氧化物记录介质在光存储中的应用及其研究进展


Autoria(s): 蒋志; 耿永友; 顾冬红; 周莹; 翟凤潇
Data(s)

2007

Resumo

系统总结了用于光存储记录层的氧化物薄膜的存储机理、存储特性以及最新进展,讨论了氧化物掺杂对提高存储性能的影响,指出了氧化物薄膜存在的不足,并探讨了可能的改善途径。在此基础上对存储材料的发展趋势及氧化物材料的研究前景进行了展望。

The recording mechanism, recording performances and recent development of oxide thin films used in optical recording systems are systematically summarized. The effect of doping oxide thin films on improving recording performances is also discussed. Then the problems in oxide thin films and possible improvements are proposed. Finally, the developing tendency of storage materials and the application prospect of oxide thin films for optical data storage are previewed.

Identificador

http://ir.siom.ac.cn/handle/181231/4007

http://www.irgrid.ac.cn/handle/1471x/11384

Idioma(s)

中文

Fonte

蒋志;耿永友;顾冬红;周莹;翟凤潇.氧化物记录介质在光存储中的应用及其研究进展,激光与光电子学进展,2007,44(8):62-67

Palavras-Chave #光存储 #光存储 #氧化物薄膜 #存储材料 #记录机理 #optical storage #oxide thin films #recording materials #recording mechanism
Tipo

期刊论文