Study of thin-film SO2 gas sensors by photometric and ellipsometric methods

Pt-, Pd-, and Zr-doped SnO2 thin films and dopant-free VOx films were fabricated by planar magnetron sputtering. Tests for sensitivity to SO2 for all samples were conducted at 180 degreesC, and the sensitivities were investigated ex situ with photometric and ellipsometric methods at room temperature. It was found that the optical sensitivities as well as the sensitive wavelength region for SnO2 films could be tuned by doping. The Pd-doped SnO2 films had good sensitivity in the visible range, and the Zr-doped in the near IR. The dominant sensitive wavelength region for VOx films fell into the visible range, and the ratio of the sensitivity in the visible to that in the near IR increased with O-2/Ar in the depositing atmosphere. (C) 2001 society of Photo-Optical instrumentation Engineers .

Effect of chromium intermediate layer on properties of silver coatings

Coatings with layer structures of Ag/glass, Ag/Cr/glass, and Ag/Cr-Ag/Cr/glass deposited with magnetron sputtering are investigated. The results indicate that the performance for reflectance, hardness, adherence, and humidity durability of the silver coatings with Ag/Cr/glass and Ag/Cr-Ag/Cr/glass structures are better than pure silver film. In addition, the silver coatings with an Ag/Cr-Ag/glass structure present more advantages than that of the Ag/Cr/glass. Reasons are analyzed accordingly. (C) 2004 Society of Photo-Optical Instrumentation Engineers.

离子束溅射法薄膜生长中结瘤微缺陷的生长机理

用离子束溅射法制备了锆单层薄膜．用设计新型夹具和预置种子方法，对薄膜中结瘤微缺陷的生长过程进行了研究．在高分辨率光学显微镜和扫描电子显微镜下观察发现，结瘤在其生长初期呈现出分形的特征．用分子动力学和薄膜生长的扩散限制聚集模型，薄膜中结瘤微缺陷成核时的分形现象得到了很好的解释．

微缺陷对薄膜滤光片环境稳定性的影响

用热蒸发方法沉积了薄膜滤光片．并将样品分别在去离子水中浸泡10天和30天．通过分光光度计、光学暗场显微镜、及扫描电子显微镜等多种测试手段，对诱导透射滤光片在潮湿环境下的稳定性进行了研究．实验发现，在潮湿环境下滤光片产生的膜层分离都是从薄膜中微缺陷点处开始发生和发展的，微缺陷是影响滤光片环境稳定性的重要原因之一，其中杂质和针孔是滤光片中两种最常见的微缺陷．EDS能谱分析进一步表明，薄膜中杂质缺陷成分即为Al2O3膜料本身，所以不能推测，薄膜沉积中的喷溅可能是微缺陷产生的根本原因，抑制喷溅可以有效提高薄膜滤光

磁控反应溅射法制备渐变折射率薄膜的模型分析

阐述了磁控反应溅射法制备渐变折射率薄膜的机理；探讨了磁控反应溅射法制备渐变折射率薄膜的理论模型，给出了渐变折射率薄膜的折射率与反应气体分压的关系，在一定的沉积参数下，由要得到的膜层折射率随膜层几何厚度的变化规律可推导出反应气体分压比随时间的变化规律；最后以制备折射率线性变化的薄膜为例说明了如何推导得到反应气体分压比随时间的变化规律．

Influence of buffer layer thickness on the structure and optical properties of ZnO thin films

A series of ZnO thin films were deposited on ZnO buffer layers by DC reactive magnetron sputtering. The buffer layer thickness determination of microstructure and optical properties of ZnO films was investigated by X-ray diffraction (XRD), photoluminescence (PL), optical transmittance and absorption measurements. XRD results revealed that the stress of ZnO thin films varied with the buffer layer thickness. With the increase of buffer layer thickness, the band gap edge shifted toward longer wavelength. The near-band-edge (NBE) emission intensity of ZnO films deposited on ZnO buffer layer also varied with the increase of thickness due to the spatial confinement increasing the Coulomb interaction between electrons and holes. The PL measurement showed that the optimum thickness of the ZnO buffer layer was around 12 nm. (c) 2005 Elsevier B.V. All rights reserved.

Mo原子溅射能量对Mo／Si薄膜微结构的影响

用磁控溅射法制备了Mo／Si薄膜，用AFM和XRD分别研究了Mo原子的溅射能量不同时，Mo／Si薄膜表面形貌和晶相的变化。通过比较发现，随着Mo原子溅射能量的增大，Mo／Si薄膜表面粗糙度增加，Mo和Si的特征X射线衍射峰也越来越强，并且Mo膜层和Si膜层之间生成了Mo-Si2。Mo原子的溅射能量是诱导非晶Si结晶和MoSi2生成的主要原因。

Measurements of light scattering from glass substrates by total integrated scattering

A total integrated scattering (TIS) measurement was performed to investigate the surface and volume scattering of K9 glass substrates with low reflectance. Ag layers with thicknesses of 60 nm were deposited on the front and back surfaces of the K9 glass substrates by the magnetron sputtering technique. Surface scattering of the K9 glass substrate was obtained by the TIS measurement of the Ag layers on the assumption that the Ag layers and the K9 substrate had the same surface profile. Volume scattering of the substrates was deduced by subtracting the front and back surface scattering from the total scattering of the substrates. (c) 2005 Optical Society of America.

磁控溅射不同厚度银膜的微结构及其光学常数

Ag films with different thickness from 8.2nm to 107.2nm were prepared by DC sputtering deposition and analyzed by X-ray diffraction with the help of optimization program on computer. Microstructrue analysis shows that the films are made of fcc-Ag particles. With the increase of thickness, the mean size of Ag particles increases and the interplaner spacing decreases gradually. The optical constants computed by computer program shows that n value decreases quickly with the increasing thickness below 17.5nm and k value changes in reverse, and then go steadily when the thickness is larger than 17.5nm at the wavelength of 550mn.

Negative dispersion mirrors in Ta2O5/: SiO2 for femtosecond Ti : Sapphire lasers by using gires-tournois interferometers

We design and experimentally demonstrate some negative dispersion mirrors with optimized Gires-Tournois interferometers. The mirror structure is composed of 38 alternating Ta2O5 and SiO2 layers and could be regarded as two sections: high-reflectivity section consisting of a series of quarter-wavelength optical thickness stacks and negative-dispersion section consisting of only 13 layers. The designed mirrors exhibit the expected performance. These mirrors were fabricated by using ion beam sputtering. By adopting such mirrors, dispersion of a mode-locked femtosecond Ti:sapphire laser has been compensated for mostly. With two series of the mirrors, 32 fs and 15 fs pulses have been obtained respectively.

Defect-induced failure of optical coating filters

Optical filters composed of Ag, Al2O3, and ZnSe films were prepared on BK7 substrates by evaporation. By employing spectrophotometer, microscope, scanning electron microscope (SEM), and energy dispersive spectrum (EDS) analysis, the moisture-dependent stability of the samples was tested. The experimental results revealed that filter failure often occurs initially at defect sites. Small sputtering particles and pinhole are found to be two types of defects that induced the optical coating filter failure. The mechanisms of the defect-induced failure of the filters also are discussed in the article. (C) 2005 Elsevier Ltd. All rights reserved.

Influence of different post-treatments on the structure and optical properties of zinc oxide thin films

Zinc oxide (ZnO) films with c-oriented were grown on fused quartz glass substrates at room temperature using dc reactive magnetron sputtering. The as-grown films were annealed at 700 degrees C in air and bombarded by ion beam, respectively. The effects of post-treatments on the structural and optical properties of the ZnO films were investigated by X-ray diffraction (XRD), photoluminescence (PL), optical transmittance and absorption measurements. The XRD spectra indicate that the crystal quality of ZnO films has been improved by both the post-treatments. Compared with the as-grown sample, both annealed and bombarded samples exhibited blueshift in the UV emission peaks, and a strong green emission was found in the annealed ZnO film. In both optical transmittance and absorption spectra, a blueshift of the band-gap edge was observed in the bombarded film, while a redshift was observed in the annealed film. (c) 2004 Elsevier B.V. All rights reserved.

The effects of oxygen partial pressure on the optical absorption edge and the UV emission energy of ZnO films

The optical absorption edge and ultraviolet (UV) emission energy of ZnO films deposited by direct current (DC) reactive magnetron sputtering at room temperature have been investigated. With the oxygen ratio increasing, the structure of films changes from zinc and zinc oxide coexisting phase to single-phase ZnO and finally to the highly (002) orientation. Both the grain size and the stress of ZnO film vary with the oxygen partial pressure. Upon increasing the oxygen partial pressure in the growing ambient, the visible emission in the room-temperature photoluminescence spectra was suppressed without sacrificing the band-edge emission intensity in the ultraviolet region. The peaks of photoluminescence spectra were located at 3.06---3.15 eV. From optical transmittance spectra of ZnO films, the optical band gap edge was observed to shift towards shorter wavelength with the increase of oxygen partial pressure.

钛宝石激光器中用优化Gires-Tournois镜产生15fs脉冲

根据飞秒脉冲锁模钛宝石激光器脉冲压缩的要求，介绍了负色散镜补偿色散的基本原理及其特点。详细阐述了优化Gires-Tournois(OG-T)镜的设计过程，并通过计算机优化得到理想设计膜系。采用离子束溅射的方法镀制了优化Gires—Tournois镜。测量了优化Gires-Tournois镜(编号为OGT#1)的透射率和群延迟色散，并与设计值进行了比较，分析了实测值产生偏差的原因，从而对镀膜参量进行了相应的调整，制造了第二批优化Gires—Tournois镜(编号为OGT#2)。将优化Gires—Tourn

Advanced techniques for diagnostics and control applied to particle accelerators

201 p.