Technological solution for the automatic replacement of the catalytic filaments in HWCVD
Contribuinte(s) |
Universitat de Barcelona |
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Resumo |
The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions. |
Identificador | |
Idioma(s) |
eng |
Publicador |
Elsevier |
Direitos |
(c) Elsevier, 2015 info:eu-repo/semantics/openAccess |
Palavras-Chave | #Deposició química en fase vapor #Silici #Catàlisi #Pel·lícules fines #Chemical vapor deposition #Silicon #Catalysis #Thin films |
Tipo |
info:eu-repo/semantics/article info:eu-repo/semantics/acceptedVersion |