Charge and spin transport in graphene devices

170 p.

提拉法生长大尺寸γ-LiAlO2单晶的研究(英文)

由于与GaN晶格失配小(约1．4％)，γ-LiAlO2单晶有望成为一种很有希望的GaN外延衬底材料。本文使用提拉法生长出了尺寸达Ф5×50mm^3的γ-LiAlO2单晶。对该晶体毛坯的各个有代表性的位置作了X射线粉末衍射(XRPD)分析，结果表明仅仅在晶体毛坯的底部生成了一种缺锂相(LiAl5O8)。γ-LiAlO2晶体化学稳定性差，在室温时轻微水解。当在空气中于1100℃退火70h，γ-LiAlO2晶体挥发出锂组分，在表面产生缺锂相(LiAl5O8)。值得注意的是，在γ-LiAlO2晶体的红外光谱区不存

Low temperature growth of c-axis oriented AlN films on gamma-LiAlO2 by radio frequency magnetron sputtering

Aluminum nitride (AlN) films were prepared on gamma-LiAlO2 substrates by radio frequency (rf) magnetron sputtering. The influence of substrate temperature (T-s) and nitrogen (N-2) concentration on film growth was investigated. The X-ray diffraction (XRD) results reveal that highly c-axis oriented AlN films can be obtained in the temperature range from room temperature (RT) to 300 degrees C. A smoother surface and a crystalline quality decrease with increasing N-2 concentration have been observed by XRD and atomic force microscopy (AFM) for the films deposited at lower substrate temperature. On the contrary, the degradation of the surface smoothness and the higher crystalline quality can be observed for the films deposited at a higher substrate temperature with N-2-rich ambient. The growth mechanism which leads to different crystalline quality of the films is discussed. (C) 2008 Elsevier B.V. All rights reserved.

沉积参量及时效时间对SiO2薄膜残余应力的影响

SiO2薄膜由电子束蒸发方法沉积而成。用GPI数字波面光学干涉仪测量了不同沉积条件下玻璃基底镀膜前后曲率半径的变化，并确定了SiO2薄膜中的残余应力。在其他条件相同的情况下，当沉积温度由190℃升高到350℃时，SiO2薄膜中的压应力由一156MPa增大为-289MPa。氧分压由3．0×10^-3Pa升高到13．0×10^-3Pa时，SiO2薄膜中的应力由-223．5MPa变为20．4MPa。通过对薄膜折射率的测量，发现薄膜的堆积密度随沉积条件的改变也发生了规律性的变化。应力的变化主要是由于沉积时蒸发粒子

Effective medium model for refractive indices of thin films with oblique columnar structure

The refractive indices of thin films, containing dielectric and voids in an oblique columnar structure, are, modelled in the quasi-static limit. The dielectric function is shown to be strongly dependent on the angle of incidence and on the columnar orientation for p-polarized light. This model is applied to model ZnS thin films with oblique columnar structures and the computed results have been given.

A note on the von Bertalanffy growth function concerning the allocation of surplus energy to reproduction

We propose an extended form of the von Bertalanffy growth function (VBGF), where the allocation of surplus energy to reproduction is considered. Any function can be used in our model to describe the ratio of energy allocation for reproduction to that for somatic growth. As an example, two models for energy allocation were derived: a step-function and a logistic function. The extended model can jointly describe growth in adult and juvenile stages. The change in growth rate between the two stages can be either gradual or steep; the latter gives a biphasic VBGF. The results of curve fitting indicated that a consideration of reproductive energy is meaningful for model extension. By controlling parameter values, our comprehensive model gives various growth curve shapes ranging from indeterminate to determinate growth. An increase in the number of parameters is unavoidable in practical applications of this new model. Additional information on reproduction will improve the reliability of model estimates.