Three-port beam splitter of a binary fused-silica grating
Data(s) |
2008
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Resumo |
A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values. (c) 2008 Optical Society of America. National Natural Science Foundation of China [60878035]; Shanghai Science and Technology Committee [07SA14] |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Feng Jijun;周常河;Wang Bo;郑将军;Jia Wei;Cao Hongchao;Lv Peng .,Appl. Optics,2008,47(35):6638-6643 |
Palavras-Chave | #Analytical expressions #Beam splitters #Grating designs #Grating profiles #Holographic recordings #Inductively coupled plasma etchings #Modal methods #Phase gratings #Polarization independents #Rigorous coupled-wave analysis #Theoretical values |
Tipo |
期刊论文 |