Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation

ZrO2, films were deposited by electron-beam evaporation with the oxygen partial pressure varying from 3 X 10(-3) Pa to I I X 10(-3) Pa. The phase structure of the samples was characterized by x-ray diffraction (XRD). The thermal absorption of the films was measured by the surface thermal lensing technique. A spectrophotometer was employed to measure the refractive indices of the samples. The laser-induced damage threshold (LIDT) was assessed using a 1064, nm Nd: yttritium-aluminium-garnet pulsed laser at pulse width of 12 ns. The influence of oxygen partial pressure on the microstructure and LIDT of ZrO2 films was investigated. XRD data revealed that the films changed from polycrystalline to amorphous as the oxygen partial pressure increased. The variation of refractive index at 550 nm wavelength indicated that the packing density of the films decreased gradually with increasing oxygen partial pressure. The absorptance of the samples decreased monotonically from 125.2 to 84.5 ppm with increasing oxygen partial pressure. The damage threshold, values increased from 18.5 to 26.7 J/cm(2) for oxygen partial pressures varying from 3 X 10(-3) Pa to 9 X 10(-3) Pa, but decreased to 17.3 J/cm(2) in the case of I I X 10(-3) Pa. (C) 2005 American Vacuum Society.

HfO2 膜料中的杂质对薄膜损伤及性能的影响

By analysis of impurity elements in HfO2 coating material, the influence of main impurity elements on the characteristic of coatings were studied. The results indicate that the metal elements and absorptive dielectric elements damage the HfO2 coatings. The more the Zr element content is, the more the absorption is for the coatings in ultraviolet wave. The negative ion element will become the gas source center and form an ejection in the process of evaporation of coating material, so decrease the damage threshold of the coatings.

斜角入射沉积法制备渐变折射率薄膜的理论探讨

从理论上分析了单一膜料倾斜入射沉积时的折射率与填充密度的关系，给出了三种不同的表达式；然后从正变和负变、完整周期和存在半周期以及不同的周期数等几个方面探讨了膜层的填充密度按照线性变化时的渐变折射率薄膜的光学特性，并将折射率的不同理论表达式对光学特性的影响进行了对比，最后讨论了单一膜料倾斜入射沉积渐变折射率薄膜的方法、填充密度线性变化时的渐变折射率薄膜的应用及制备中需要进一步解决和处理的问题．

磁控反应溅射法制备渐变折射率薄膜的模型分析

阐述了磁控反应溅射法制备渐变折射率薄膜的机理；探讨了磁控反应溅射法制备渐变折射率薄膜的理论模型，给出了渐变折射率薄膜的折射率与反应气体分压的关系，在一定的沉积参数下，由要得到的膜层折射率随膜层几何厚度的变化规律可推导出反应气体分压比随时间的变化规律；最后以制备折射率线性变化的薄膜为例说明了如何推导得到反应气体分压比随时间的变化规律．

共蒸法制备非均匀膜的速率控制分析

渐变折射率薄膜，又称为非均匀膜。利用德鲁德理论分析了混合介质膜的介电常量与各个膜料的介电常量之间的关系，介绍了共蒸法制备非均匀膜的制备机理。对混合膜的沉积速率为两种膜料的沉积速率之和的情况，分别从两种膜料的单分子体积是否相等和总的沉积速率是否为常数两个方面，探讨了双源共蒸法制备的非均匀膜的折射率分布规律与膜料的沉积速率之间的关系，并给出了几种常见的折射率分布如线性变化、正弦变化、指数变化和双曲变化规律的膜料沉积速率表达式。最后以混合介质膜的总沉积速率为常数、折射率按照线性变化为例进行了说明。

线性共蒸法制备渐变折射率薄膜的光学特性分析

利用德鲁德理论和洛伦兹一洛伦茨理论，从介电常数分析人手，探讨了混合介质膜的折射率表达式，给出利用双源共蒸法镀制的渐变折射率薄膜在混合介质膜的总沉积速率恒定、两种膜料的单分子大小近似相等和沉积速率均为线性变化时的折射率表达式；从正变和负变、单周期和多周期、不同的周期数和不同的单周期厚度几个方面对渐变折射率薄膜的光学特性进行了模拟分析和讨论；对渐变折射率薄膜的实现、应用以及实验制备中有待进一步解决和处理的问题进行了讨论。

Investigation of laser-induced damage on multi-layer dielectric gratings

We investigate mechanisms of laser induced damage thresholds (LIDTs) of multi-layer dielectric gratings (AIDG,). It is found that the laser damage thresholds of MDGs and unstructured dielectric multi-layer coatings (the substrate of MDG) are 3.15J/cm(2) and 9.32 J/cm(2), respectively, at 1064nm (12ns) with the Littrow angle 51.2 degrees and the TEM00 mode. The laser-induced damage mechanism of multi-layer dielectric is presented with the analysis of the following factors: The dominant factor is the pollution on the corrugated surface, which is induced by the complex manufacture process of multi-layer dielectric gratings; another is the electric field distribution along the corrugated surface. The third reason is due to the reduction in stoichiometry of oxide films, resulting from the manufacture process of etching.

Wideband antireflection film fabricated by glancing angle deposition

Graded-index ZrO2 films has been fabricated on K9 glass by glancing angle deposition. Because the index mismatch at the interface has been reduced, the film results in wideband high-transmission antireflection. From 400nm to 1200nm, the film reflection is lower than 0.8% and the lowest value is 0.2% at 432nm.

Nonpolarizing and polarizing filter design

We describe a nonpolarizing filter design at oblique incidence and a polarizing filter design at normal incidence that use a uniaxially anisotropic layer. The phase thicknesses and the optical admittances of 14 the layers are compensated for by the birefringent properties of a thin film at oblique incidence. This concept can be applied to the design of nonpolarizing bandpass and edge filters at oblique incidence and of polarizing beam splitters at normal incidence. Besides, the dependence of narrow-bandpass filters on normal incidence is discussed. (c) 2005 Optical Society of America.

Design of anisotropic reflector with birefringent thin films

A novel design for dielectric anisotropic mirrors with birefringent thin films for normal incidence is presented. This mirror consists of a stack of quarter-wave biaxial layers. The biaxial anisotropic layers can be fabricated by oblique deposition. The reflectance is different for two linear polarizations of light incidence on the mirrors. As a numerical example, the design is carried out on glass with TiO2 and ZrO2. These thin films could be applied to anisotropic reflective devices for lasers.

Optical, structural and laser-induced damage threshold properties of HfO2 thin films prepared by electron beam evaporation

We prepare HfO2 thin films by electron beam evaporation technology. The samples are annealed in air after deposition. With increasing annealing temperature, it is found that the absorption of the samples decreases firstly and then increases. Also, the laser-induced damage threshold (LIDT) increases firstly and then decreases. When annealing temperature is 473K, the sample has the highest LIDT of 2.17J/cm(2), and the lowest absorption of 18 ppm. By investigating the optical and structural characteristics and their relations to LIDT, it is shown that the principal factor dominating the LIDT is absorption.

Thermodynamic damage mechanism of transparent films caused by a low-power laser

A new model for analyzing the laser-induced damage process is provided. In many damage pits, the melted residue can been found. This is evidence of the phase change of materials. Therefore the phase change of materials is incorporated into the mechanical damage mechanism of films. Three sequential stages are discussed: no phase change, liquid phase change, and gas phase change. To study the damage mechanism and process, two kinds of stress have been considered: thermal stress and deformation stress. The former is caused by the temperature gradient and the latter is caused by high-pressure drive deformation. The theory described can determine the size of the damage pit. (c) 2006 Optical Society of America.

离子束辅助技术获得高激光损伤阈值的增透膜

采用合适的离子束辅助沉积（IBAD）参数在K9基底上镀制了高激光损伤阈值的中心波长1053nm的增透膜，分别从光谱性能、吸收性能、抗激光损伤阈值（LIDT）以及退火后的影响等方面与未进行离子束辅助沉积的薄膜进行对比分析。实验结果发现，采用离子辅助制备的薄膜放置80d后具有更好的光谱稳定性，与未进行离子束辅助镀制的薄膜相比，平均吸收下降了57％，吸收值偏高的奇异点明显减少；损伤阈值提高了60％，用Leica偏振光学显微镜观察50％损伤几率的能量下破斑形貌，发现经过离子束辅助制备的样品破斑形状整齐且缺陷点少；

斜角入射沉积法制备渐变折射率薄膜的折射率分析

斜角入射沉积法是一种制备薄膜的新颖方法，它可以用来制备渐变折射率薄膜．本文首先探讨了膜料的沉积入射角为α，薄膜柱状生长倾斜角为β时的薄膜的填充系数；之后利用drude理论，分析研究了斜角入射沉积法制备渐变折射率薄膜的折射率与薄膜的入射角和生长方向的关系．

重复率激光作用下光学薄膜损伤的累积效应

使用脉宽12ns，频率10Hz的1064nm调Q Nd：YAG激光器，研究了高反射膜在重复率激光作用下的损伤的累积效应。实验发现，高反射膜的损伤阈值随辐照脉冲数增加而降低，表现出明显的累积效应。通过对损伤阈值和损伤概率以及辐照次数的统计性研究．并结合单脉冲辐照的结果，说明了存在于薄膜中微小的缺陷参与了多脉冲激光对薄膜的损伤过程。可用预损伤机制解释实验结果。得到了关于IBS制备的高反射膜的损伤阈值和照射次数的关系式，并用实验结果进行验证．发现具有很好的一致性。实验过程中样品的损伤形貌通过Nomarski偏光