Technological solution for the automatic replacement of the catalytic filaments in HWCVD


Autoria(s): Nos Aguilà, Oriol; Frigeri, Paolo Antonio; Bertomeu i Balagueró, Joan
Contribuinte(s)

Universitat de Barcelona

Resumo

The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.

Identificador

http://hdl.handle.net/2445/61845

Idioma(s)

eng

Publicador

Elsevier

Direitos

(c) Elsevier, 2015

info:eu-repo/semantics/openAccess

Palavras-Chave #Deposició química en fase vapor #Silici #Catàlisi #Pel·lícules fines #Chemical vapor deposition #Silicon #Catalysis #Thin films
Tipo

info:eu-repo/semantics/article

info:eu-repo/semantics/acceptedVersion