Obtención de Si3N4 mediante SHS

En el presente trabajo se presentan los resultados obtenidos en el estudio de las reacciones de Síntesis Autopropagada a Alta Temperatura (Self-propagating High-temperature Synthesis, SHS) de Nitruro de Silicio. La síntesis autopropagada a alta temperatura consiste básicamente en la generación de reacciones altamente exotérmicas capaces de automantenerse. Se puede considerar como principal ventaja del método el ahorro energético que supone. La síntesis se realiza sobre una mezcla inicial de silicio metálico sobre la cual se realizan adiciones de diluyente y otros aditivos (sales amónicas) que afectan al desarrollo de la reacción. Se ha estudiado la influencia que en este sistema pueden tener las proporciones de las distintas incorporaciones en la mezcla, tanto en el material resultante como en las condiciones de reacción. Igualmente se ha estudiado la posibilidad de utilización de nuevos aditivos que puedan minimizar el impacto medio ambiental. Se presentan los estudios microestructurales del material obtenido, la identificación cristalográfica de las fases presentes así como los comportamientos de los parámetros que definen la propia reacción. Con la información obtenida se propone el mecanismo predominante de la síntesis del Nitruro de Silicio mediante SHS.

Dynamic range extension of SiPM detectors with the time-gated operation

The silicon photomultiplier (SiPM) is a novel detector technology that has undergone a fast development in the last few years, owing to its single-photon resolution and ultra-fast response time. However, the typical high dark count rates of the sensor may prevent the detection of low intensity radiation fluxes. In this article, the time-gated operation with short active periods in the nanosecond range is proposed as a solution to reduce the number of cells fired due to noise and thus increase the dynamic range. The technique is aimed at application fields that function under a trigger command, such as gated fluorescence lifetime imaging microscopy.

Structure of a-Si:H/a-Si1-xCx:H multilayers deposited in a reactor with automated substrate holder

This paper deals with the structural properties of a-Si:H/a-Si1-xCx: H multilayers deposited by glow-discharge decomposition of SiH4 and SiH4 and CH4 mixtures. The main feature of the rf plasma reactor is an automated substrate holder. The plasma stabilization time and its influence on the multilayer obtained is discussed. A series of a-Si:H/a-Si1-xCx: H multilayers has been deposited and characterized by secondary ion mass spectrometry (SIMS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). No asymmetry between the two types of interface has been observed. The results show that the multilayers present a very good periodicity and low roughness. The difficulty of determining the abruptness of the multilayer at the nanometer scale is discussed.

Método para a correção da distorção de imagens obtidas por videofluoroscopia

OBJETIVO: Operacionalizar um protocolo para a correção de imagens obtidas por videofluoroscopia a partir de um modelo matemático descrito por Baltzopoulos (1995) e avaliar a magnitude do erro pelos métodos de calibração linear e não linear. MATERIAIS E MÉTODOS: As imagens foram obtidas por meio de um videofluoroscópio da marca Axion Siemens Iconos R100 de um indivíduo realizando exercício de extensão de joelho. Para a correção das imagens foi utilizado padrão de calibração não-linear. O processamento dos dados foi realizado em placa de captura da marca Silicon Graphics 320 e posteriormente analisado em um "software" Matlab. RESULTADOS: Para demonstrar a aplicabilidade do método foi avaliada a deformação do ligamento patelar. A utilização do padrão de calibração linear produziu um erro máximo de 0,086 mm, enquanto o padrão de calibração não linear atingiu um valor máximo de 0,019 mm. Já com relação ao erro médio, a calibração linear atingiu o valor de 0,024 mm, e a não linear apresentou um valor de 0,007 mm. CONCLUSÃO: Os resultados evidenciam a necessidade de utilização de um procedimento de calibração não linear.

A comprehensive model for quantum noise characterization in digital mammography.

NlmCategory="UNASSIGNED">A version of cascaded systems analysis was developed specifically with the aim of studying quantum noise propagation in x-ray detectors. Signal and quantum noise propagation was then modelled in four types of x-ray detectors used for digital mammography: four flat panel systems, one computed radiography and one slot-scan silicon wafer based photon counting device. As required inputs to the model, the two dimensional (2D) modulation transfer function (MTF), noise power spectra (NPS) and detective quantum efficiency (DQE) were measured for six mammography systems that utilized these different detectors. A new method to reconstruct anisotropic 2D presampling MTF matrices from 1D radial MTFs measured along different angular directions across the detector is described; an image of a sharp, circular disc was used for this purpose. The effective pixel fill factor for the FP systems was determined from the axial 1D presampling MTFs measured with a square sharp edge along the two orthogonal directions of the pixel lattice. Expectation MTFs were then calculated by averaging the radial MTFs over all possible phases and the 2D EMTF formed with the same reconstruction technique used for the 2D presampling MTF. The quantum NPS was then established by noise decomposition from homogenous images acquired as a function of detector air kerma. This was further decomposed into the correlated and uncorrelated quantum components by fitting the radially averaged quantum NPS with the radially averaged EMTF(2). This whole procedure allowed a detailed analysis of the influence of aliasing, signal and noise decorrelation, x-ray capture efficiency and global secondary gain on NPS and detector DQE. The influence of noise statistics, pixel fill factor and additional electronic and fixed pattern noises on the DQE was also studied. The 2D cascaded model and decompositions performed on the acquired images also enlightened the observed quantum NPS and DQE anisotropy.

Recuperação de metais de catalisadores usados de hidrotratamento (NiMo E CoMo/AL2O3)

This work presents a detailed study of the leaching behavior of deactivated hydrotreating catalysts (CoMo, NiMo/Al2O3) in presence of oxalate and NH4+ ions in various media. The yield of metals recovery may be optimized by adjusting several experimental parameters (time, temperature, etc). Leaching is limited by physical factors (diffusional effects caused by coke) and by the existence of silicate/spinel-like species which are poorly soluble in leaching solutions. Coke may be eliminated by an oxidation step at temperatures between 300-400ºC. Above 400ºC, solubilization of Ni and Co is drastically reduced. 50-90% wt of sulphate species and 15-30% wt of phosphate ions are solubilized during leaching. Silicon (as SiO2) is not solubilized. The best Ni-Co-Mo recoveries are in the 70-90% wt range; Fe recovery may be quantitative, whereas Al leaching may be lower than 5% wt.

Modelagem dos processos químicos em plasmas de misturas gasosas usadas na corrosão de silício. Parte 1: CF4 / O2

The plasma etching of semiconductor surfaces with fluorine-containing compounds has technological interest. Presently, considerable effort is being devoted to understand the chemistry involved. In this work, a numerical modeling analysis of the gas-phase decomposition of CF4/O2 mixtures, in the presence of silicon, was performed. The relative importance of individual processes was determined as well as the effect of the parameters' uncertainties. The results were compared with experimental data. The main etching agent in the system is the fluorine atom. The concentration of the main species, SiF4, CO, CO2 and COF2 depend on the composition of the mixture.

Modelagem dos processos químicos em plasmas de misturas gasosas usadas na corrosão de silício. Parte 2: SF6 / O2

In this work, a numerical modeling analysis of the gas-phase decomposition of SF6 / O2 mixtures, in the presence of silicon, was performed. The relative importance of individual processes and the effect of the parameters' uncertainties were determined. The model was compared with experimental data for the plasma etching of silicon and with the calculated results for the CF4 / O2 system. In both systems the main etching agent is the fluorine atom and the concentration of the major species depends on the composition of the mixture. The etching rate is greater for SF6 / O2.

O relevante papel do agente sililante na modificação de superfícies de polímeros

The applicability of the silylant agents of the general formula Y3Si-R-X, depends on the reactivity of Y group (halide or alcoxide) attached to silicon and the organic function X (halide, amine, thiol, cyanide, etc) in the extreme position of the chain. Both groups are linked together by an organic chain R, containing usually three methylene groups. A series of these agents can be covalently bonded to an inorganic matrix, since the available OH groups are distributed on the surface, making silica gel the most common support. However, other inorganic oxides, zeolites, lamellar inorganic phosphates and chrysotile can also have these agents anchored. Some illustration are presented for immobilized surface in the use as extractors of cations from dilute aqueous or non-aqueous solutions, catalysts agents, ionic exchanged materials, support for enzyme immobilization, chromatographic applications, use in some industrial features and in many other areas. The evolution of this exciting research field to produce new materials, for many tecnological applications, is strongly dependent on the development of a sensible systematic process for the synthesis of a series of new specific silylant agents.

Influência da catálise ácida e básica na preparação da sílica funcionalizada pelo método sol-gel

Some aspects of the chemistry involved in the preparation and characterization of functionalized silicon oxide by sol-gel method are considered in this work. The synthesis was performed with different silicon alcoxide precursors and the influence of the acid and basic catalyst was investigated. Characterization was performed by infrared absorption spectroscopy, elemental analysis and 29Si NMR. Infrared data show Si-C and -CH2- vibrational modes at 1250 to 1280 and 2920 to 2940 cm-1, respectively. The elemental analysis confirmed the presence of organic groups in the inorganic silica network. 29Si NMR results show different hydrolisys depending on the acid or base catalysis.

Estudo do estado fundamental de aglomerados de silício via redes neurais

We introduce a global optimization method based on the cooperation between an Artificial Neural Net (ANN) and Genetic Algorithm (GA). We have used ANN to select the initial population for the GA. We have tested the new method to predict the ground-state geometry of silicon clusters. We have described the clusters as a piling of plane structures. We have trained three ANN architectures and compared their results with those of pure GA. ANN strongly reduces the total computational time. For Si10, it gained a factor of 5 in search speed. This method can be easily extended to other optimization problems.

Technological solution for the automatic replacement of the catalytic filaments in HWCVD

The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.

Degradation of thin tungsten filaments at high temperature in HWCVD

The degradation of the filaments is usually studied by checking the silicidation or carbonization status of the refractory metal used as catalysts, and their effects on the structural stability of the filaments. In this paper, it will be shown that the catalytic stability of a filament heated at high temperature is much shorter than its structural lifetime. The electrical resistance of a thin tungsten filament and the deposition rate of the deposited thin film have been monitored during the filament aging. It has been found that the deposition rate drops drastically once the quantity of dissolved silicon in the tungsten reaches the solubility limit and the silicides start precipitating. This manuscript concludes that the catalytic stability is only guaranteed for a short time and that for sufficiently thick filaments it does not depend on the filament radius.

Coexistence of Two Kinds of Fluorinated Hydrogenated Micelles as Building Blocks for the Design of Bimodal Mesoporous Silica with Two Ordered Mesopore Networks

A simple and effective route has been developed for the synthesis of bimodal (3.6 and 9.4 nm) mesoporous silica materials that have two ordered interconnected pore networks. Mesostructures have been prepared through the self assembly mechanism by using a mixture of polyoxyethylene fluoroalkyl ether and triblock copolymer as building block. The investigation of the RF8(EO)9/P123/water phase diagram evidences that in the considered surfactant range of concentrations, the system is micellar (L1). DLS measurements indicate that this micellar phase is composed of two types of micelles, the size of the first one at around 7.6 nm corresponds unambiguously to the pure fluorinated micelles. The second type of micelles at higher diameter consists of fluorinated micelles which have accommodated a weak fraction of P123 molecules. Thus, in this study the bimodal mesoporous silica are really templated by two kinds of micelles.

Tailored Jeffamine molecular tools for ordering mesoporous Silica

Herein, we report the formation of organized mesoporous silica materials prepared from a novel nonionic gemini surfactant, myristoyl-end capped Jeffamine, synthesized from a polyoxyalkyleneamine (ED900). The behavior of the modified Jeffamine in water was first investigated. A direct micellar phase (L1) and a hexagonal (H1) liquid crystal were found. The structure of the micelles was investigated from the SAXS and the analysis by Generalized Indirect Fourier Transformation (GIFT), which show that the particles are globular of coreshell type. The myristoyl chains, located at the ends of the amphiphile molecule are assembled to form the core of the micelles and, as a consequence, the molecules are folded over on themselves. Mesoporous materials were then synthesized from the self-assembly mechanism. The recovered materials were characterized by SAXS measurements, nitrogen adsorptiondesorption analysis, transmission and scanning electron microscopy. The results clearly evidence that by modifying the synthesis parameters, such as the surfactant/silica precursor molar ratio and the hydrothermal conditions, one can control the size and the nanostructuring of the resulting material. It was observed that, the lower the temperature of the hydrothermal treatment, the better the mesopore ordering.