Influence of LiB3O5 structure on microstructure and optical properties of ZrO2, thin films prepared by electron beam evaporation

ZrO2 thin films were deposited bill using an electron beam evaporation technique on three kinds of lithium triborate (LiB3O5 or LBO) substrates with the surfaces at specified crystalline orientations. The influences of the LBO structure on the structural and optical properties of ZrO2 thin films are studied by spectrophotometer and x-ray diffraction. The results indicate that the substrate structure has obvious effects on the structural end optical properties of the film: namely. the ZrO2 thin film deposited on the X-LBO, Y-LBO and Z-LBO orients to m(-212), m(021) and o(130) directions. It is also found that the ZrO2 thin film with m(021) has the highest refractive index and the least lattice misfit.

测量薄膜微粗糙度的总积分散射仪

介绍了一种检测光学薄膜表面总积分散射（TIS）分布的总积分散射仪。对仪器的基本结构、理论基础、测量原理以及系统性能等进行了阐述，提出了抑制系统噪音和提高测量精度的有效措施。利用该仪器对K9基底上的银（Ag）膜和氧化锆（ZrO2）薄膜进行了测量，并根据标量散射理论得到了表面均方根（RMS）粗糙度。利用光学轮廓仪和原子力显微镜（AFM）分别测量了上述Ag膜和ZrO2薄膜的表面均方根粗糙度，并与总积分散射仪所得的粗糙度进行了比较。结果表明，根据测量的薄膜表面总积分散射计算得到的表面均方根粗糙度与光学轮廓仪及原子

Layer uniformity of glancing angle deposition

Some results of an investigation on the layer thickness uniformity of glancing angle deposition are presented. A zirconia monolayer has been deposited by glancing angle deposition to analyze the layer thickness uniformity. The experimental results indicate that the thickness variation over the substrate is less than 0. 1%, which is considered as good uniformity. It is found that the non-uniformity of experimental results is larger than that of the theoretical results. (c) 2005 Elsevier Ltd. All rights reserved.

Influence of oxygen plasma treatment on properties of ZrO2 films prepared by e-beam evaporation techniques

Zirconia films were prepared by e-beam evaporation, and oxygen plasma treatment was used to modify film properties. Spectrophotometry, x-ray diffractometry (XRD), and atomic force microscopy were used to characterize refractive index, extinction coefficient, rnicrostructure, and surface roughness, respectively. The experimental results indicate that both refractive index and extinction coefficient of the films were reduced slightly after oxygen plasma treatment, with the decrease of intrinsic stress and surface roughness. From XRD spectra, the intensity decrease of the T(110) diffraction peak was clearly observed after the treatment, which was caused by the restructuring of the film atoms. (C) 2008 Elsevier Ltd. All rights reserved.

Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD

Y2O3 stabilized ZrO2 (YSZ) thin films with different Y2O3 molar contents (0, 3, 7, and 12 mol%) are deposited on BK7 substrates by electron-beam evaporation technique. The effects of different Y2O3 contents on residual stresses and structures of YSZ thin films are studied. Residual stresses are investigated by means of two different techniques: the curvature measurement and x- ray diffraction method. It is found that the evolution of residual stresses of YSZ thin films by the two different methods is consistent. Residual stresses of films transform from compressive stress into tensile stress and the tensile stress increases monotonically with the increase of Y2O3 content. At the same time, the structures of these films change from the mixture of amorphous and monoclinic phases into high temperature cubic phase. The variations of residual stress correspond to the evolution of structures induced by adding of Y2O3 content.

沉积温度对氧化钇稳定氧化锆薄膜残余应力的影响

采用自制掺摩尔分数12%的Y2O3的ZrO2混合颗粒料为原料,在不同的沉积温度下用电子束蒸发方法沉积氧化钇稳定氧化锆(YSZ)薄膜样品。利用ZYGOMarkⅢ-GPI数字波面干涉仪对氧化钇稳定氧化锆薄膜的残余应力进行了研究,讨论了沉积温度对残余应力的影响。实验结果表明:随沉积温度升高,氧化钇稳定氧化锆薄膜中残余应力状态由张应力变为压应力,且压应力值随着沉积温度升高而增大;用X射线衍射仪表征了不同沉积温度下氧化钇稳定氧化锆薄膜的微观结构,探讨了薄膜微观结构与其应力的对应关系,并对比了纯ZrO2薄膜表现出的应力状态。

Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation

Influence of ZrO2 in HfO2 on the reflectance of HfO2/SiO2 multilayer at 248 nm was investigated. Two kinds of HfO2 with different ZrO2 content were chosen as high refractive index material and the same kind of SiO2 as low refractive index material to prepare the mirrors by electron-beam evaporation. The impurities in two kinds of HfO2 starting coating materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum (GDMS) technology and secondary ion mass spectrometry (SIMS) equipment, respectively. It showed that between the two kinds of HfO2, either the bulk materials or their corresponding films, the difference of ZrO2 was much larger than that of the other impurities such as Ti and Fe. It is the Zr element that affects the property of thin films. Both in theoretical and in experimental, the mirror prepared with the HfO2 starting material containing more Zr content has a lower reflectance. Because the extinction coefficient of zirconia is relatively high in UV region, it can be treated as one kind of absorbing defects to influence the optical property of the mirrors. (C) 2008 Elsevier B.V. All rights reserved.

Resistência de união entre cimentos resinosos autoadesivos e cerâmicas de zircônia policristalina

O objetivo deste estudo foi avaliar a resistência de união a microtração de cimentos resinosos autoadesivos a cerâmicas de zircônia policristalina. Dezoito blocos cerâmicos de zircônia 3Y-TZP (9 LAVA e 9 LAVA Plus) foram jateados com partículas de 50 m de Al2O3por 20 s com pressão de 28 psi a uma distância de 10 mm. Os blocos cerâmicos foram duplicados em resina composta (Point 4, Kerr) por moldagem com silicone. Os blocos de resina composta foram cimentados à superfície jateada da zircônia usando três diferentes cimentos resinosos autoadesivos: (1) RelyX Unicem 2 (3M ESPE); (2) SmartCem 2 (Dentsply); (3) Speedcem (Ivoclar Vivadent). Após 24 h imersos em água destilada a 37oC, os blocos cimentados foram cortados em palitos para testes de microtração,com área da interface adesiva de 1 mm2 0,2 mm, e tensionados até a fratura. Os resultados foram analisados pelo teste de análise de variância de dois fatores e pelo teste de comparações múltiplas LSD (α=0.05). As amostras fraturadas foram analisadas com microscopia eletrônica de varredura (MEV) e o modo de falha foi registrado. A topografia das superfícies cerâmicas antes e após o jateamento foi comparada por microscopia de força atômica (AFM). A resistência de união do cimento Speedcem à zircônia foi estatisticamente superior àquela reportada pelos cimentos RelyX Unicem 2 e SmartCem 2, independentemente da cerâmica usada (p<0,05). O fator cerâmica não teve influência estatística na resistência de união. A interação entre os dois fatores se mostrou significativa (p<0,05). O modo de fratura associado ao SmartCem 2 foi quase exclusivamente adesiva, enquanto oRelyX Unicem 2e o Speedcem exibiram um maior percentual de falhas mistas. Não foram observadas falhas coesivas. O AFM não revelou diferença no padrão de topografia de superfície entre as duas cerâmicas antes ou após o jateamento. Concluiu-se que o cimento Speedcem foi superior na adesão a cerâmicas de zircônia policristalina.

Structural and thermodynamic properties of different phases of supercooled liquid water.

Computer simulation results are reported for a realistic polarizable potential model of water in the supercooled region. Three states, corresponding to the low density amorphous ice, high density amorphous ice, and very high density amorphous ice phases are chosen for the analyses. These states are located close to the liquid-liquid coexistence lines already shown to exist for the considered model. Thermodynamic and structural quantities are calculated, in order to characterize the properties of the three phases. The results point out the increasing relevance of the interstitial neighbors, which clearly appear in going from the low to the very high density amorphous phases. The interstitial neighbors are found to be, at the same time, also distant neighbors along the hydrogen bonded network of the molecules. The role of these interstitial neighbors has been discussed in connection with the interpretation of recent neutron scattering measurements. The structural properties of the systems are characterized by looking at the angular distribution of neighboring molecules, volume and face area distribution of the Voronoi polyhedra, and order parameters. The cumulative analysis of all the corresponding results confirms the assumption that a close similarity between the structural arrangement of molecules in the three explored amorphous phases and that of the ice polymorphs I(h), III, and VI exists.

外场诱导的溶液浇铸苯基联苯基呃唑（PBD）单晶及其微观电学性能

本论文以2-（4-叔丁基苯基）-5-（4-二联苯基）-1，3，4-呃唑（PBD）单晶为研究对象，在对溶液浇铸的PBD多晶薄膜的晶体结构的研究基础上，通过调控溶液浇铸PBD单晶生长过程中的溶剂挥发和外加静电场，获得了晶胞轴轴和c轴垂直基板取向的不同的PBD单晶。利用导电探针原子力显微镜考察了与之相对应的电学性能及其各向异性。在空气中溶液浇铸的PBD多晶薄膜表现出c轴垂直基板取向的特征。基于这一现象，我们通过控制溶剂场中溶剂挥发的时间，即控制溶剂挥发的动力学过程，得到了大面积有序排列的c轴垂直基板取向的PBD单晶。在溶剂挥发的过程中，通过原子力显微镜观察到薄膜的形貌发生明显的改变，此现象表明PBD由亚稳态的多形态（Polymorphs）转变为单晶。当在这一过程中施加一个场强为5kV／cm的静电场时，可以得到b轴垂直基板取向的PBD单晶。我们利用导电探针原子力显微镜测量了制备在Au／S基板上这两种不同取向结构的PBD单晶在纳米尺度上的电学性能，观察到了纳米尺度上的PBD单晶的电学各向异性。电荷的传输性能是在导电金探针和Au／S基板之间测量的。在电场诱导作用下得到的b轴垂直基板取向的PBD单晶测量得到其电子迁移率为3*10-3cm2/Vs。而通过动力学控制溶剂挥发得到的c轴垂直基板取向的PBD单晶，在低电压域内测量得到的电子迁移率比电场诱导作用下得到的轴垂直基板取向的PBD单晶要高两个数量级。这么高的电荷各向异性是由于相邻分子之间兀轨道重叠的程度不同而决定的。

CHANNELING ALIGNMENT FOR EPITAXIAL LIGHT-MASS FILM ON HEAVY-MASS SUBSTRATE

A simple procedure for obtaining a background-free backscattering spectrum of a light-mass film on a heavy-mass substrate by a normal incidence/grazing exit geometry has been described. Using this method such films can be aligned rapidly and accurately, and the impurity or defect information on the films can be obtained without need for realignment. Example is given from MeV Li-3+ analysis of a deposited film of Si on a single crystal substrate of yttria-stabilized, cubic zirconia.