HfO2 膜料中的杂质对薄膜损伤及性能的影响


Autoria(s): Wu SG; 邵建达; Yi K; Zhao YN; 范正修
Data(s)

2006

Resumo

By analysis of impurity elements in HfO2 coating material, the influence of main impurity elements on the characteristic of coatings were studied. The results indicate that the metal elements and absorptive dielectric elements damage the HfO2 coatings. The more the Zr element content is, the more the absorption is for the coatings in ultraviolet wave. The negative ion element will become the gas source center and form an ejection in the process of evaporation of coating material, so decrease the damage threshold of the coatings.

Identificador

http://ir.siom.ac.cn/handle/181231/4164

http://www.irgrid.ac.cn/handle/1471x/12659

Idioma(s)

中文

Fonte

Wu SG;邵建达;Yi K;Zhao YN;范正修.HfO2 膜料中的杂质对薄膜损伤及性能的影响,稀有金属材料与工程,2006,35(5):757-760

Palavras-Chave #光学薄膜 #HfO2 coating material #impurities #metal element #absorption dielectric #Zr element #negative ion element
Tipo

期刊论文