) and trilayers with CFA/M/CFA, where M is Au or Ag, produced by magnetron sputtering onto glass and oriented (MgO (100)) substrates were investigated. The structural, magnetic static and magnetic dynamics properties were analyzed by distinct experimental techniques. Through X-ray diffraction was observed an A2 phase for the samples (completely disordered), where the atoms are randomly located in the lattice. The static magnetic behavior, in some samples, reveal a plateau behavior generated by a biphasic system. The magnetoimpedance measurements were performed by varying the angle between the external magnetic field and current with respect of anisotropy direction. For this reason, the MI results show a asymmetric magnetoimpedance (AMI) behavior. For the single and trilayers samples with 500 nm-thick, the AMI effect is more evident in comparison with samples with 1000 nm-thick. Therefore, in this work was stablished a route to produce Heusler alloy samples with A2 phase in thin film geometry onto amorphous and oriented substrates, and due to structural disorder was possible to study the hysteretic and MI asymmetric effects.

Estudo da deposição de filmes finos de BaTi(1-X)Zr(X)O3 por meio de planejamento Box-Behnken

Ferroelectric ceramics with perovskite structure (ABO3) are widely used in solid state memories (FeRAM’s and DRAM's) as well as multilayered capacitors, especially as a thin films. When doped with zirconium ions, BaTiO3-based materials form a solid solution known as barium zirconate titanate (BaTi1-xZrxO3). Also called BZT, this material can undergo significant changes in their electrical properties for a small variation of zirconium content in the crystal lattice. The present work is the study of the effects of deposition parameters of BaTi0,75Zr0,25O3 thin films by spin-coating method on their morphology and physical properties, through an experimental design of the Box-Behnken type. The resin used in the process has been synthesized by the polymeric precursor method (Pechini) and subsequently split into three portions each of which has its viscosity adjusted to 10, 20 and 30 mPa∙s by means of a rotary viscometer. The resins were then deposited on Pt/Ti/SiO2/Si substrates by spin-coating method on 15 different combinations of viscosity, spin speed (3000, 5500 and 8000 rpm) and the number of deposited layers (5, 8 and 11 layers) and then calcined at 800 ° C for 1 h. The phase composition of the films was analyzed by X-ray diffraction (XRD) and indexed with the JCPDS 36-0019. Surface morphology and grain size were observed by atomic force microscopy (AFM) indicating uniform films and average grain size around 40 nm. Images of the cross section of the films were obtained by scanning electron microscopy field emission (SEM-FEG), indicating very uniform thicknesses ranging from 140-700 nm between samples. Capacitance measurements were performed at room temperature using an impedance analyzer. The films presented dielectric constant values of 55-305 at 100kHz and low dielectric loss. The design indicated no significant interaction effects between the deposition parameters on the thickness of the films. The response surface methodology enabled better observes the simultaneous effect of variables.

Modificação do eletrodo AWS E7018 com adição de filmes finos externos de PVC e Al, para soldagem de aço C-Mn

This paper suggests modifications in coating of electrodes providing an alternative for execution of welding with low hydrogen electrode AWS E7018 without having to dry it, reducing thus the cost and time of manufacturing of high resistance welds. The welds in this research were developed with basic coated electrodes (hygroscopic) – SMAW process – externally painted with aluminum spray paint for high temperatures or wrapped with thin plastic films (PVC) and aluminum foil films used commonly for food protection. The basic premise is that establishing a barrier between the atmosphere and the electrode coating could reduce the effects of high hygroscopicity presented by coatings of low hydrogen, minimizing this way the main source of supply of hydrogen to the fusion pool during welding. It is also expected that the addition of new materials from the electrode coating to the fusion pool would induce metallurgical changes in the deposited metal and, as a consequence, modifications in its mechanical properties. This research dealt with measuring the dissolved hydrogen in the deposited metal after welding with modified electrodes, evaluating the influence of these changes in the produced microstructures and in the mechanical properties of the resulting weld, and comparing the obtained results with the standard welding procedures and with the recently developed waterproof electrodes. The results obtained in most samples welded with modified electrodes showed increased mechanical resistance and increased tenacity due to the increased percentage of acicular ferrite in metal deposited without significant elevation of hardness, when compared with the traditional welding with AWS E7018 electrode and with ELBRÁS BRH4R waterproof electrode. The diffusing hydrogen measured in the modified electrodes was kept inside the parameters defined by international codes.

Modificação do eletrodo AWS E7018 com adição de filmes finos externos de PVC e Al, para soldagem de aço C-Mn

This paper suggests modifications in coating of electrodes providing an alternative for execution of welding with low hydrogen electrode AWS E7018 without having to dry it, reducing thus the cost and time of manufacturing of high resistance welds. The welds in this research were developed with basic coated electrodes (hygroscopic) – SMAW process – externally painted with aluminum spray paint for high temperatures or wrapped with thin plastic films (PVC) and aluminum foil films used commonly for food protection. The basic premise is that establishing a barrier between the atmosphere and the electrode coating could reduce the effects of high hygroscopicity presented by coatings of low hydrogen, minimizing this way the main source of supply of hydrogen to the fusion pool during welding. It is also expected that the addition of new materials from the electrode coating to the fusion pool would induce metallurgical changes in the deposited metal and, as a consequence, modifications in its mechanical properties. This research dealt with measuring the dissolved hydrogen in the deposited metal after welding with modified electrodes, evaluating the influence of these changes in the produced microstructures and in the mechanical properties of the resulting weld, and comparing the obtained results with the standard welding procedures and with the recently developed waterproof electrodes. The results obtained in most samples welded with modified electrodes showed increased mechanical resistance and increased tenacity due to the increased percentage of acicular ferrite in metal deposited without significant elevation of hardness, when compared with the traditional welding with AWS E7018 electrode and with ELBRÁS BRH4R waterproof electrode. The diffusing hydrogen measured in the modified electrodes was kept inside the parameters defined by international codes.

Caracterização microestrutural, morfológica e fotocatalítica de filmes finos de TiO2 obtidos por deposição química de organometálicos em fase vapor

Dissertação (Mestrado em Tecnologia Nuclear)

Construção de um aparato experimental para monitoramento in situ da deposição de filmes finos de titânio por magnetron sputtering

The technique of surface coating using magnetron sputtering is one of the most widely used in the surface engineering, for its versatility in obtaining different films as well as in the micro / nanometric thickness control. Among the various process parameters, those related to the active species of the plasma are of the most fundamental importance in the mechanism and kinetics of deposition. In order to identify the active species of the plasma, parameters such as gas flow, pressure and density of electric power were varied during titanium coating on glass substrate. By flowing argon gas of 10, 20, 30, 40 and 50 sccm (cubic centimeters per minute) for each gas flow a sequential scan of the electric current of 0.10, 0.20, 0.30, 0.40 , 0.50 A. The maximum value of 0.50 A was chosen based both on literature data and on limitations of the equipment. The monitoring of plasma species present during the deposition was carried out in situ by the technique of optical emission spectroscopy (OES) through the spectrometer Ocean Optics USB2000 Series. For this purpose, an apparatus was developed to adapt the OES inside the plasma reactor to stay positioned closest to the target. The radiations emitted by the species were detected by an optical fiber placed behind the glass substrate and their intensities as a function of wavelength were, displayed on a monitor screen. The acquisition time for each condition of the plain parameters was related to the minima of spectral lines intensities due to the film formed on the substrate. The intensities of different emission lines of argon and titanium were then analyzed as a function of time, to determine the active species and estimate the thickness of the deposited films. After the deposition, the coated glasses thin films were characterized by optical transmittance through an infrared laser. It was found that the thickness and deposition rate determined by in situ analysis were consistent with the results obtained by laser transmittance

Coeficientes de difusão de metais em materiais não convencionais (agarose e acetato de celulose) usados na técnica de difusão em filmes finos por gradientes de concentração

The DGT technique allows one to measure quantitatively free and labile metal species in aquatic systems. Nevertheless, for this approach, knowledge is required of the diffusion coefficients of the analytes in a diffusive layer. In this study, the diffusion coefficients of Hg(II), As(III), Mn(II), Mg(II), Cu(II), Cd(II) were determined in agarose gel and those of Ba(II), Cd(II), Cu(II), Mg(II), Mn(II) e Zn(II) in cellulose acetate membranes. These materials presented good performance and the reported results can be used as a data base for further DGT studies.

Degradação de glifosato por fotocatálise heterogênea utilizando filmes finos de TiO2 suportados em anéis de quartzo seguida de análise por cromatografia líquida com detecção por fluorescência.

2006

Descargas luminescentes anómalas com cátodo magnetrão – descargas reactivas

Dissertação apresentada para a obtenção do Grau de Doutor em Engenharia Física, especialidade de Engenharia de Superfícies, pela Universidade Nova de Lisboa, Faculdade de Ciências e Tecnologia

Influência dos parâmetros de processo na deposição de nitreto de titânio por plasma em gaiola catódica

Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film