Measurement of the radiation energy in the radio signal of extensive air showers as a universal estimator of cosmic-ray energy.

We measure the energy emitted by extensive air showers in the form of radio emission in the frequency range from 30 to 80 MHz. Exploiting the accurate energy scale of the Pierre Auger Observatory, we obtain a radiation energy of 15.8 +/- 0.7 (stat) +/- 6.7 (syst) MeV for cosmic rays with an energy of 1 EeV arriving perpendicularly to a geomagnetic field of 0.24 G, scaling quadratically with the cosmic-ray energy. A comparison with predictions from state-of-the-art first-principles calculations shows agreement with our measurement. The radiation energy provides direct access to the calorimetric energy in the electromagnetic cascade of extensive air showers. Comparison with our result thus allows the direct calibration of any cosmic-ray radio detector against the well-established energy scale of the Pierre Auger Observatory.

The impact of the air-fluorescence yield on the reconstructed shower parameters of ultra-high energy cosmic rays.

An accurate knowledge of the fluorescence yield and its dependence on atmospheric properties such as pressure, temperature or humidity is essential to obtain a reliable measurement of the primary energy of cosmic rays in experiments using the fluorescence technique. In this work, several sets of fluorescence yield data (i.e. absolute value and quenching parameters) are described and compared. A simple procedure to study the effect of the assumed fluorescence yield on the reconstructed shower parameters (energy and shower maximum depth) as a function of the primary features has been developed. As an application, the effect of water vapor and temperature dependence of the collisional cross section on the fluorescence yield and its impact on the reconstruction of primary energy and shower maximum depth has been studied. Published by Elsevier B.V.

Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing

Microwave annealing is an emerging technique for achieving ordered patterns of block copolymer films on substrates. Little is understood about the mechanisms of microphase separation during the microwave annealing process and how it promotes the microphase separation of the blocks. Here, we use controlled power microwave irradiation in the presence of tetrahydrofuran (THF) solvent, to achieve lateral microphase separation in high- lamellar-forming poly(styrene-b-lactic acid) PS-b-PLA. A highly ordered line pattern was formed within seconds on silicon, germanium and silicon on insulator (SOI) substrates. In-situ temperature measurement of the silicon substrate coupled to condition changes during "solvo-microwave" annealing allowed understanding of the processes to be attained. Our results suggest that the substrate has little effect on the ordering process and is essentially microwave transparent but rather, it is direct heating of the polar THF molecules that causes microphase separation. It is postulated that the rapid interaction of THF with microwaves and the resultant temperature increase to 55 degrees C within seconds causes an increase of the vapor pressure of the solvent from 19.8 to 70 kPa. This enriched vapor environment increases the plasticity of both PS and PLA chains and leads to the fast self-assembly kinetics. Comparing the patterns formed on silicon, germanium and silicon on insulator (SOI) and also an in situ temperature measurement of silicon in the oven confirms the significance of the solvent over the role of substrate heating during "solvo-microwave" annealing. Besides the short annealing time which has technological importance, the coherence length is on a micron scale and dewetting is not observed after annealing. The etched pattern (PLA was removed by an Ar/O-2 reactive ion etch) was transferred to the underlying silicon substrate fabricating sub-20 nm silicon nanowires over large areas demonstrating that the morphology is consistent both across and through the film.

Magnetically Biased Graphene Based Switches for Microwave Applications

This paper presents a magnetically biased graphene based switch for CPW resonator applications. Graphene patches are set in the gap between signal and ground lines, thus obtaining the whole structures act as switchable elements. Graphene was modeled as a general material with appropriate surface conductivity. The presented CPW resonator structure acts like a switch in ON state even for magnetic bias field of around 0.5 T. The simulated S parameters of the CPW resonator structure with different magnetic field biasing are presented.

Microwave-Assisted Process For The Preparation of Microneedle Arrays.

A microwave (MW)-assisted crosslinking process to prepare hydrogel-forming microneedle (MN) arrays was evaluated. The effects of the crosslinking process on the MN arrays characteristics was evaluated. The results suggest that MN arrays prepared using the MW assisted process had equivalent properties to those prepared conventionally, but can be produced 30 times faster.

The adaption of microwave heating to the rotational moulding process

This paper details the results from a large European Union rotomoulding research project on the adaptation and development of industrial microwave oven technology to the rotational moulding process. Following computer modelling, an industrial scale microwave oven was specifically designed, manufactured and attached to the drop-arm of a convention rotational moulding machine where extensive moulding trials were carried out. The design and development of the microwave oven and test mould, together with the savings in terms of energy efficiency and mould heating rate that were achieved are discussed.

Microwave Synthesis of Short-Chained Fluorinated Ionic Liquids and Their Surface Properties

Microwave synthesis is shown to be a valuable route to novel fluorinated ionic liquid surfactants. 1-Methyl-3-(3,3,4,4,5,5,6,6,6-nonafluorohexyl)imidazolium iodide was prepared by treatment of 1-methylimidazole with 1-iodo-1H,1H,2H,2H-perfluorohexane in a microwave reactor, and this product underwent anion exchange to yield 1-methyl-3-(3,3,4,4,5,5,6,6,6-nonafluorohexyl)imidazolium nonafluoro-1-butanesulfonate. This catanionic surfactant showed intriguing phase behavior and low surface tension.

Microwave Plasma Assisted ALD Development for the Deposition of Gate Oxides & ALD of High-k Dielectrics

The semiconductor industry's urge towards faster, smaller and cheaper integrated circuits has lead the industry to smaller node devices. The integrated circuits that are now under volume production belong to 22 nm and 14 nm technology nodes. In 2007 the 45 nm technology came with the revolutionary high- /metal gate structure. 22 nm technology utilizes fully depleted tri-gate transistor structure. The 14 nm technology is a continuation of the 22 nm technology. Intel is using second generation tri-gate technology in 14 nm devices. After 14 nm, the semiconductor industry is expected to continue the scaling with 10 nm devices followed by 7 nm. Recently, IBM has announced successful production of 7 nm node test chips. This is the fashion how nanoelectronics industry is proceeding with its scaling trend. For the present node of technologies selective deposition and selective removal of the materials are required. Atomic layer deposition and the atomic layer etching are the respective techniques used for selective deposition and selective removal. Atomic layer deposition still remains as a futuristic manufacturing approach that deposits materials and lms in exact places. In addition to the nano/microelectronics industry, ALD is also widening its application areas and acceptance. The usage of ALD equipments in industry exhibits a diversi cation trend. With this trend, large area, batch processing, particle ALD and plasma enhanced like ALD equipments are becoming prominent in industrial applications. In this work, the development of an atomic layer deposition tool with microwave plasma capability is described, which is a ordable even for lightly funded research labs.

Applications of Microwave Antenna Array for Wireless Power Transmission and Radar Imaging in Complex Environment

Thesis (Ph.D.)--University of Washington, 2016-08

Cosmic Topologies of Imitation: From the Horror of Digital Autotoxicus to the Auto-Toxicity of the Social

This article expands on an earlier concept of horror autotoxicus linked to digital contagions of spam and network Virality.1 It aims to present, as such, a broader conception of cosmic topologies of imitation (CTI) intended to better grasp the relatively new practices of social media marketing. Similar to digital autotoxicity, CTI provide the perfect medium for sharing while also spreading contagions that can potentially contaminate the medium itself. However, whereas digital contagions are perhaps limited to the toxicity of a technical layer of information viruses, the contagions of CTI are an all pervasive auto-toxicity which can infect human bodies and technologies increasingly in concert with each other. This is an exceptional autotoxicus that significantly blurs the immunological line of exemption between self and nonself, and potentially, the anthropomorphic distinction between individual self and collective others.

Highly efficient and reusable CNT supported iron(II) catalyst for microwave assisted alcohol oxidation

The highly efficient eco-friendly synthesis of ketones (yields over 99%) from secondary alcohols is achieved by combination of [FeCl2{eta(3)-HC(pz)(3)}] (pz = pyrazol-1-yl) supported on functionalized multi-walled carbon nanotubes and microwave irradiation, in a solvent-free medium. The carbon homoscorpionate iron(II) complex is the first one of this class to be used as catalyst for the oxidation of alcohols.

Difference between satellite microwave systems and "in situ" soil moisture data

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