4 resultados para memory access complexity
em Repositório Institucional UNESP - Universidade Estadual Paulista "Julio de Mesquita Filho"
Resumo:
Desde sua inauguração em 1888 até 1978, a Hospedaria de Imigrantes de São Paulo atuou na recepção, triagem e encaminhamento de aproximadamente 3,5 milhões de trabalhadores (imigrantes e migrantes internos) para diversos setores da agricultura paulista. Parte significativa da documentação produzida ou depositada nessa Instituição é composta por suportes como: livros de registro, fichas de identificação e listas de bordo. Sobre esses incidem interesses diversos. Por um lado, são fontes que revelam informações importantes sobre a memória (coletiva) da imigração para São Paulo ao passo que, por outro, expõem informações pessoais que podem ser consideradas de foro privado ou pertinentes a outro sentido da memória.
Resumo:
A thermally activated photoluminescence memory effect, induced by a reversible order-disorder phase transition of the alkyl chains, is reported for highly organized bilayer alkyl/siloxane hybrids (see figure; left at room temperature, right at 120 degrees C). The emission energy is sensitive to the annihilation/formation of the hydrogen-bonded amide-amide array displaying a unique nanoscopic sensitivity (ca. 150 nm).
Resumo:
We report on the properties of BaBi2Ta2O9 (BBT) thin films for dynamic random-access memory (DRAM) and integrated capacitor applications. Crystalline BBT thin films were successfully fabricated by the chemical solution deposition technique on Pt-coated Si substrates at a low annealing temperature of 650°C. The films were characterized in terms of structural, dielectric, and insulating properties. The electrical measurements were conducted on Pt/BBT/Pt capacitors. The typical measured small signal dielectric constant and dissipation factor, at 100 kHz, were 282 and 0.023, respectively, for films annealed at 700°C for 60 min. The leakage current density of the films was lower than 10-9 A/cm2 at an applied electric field of 300 kV/cm. A large storage density of 38.4 fC/μm2 was obtained at an applied electric field of 200 kV/cm. The high dielectric constant, low dielectric loss and low leakage current density suggest the suitability of BBT thin films as dielectric layer for DRAM and integrated capacitor applications.
Resumo:
Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)