Contribution à la cartographie géomorphologique de la dynamique sédimentaire des petits bassins versants torrentiels

Les laves torrentielles sont l'un des vecteurs majeurs de sédiments en milieu montagneux. Leur comportement hydrogéomorphologique est contrôlé par des facteurs géologique, géomorphologique, topographique, hydrologique, climatique et anthropique. Si, en Europe, la recherche s'est plus focalisée sur les aspects hydrologiques que géomorphologiques de ces phénomènes, l'identification des volumes de sédiments potentiellement mobilisables au sein de petits systèmes torrentiels et des processus responsables de leur transfert est d'une importance très grande en termes d'aménagement du territoire et de gestion des dangers naturels. De plus, une corrélation entre des événements pluviométriques et l'occurrence de laves torrentielles n'est pas toujours établie et de nombreux événements torrentiels semblent se déclencher lorsqu'un seuil géomorphologique intrinsèque (degré de remplissage du chenal) au cours d'eau est atteint.Une méthodologie pragmatique a été développée pour cartographier les stocks sédimentaires constituant une source de matériaux pour les laves torrentielles, comme outil préliminaire à la quantification des volumes transportés par ces phénomènes. La méthode s'appuie sur des données dérivées directement d'analyses en environnement SIG réalisées sur des modèles numériques d'altitude de haute précision, de mesures de terrain et d'interprétation de photographies aériennes. La méthode a été conçue pour évaluer la dynamique des transferts sédimentaires, en prenant en compte le rôle des différents réservoirs sédimentaires, par l'application du concept de cascade sédimentaire sous un angle cartographique.Les processus de transferts sédimentaires ont été étudiés dans deux bassins versants des Alpes suisses (torrent du Bruchi, à Blatten beiNaters et torrent du Meretschibach, à Agarn). La cartographie géomorphologique a été couplée avec des mesures complémentaires permettant d'estimer les flux sédimentaires et les taux d'érosion (traçages de peinture, piquets de dénudation et utilisation du LiDAR terrestre). La méthode proposée se révèle innovatrice en comparaison avec la plupart des systèmes de légendes géomorphologiques existants, qui ne sont souvent pas adaptés pour cartographier de manière satisfaisante les systèmes géomorphologiques complexes et actifs que sont les bassins torrentiels. L'intérêt de cette méthode est qu'elle permet l'établissement d'une cascade sédimentaire, mais uniquement pour des systèmes où l'occurrence d'une lave torrentielle est contrôlé par le degré de remplissage en matériaux du chenal. Par ailleurs, le produit cartographique ne peut être directement utilisé pour la création de cartes de dangers - axées sur les zones de dépôt - mais revêt un intérêt pour la mise en place de mesures de correction et pour l'installation de systèmes de monitoring ou d'alerte.La deuxième partie de ce travail de recherche est consacrée à la cartographie géomorphologique. Une analyse a porté sur un échantillon de 146 cartes ou systèmes de légende datant des années 1950 à 2009 et réalisés dans plus de 40 pays. Cette analyse a permis de mettre en évidence la diversité des applications et des techniques d'élaboration des cartes géomorphologiques. - Debris flows are one of the most important vectors of sediment transfer in mountainous areas. Their hydro-geomorphological behaviour is conditioned by geological, geomorphological, topographical, hydrological, climatic and anthropic factors. European research in torrential systems has focused more on hydrological processes than on geomorphological processes acting as debris flow triggers. Nevertheless, the identification of sediment volumes that have the potential to be mobilised in small torrential systems, as well as the recognition of processes responsible for their mobilisation and transfer within the torrential system, are important in terms of land-use planning and natural hazard management. Moreover, a correlation between rainfall and debris flow occurrence is not always established and a number of debris flows seems to occur when a poorly understood geomorphological threshold is reached.A pragmatic methodology has been developed for mapping sediment storages that may constitute source zone of bed load transport and debris flows as a preliminary tool before quantifying their volumes. It is based on data directly derived from GIS analysis using high resolution DEM's, field measurements and aerial photograph interpretations. It has been conceived to estimate sediment transfer dynamics, taking into account the role of different sediment stores in the torrential system applying the concept of "sediment cascade" in a cartographic point of view.Sediment transfer processes were investigated in two small catchments in the Swiss Alps (Bruchi torrent, Blatten bei Naters and Meretschibach torrent, Agarn). Thorough field geomorphological mapping coupled with complementary measurements were conducted to estimate sediment fluxes and denudation rates, using various methods (reference coloured lines, wooden markers and terrestrial LiDAR). The proposed geomorphological mapping methodology is quite innovative in comparison with most legend systems that are not adequate for mapping active and complex geomorphological systems such as debris flow catchments. The interest of this mapping method is that it allows the concept of sediment cascade to be spatially implemented but only for supply-limited systems. The map cannot be used directly for the creation of hazard maps, focused on the deposition areas, but for the design of correction measures and the implementation of monitoring and warning systems.The second part of this work focuses on geomorphological mapping. An analysis of a sample of 146 (extracts of) maps or legend systems dating from the middle of the 20th century to 2009 - realised in more than 40 different countries - was carried out. Even if this study is not exhaustive, it shows a clear renewed interest for the discipline worldwide. It highlights the diversity of applications, techniques (scale, colours and symbology) used for their conception.

High protein intake reduces intrahepatocellular lipid deposition in humans.

BACKGROUND: High sugar and fat intakes are known to increase intrahepatocellular lipids (IHCLs) and to cause insulin resistance. High protein intake may facilitate weight loss and improve glucose homeostasis in insulin-resistant patients, but its effects on IHCLs remain unknown. OBJECTIVE: The aim was to assess the effect of high protein intake on high-fat diet-induced IHCL accumulation and insulin sensitivity in healthy young men. DESIGN: Ten volunteers were studied in a crossover design after 4 d of either a hypercaloric high-fat (HF) diet; a hypercaloric high-fat, high-protein (HFHP) diet; or a control, isocaloric (control) diet. IHCLs were measured by (1)H-magnetic resonance spectroscopy, fasting metabolism was measured by indirect calorimetry, insulin sensitivity was measured by hyperinsulinemic-euglycemic clamp, and plasma concentrations were measured by enzyme-linked immunosorbent assay and gas chromatography-mass spectrometry; expression of key lipogenic genes was assessed in subcutaneous adipose tissue biopsy specimens. RESULTS: The HF diet increased IHCLs by 90 +/- 26% and plasma tissue-type plasminogen activator inhibitor-1 (tPAI-1) by 54 +/- 11% (P < 0.02 for both) and inhibited plasma free fatty acids by 26 +/- 11% and beta-hydroxybutyrate by 61 +/- 27% (P < 0.05 for both). The HFHP diet blunted the increase in IHCLs and normalized plasma beta-hydroxybutyrate and tPAI-1 concentrations. Insulin sensitivity was not altered, whereas the expression of sterol regulatory element-binding protein-1c and key lipogenic genes increased with the HF and HFHP diets (P < 0.02). Bile acid concentrations remained unchanged after the HF diet but increased by 50 +/- 24% after the HFHP diet (P = 0.14). CONCLUSIONS: Protein intake significantly blunts the effects of an HF diet on IHCLs and tPAI-1 through effects presumably exerted at the level of the liver. Protein-induced increases in bile acid concentrations may be involved. This trial was registered at www.clinicaltrials.gov as NCT00523562.

Effect of substrate temperature on deposition rate of rf plasma-deposited hydrogenated amorphous silicon thin films

We present a study about the influence of substrate temperature on deposition rate of hydrogenated amorphous silicon thin films prepared by rf glow discharge decomposition of pure silane gas in a capacitively coupled plasma reactor. Two different behaviors are observed depending on deposition pressure conditions. At high pressure (30 Pa) the influence of substrate temperature on deposition rate is mainly through a modification of gas density, in such a way that the substrate temperature of deposition rate is similar to pressure dependence at constant temperature. On the contrary, at low pressure (3 Pa), a gas density effect cannot account for the observed increase of deposition rate as substrate temperature rises above 450 K with an activation energy of 1.1 kcal/mole. In accordance with laser‐induced fluorescence measurements reported in the literature, this rise has been ascribed to an increase of secondary electron emission from the growing film surface as a result of molecular hydrogen desorption.

Microstructure of highly oriented, hexagonal, boron nitride thin films grown on crystalline silicon by radio frequency plasma-assisted chemical vapor deposition

We present a high‐resolution electron microscopy study of the microstructure of boron nitride thin films grown on silicon (100) by radio‐frequency plasma‐assisted chemical vapor deposition using B2H6 (1% in H2) and NH3 gases. Well‐adhered boron nitride films grown on the grounded electrode show a highly oriented hexagonal structure with the c‐axis parallel to the substrate surface throughout the film, without any interfacial amorphous layer. We ascribed this textured growth to an etching effect of atomic hydrogen present in the gas discharge. In contrast, films grown on the powered electrode, with compressive stress induced by ion bombardment, show a multilayered structure as observed by other authors, composed of an amorphous layer, a hexagonal layer with the c‐axis parallel to the substrate surface and another layer oriented at random

Uptake of heavy metals by plants from airborne deposition and polluted soils

Selostus: Kasvien raskasmetallien otto ilmasta ja saastuneesta maasta

Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD

In this paper we present results on phosphorous-doped μc-Si:H by catalytic chemical vapour deposition in a reactor with an internal arrangement that does not include a shutter. An incubation phase of around 20 nm seems to be the result of the uncontrolled conditions that take place during the first stages of deposition. The optimal deposition conditions found lead to a material with a dark conductivity of 12.8 S/cm, an activation energy of 0.026 eV and a crystalline fraction of 0.86. These values make the layers suitable to be implemented in solar cells.

Investigations on doping of amorphous and nano-crystalline silicon films deposited by catalytic chemical vapour deposition

Hydrogenated amorphous and nanocrystalline silicon, deposited by catalytic chemical vapour deposition, have been doped during deposition by the addition of diborane and phosphine in the feed gas, with concentrations in the region of 1%. The crystalline fraction, dopant concentration and electrical properties of the films are studied. The nanocrystalline films exhibited a high doping efficiency, both for n and p doping, and electrical characteristics similar to those of plasma-deposited films. The doping efficiency of n-type amorphous silicon is similar to that obtained for plasma-deposited electronic-grade amorphous silicon, whereas p-type layers show a doping efficiency of one order of magnitude lower. A higher deposition temperature of 450°C was required to achieve p-type films with electrical characteristics similar to those of plasma-deposited films.

Hydroxyapatite coatings grown by pulsed laser deposition with a beam of 355 nm wavelength

Calcium phosphate coatings, obtained at different deposition rates by pulsed laser deposition with a Nd:YAG laser beam of 355-nm wavelength, were studied. The deposition rate was changed from 0.043 to 1.16 /shot by modification of only the ablated area, maintaining the local fluence constant to perform the ablation process in similar local conditions. Characterization of the coatings was performed by scanning electron microscopy, x-ray diffractometry, and infrared, micro-Raman, and x-ray photoelectron spectroscopy. The coatings showed a compact surface morphology formed by glassy gains with some droplets on them. Only hydroxyapatite (HA) and alpha-tricalcium phosphate (alpha-TCP) peaks were found in the x-ray diffractograms. The relative content of alpha TCP diminished with decreasing deposition rates, and only HA peaks were found for the lowest rate. The origin of alpha TCP is discussed.

Gas collisions and pressure quenching of the photoluminescence of silicon nanopowder grown by plasma-enhanced chemical vapor deposition

The quenching of the photoluminescence of Si nanopowder grown by plasma-enhanced chemical vapor deposition due to pressure was measured for various gases ( H2, O2, N2, He, Ne, Ar, and Kr) and at different temperatures. The characteristic pressure, P0, of the general dependence I(P) = I0¿exp(¿P/P0) is gas and temperature dependent. However, when the number of gas collisions is taken as the variable instead of pressure, then the quenching is the same within a gas family (mono- or diatomic) and it is temperature independent. So it is concluded that the effect depends on the number of gas collisions irrespective of the nature of the gas or its temperature.

Epitaxial growth of Y-doped SrZrO3 films on MgO by pulsed laser deposition

Epitaxial thin films of Y¿doped SrZrO3 have been grown on MgO(001) by pulsed laser deposition. The deposition process has been performed at temperatures of 1000¿1200¿°C and at an oxygen pressure of 1.5×10¿1 mbar. The samples are characterized by Rutherford backscattering spectrometry/channeling (RBS/C) and x¿ray diffraction (XRD). We found an epitaxial relationship of SrZrO3 (0k0) [101]¿MgO (001) [100]. Good crystalline quality is confirmed by RBS/C minimum yield values of 9% and a FWHM of 0.35° of the XRD rocking curve.

Plasma-enhanced chemical vapor deposition of boron nitride thin films from B2H6-H2-NH3 and B2H6-N2 gas mixtures

Highly transparent and stoichiometric boron nitride (BN) films were deposited on both electrodes (anode and cathode) of a radio-frequency parallel-plate plasma reactor by the glow discharge decomposition of two gas mixtures: B2H6-H2-NH3 and B2H6-N2. The chemical, optical, and structural properties of the films, as well as their stability under long exposition to humid atmosphere, were analyzed by x-ray photoelectron, infrared, and Raman spectroscopies; scanning and transmission electron microscopies; and optical transmittance spectrophotometry. It was found that the BN films grown on the anode using the B2H6-H2-NH3 mixture were smooth, dense, adhered well to substrates, and had a textured hexagonal structure with the basal planes perpendicular to the film surface. These films were chemically stable to moisture, even after an exposition period of two years. In contrast, the films grown on the anode from the B2H6-N2 mixture showed tensile stress failure and were very unstable in the presence of moisture. However, the films grown on the cathode from B2H6-H2-NH3 gases suffered from compressive stress failure on exposure to air; whereas with B2H6-N2 gases, adherent and stable cathodic BN films were obtained with the same crystallographic texture as anodic films prepared from the B2H6-H2-NH3 mixture. These results are discussed in terms of the origin of film stress, the effects of ion bombardment on the growing films, and the surface chemical effects of hydrogen atoms present in the gas discharge.