Improvement in refractive-index change in LiNbO3 : Ce : Cu by applying an external electric field

By jointly solving two-centre material equations with a nonzero external electric field and coupled-wave equations, we have numerically studied the dependence of the non-volatile holographic recording in LiNbO3:Ce:Cu crystals on the external electric field. The dominative photovoltaic effect of the non-volatile holographic recording in doubly doped LiNbO3 crystals is directly verified. And an external electric field that is applied in the positive direction along the c-axis (or a large one in the negative direction of the c-axis) in the recording phase and another one that is applied in the negative direction of the c-axis in the fixing phase are both proved to benefit strong photorefractive performances. Experimental verifications are given with a small electric field applied externally.

采用紫外光提高双掺杂铌酸锂晶体中全息记录的灵敏度和光栅强度

提出了一种在双掺杂铌酸锂晶体中用调制的双紫外光进行非挥发全息记录的方法。与通常的用紫外光敏化的非挥发全息记录相比，这种方法可以大幅度地提高光栅强度和记录灵敏度。联立双中心物质方程和双光束耦合波方程，数值分析了光栅强度和衍射效率随时间的变化并讨论了掺杂浓度和记录光强对紫外光非挥发全息记录机制下光折变效应的影响。研究发现，紫外光记录得到的深浅中心的光栅具有相同的相位，总的光栅（深浅中心光栅的叠加）强度为两光栅强度之和，固定过程中深中心的光栅得到增强；增大深浅中心掺杂的浓度可以提高光栅强度，增大记录紫外光的光强

Polarizing beam splitter of a deep-etched fused-silica grating

We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. Tb achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications. (C) 2007 Optical Society of America

双中心全息记录的矢量分析与记录方向优化

对描述双掺杂晶体非挥发性全息记录动力学过程的Kukhtarev方程进行了矢量分析, 分析中考虑了体光生伏特效应和外加电场的作用。在小信号近似的基础上给出了双中心全息记录中记录与固定阶段空间电荷场的矢量解析解。在综合考虑空间电荷场的各向异性以及晶体有效电光系数的各向异性后, 给出了双中心全息记录的优化记录方向。结果表明, 对(Fe, Mn):LiNbO3晶体633 nm寻常光记录, 优化记录方向主要由有效电光系数决定, 光栅波矢与光轴夹角为22°, 方位角为30°;对(Fe, Mn):LiNbO3晶体633

90°全息记录衍射效率分析与提高

对光折变全息记录特别是双中心全息记录中90°记录结构下较低的衍射效率进行了研究, 采用局域衍射理论对90°记录结构的衍射进行了分析,表明在同样的折射率变化和2 mm的光束宽度的情况下, 只有当折射率光栅振幅大于10-4时, 90°记录结构衍射效率才能够与小角度透射记录结构的衍射效率大致相当。针对环境干扰导致的干涉条纹振动影响光栅记录, 提出了有效调制度概念, 根据分析90°记录结构的干涉条纹间距很小, 容易受外界环境干扰而导致低的折射率变化率, 因此应采用主动条纹锁定系统。此外在双中心全息记录中, 微观光

Wideband two-port beam splitter of a binary fused-silica phase grating

The usual beam splitter of multilayer-coated film with a wideband spectrum is not easy to achieve. We describe the realization of a wideband transmission two-port beam splitter based on a binary fused-silica phase grating. To achieve high efficiency and equality in the diffracted 0th and -1st orders, the grating profile parameters are optimized using rigorous coupled-wave analysis at a wavelength of 1550 nm. Holographic recording and the inductively coupled plasma dry etching technique are used to fabricate the fused-silica beam splitter grating. The measured efficiency of (45% x 2) = 90% diffracted into the both orders can be obtained with the fabricated grating under Littrow mounting. The physical mechanism of such a wideband two-port beam splitter grating can be well explained by the modal method based on two-beam interference of the modes excited by the incident wave. With the high damage threshold, low coefficient of thermal expansion, and wideband high efficiency, the presented beam splitter etched in fused silica should be a useful optical element for a variety of practical applications. (C) 2008 Optical Society of America.

Three-port beam splitter of a binary fused-silica grating

A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values. (c) 2008 Optical Society of America.

Deep silicon grating as high-extinction-ratio polarizing beam splitter

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (PBS) at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection (TIR) by using the rigorous coupled wave analysis (RCWA). The extinction ratio of the rectangular PBS grating can reach 2.5×105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. The effciencies of TM-polarized wave in the 0th order and TE-polarized wave in the −1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma (ICP) etching could be used to fabricate the silicon PBS grating.

Photobleaching process of xanthene dyes initiated by N-phenylglycine in the polyvinylalcohol film

The parameters such as quantum yield and molar absorption coefficients of the photoinitiator that are responsible for holographic sensitivity in photopolymer material are investigated with a single beam exposure experiment. The influence of exposure intensity, the concentrations of N-phenylglycine and dye on the photobleaching process of xanthenes dyes are presented. In addition, the effect of diphenyliodonium hexafluorophosphate salt on the quantum yield and molar absorption of xanthene dyes is studied. (c) 2005 Elsevier Ltd. All rights reserved.

Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering

The NiOx thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O-2 with the relative O-2 content 5%. The as-deposited NiOx, thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni2O3. Decomposition temperature of the as-deposited NiO, thin films was at about 263 degrees C. After annealed at 400 degrees C for 30 min in air, the surface morphology of the films became very rough due to the decomposition of the Ni2O3, leading to the changes of the optical properties of the NiO, thin films. The reflectivity of the films annealed at 400 degrees C was lower than that of the as-deposited one and the optical contrast was 52% at 405 nm. (c) 2006 Elsevier B.V. All rights reserved.

沢吨染料的光化漂白动力学及全息特性研究

研究了以三乙醇胺作为引发剂,五种沢吨染料的光化漂白过程.实验结果表明五种染料的光化漂白速率大小顺序是藻红B（ErB）＞曙红Y（EY）＞孟加拉玫瑰红B（RsB）＞罗丹明B（RoB）＞荧光素（F）.并研究了曝光强度及染料浓度对漂白过程的影响,以及这五种染料的全息记录性能.

一种核黄素敏化的宽带全息记录材料

制备了一种核黄素敏化的以聚乙烯醇为基质的新型全息存储材料，并研究了材料的全息特性,用Ar^＋激光器激发的488nm的蓝光对材料曝光，结果表明该材料具有较高的衍射效率和曝光灵敏度，衍射效率高达53％，灵敏度为3．3cm^2／J，折射率调制度为4．5×10^-4研究了材料的透过率与随时间和入射角度变化的关系，说明在曝光记录过程中有噪音光栅生成．在存储介质膜中存储了全息图像，再现图像较为清晰，说明该材料适合用作高密度全息存储介质．

氧化物记录介质在光存储中的应用及其研究进展

系统总结了用于光存储记录层的氧化物薄膜的存储机理、存储特性以及最新进展，讨论了氧化物掺杂对提高存储性能的影响，指出了氧化物薄膜存在的不足，并探讨了可能的改善途径。在此基础上对存储材料的发展趋势及氧化物材料的研究前景进行了展望。

Development of pure and doped gamma ferric oxide

Optimum conditions and experimental details for the formation of v-Fe203 from goethite have been worked out. In another method, a cheap complexing medium of starch was employed for precipitating acicular ferrous oxalate, which on decomposition in nitrogen and subsequent oxidation yielded acicular y-Fe203. On the basis of thermal decomposition in dry and moist nitrogen, DTA, XRD, GC and thermodynamic arguments, the mechanism of decomposition was elucidated. New materials obtained by doping ~'-Fe203 with 1-16 atomic percent magnesium, cobalt, nickel and copper, were synthesised and characterized

Multi-wavelength holography in Bi12TiO20 crystals: Applications in refractometry

We present a recent development in holography with multimode, large free-spectral range (FSR) diode lasers in photorefractive sillenite crystals. A novel refractometry method based on this type of holographic recording in Bi12TiO20 (BTO) crystals is proposed. The holographic image of a prism-shaped transparent sample appears covered of interference fringes, and as the sample is properly translated, the fringes run along the holographic image. An expression providing the refractive index of the medium as a function of the sample displacement and the correspondent number of running fringes was derived. The refractive indexes of optical (BK7) glass, ethanol, hexan, cumene and aqueous solution of NaCl with different concentrations were measured in order to test the method. The obtained results are in good agreement with the ones reported in literature or measured by us using a commercial Abbe refractometre. (c) 2006 Elsevier B.V. All rights reserved.