Blue Luminescent Properties of Silicon Nanowires Grown by a Solid-Liquid-Solid Method

Silicon nanowires (SiNWs) were grown directly from n-(111) single-crystal silicon (c-Si) substrate based on a solid-liquid-solid mechanism, and Au film was used as a metallic catalyst. The room temperature photoluminescence properties of SiNWs were observed by an Xe lamp with an exciting wavelength of 350 nm. The results show that the SiNWs exhibit a strongly blue luminescent band in the wavelength range 400-480 nm at an emission peak position of 420 nm. The luminescent mechanism of SiNWs indicates that the blue luminescence is attributed to the oxygen-related defects, which are in SiOx amorphous oxide shells around the crystalline core of SiNWs.

Preliminary study on the photoproduction of hydroxyl radicals in aqueous solution with Aldrich humic acid, algae and Fe(III) under high-pressure mercury lamp irradiation

Under a high-pressure mercury lamp (HPML) and using an exposure time of 4 h, the photoproduction of hydroxyl radicals ((OH)-O-.) could be induced in an aqueous solution containing humic acid (HA). Hydroxyl radicals were determined by high-performance liquid chromatography using benzene as a probe. The results showed that (OH)-O-. photoproduction increased from 1.80 to 2.74 muM by increasing the HA concentration from 10 to 40 mg L-1 at an exposure time of 4 h (pH 6.5). Hydroxyl radical photoproduction in aqueous solutions of HA containing algae was greater than that in the aqueous solutions of HA without algae. The photoproduction of (OH)-O-. in the HA solution with Fe(111) was greater than that of the solution without Fe(III) at pH ranging from 4.0 to 8.0. The photoproduction of (OH)-O-. in HA solution with algae with or without Fe(111) under a 250 W HPML was greater than that under a 125 W HPML. The photoproduction of (OH)-O-. in irradiated samples was influenced by the pH. The results showed that HPML exposure for 4 h in the 4-8 pH range led to the highest (OH)-O-. photoproduction at pH 4.0.

Flash-lamp-pumped picosecond Nd:YAG regenerative amplifier

A flash-lamp-pumped Nd

Passive Q-Switching in a Flash-Lamp Pumped Nd∶YAG Laser with Ion-Implanted GaAs Wafer

A passive Q-switched flash-lamp-pumped Nd:YAG laser with the ion-implanted semi-insulating GaAs water is reported．The wafer is implanted with 400keV As~+ ions in the concentration of 10~(16)cm~(-2). Using GaAs wafer as an absorber and an output coupler．62ns pulse duration of single pulse is obtained.

Xe~(23+)离子辐照Al_2O_3的光谱特性

本工作研究460 keV、3 MeV和308 MeV Xe23+辐照Al2O3单晶样品的光致发光特性。从经过460 keV Xe23+辐照后样品的光致发光测试结果可看到,波长为380、413和450 nm的发光峰明显增强,在390和564 nm处出现了新的发光峰。从3 MeV的Xe23+辐照后样品谱的变化可看到,在较低剂量条件下,516 nm(2.4 eV)和564 nm(2.2 eV)处的发光峰随辐照剂量增加而增强,且当剂量增到1×1016cm-2时,564 nm处的发光峰消失,只有516 nm(2.4 eV)处的发光峰较强。从308 MeV Xe23+辐照后样品的光致发光谱中可看到,357 nm(3.47 eV)和516 nm(2.4 eV)处的发光峰随着剂量增加明显增强。辐照后样品的FTIR谱显示:波数在460~510 cm-1和630 cm-1附近的吸收是Al2O3振动模式,经离子辐照后,吸收带展宽;1 000~1 300 cm-1间为Al—O—Al桥氧键的伸缩振动模式,高能辐照后的吸收带向低波数方向移动。

高电荷态离子~(129)Xe~(28+)与Au和Mo表面作用产生的X射线谱

研究了高电荷态离子129Xe28+轰击金属Au和Mo表面产生的特征X射线谱。实验结果表明,在入射离子的电荷态和能量相同的条件下,对于核电荷数较小、原子质量较轻的靶原子,只有其内壳层的电子才能被激发而产生X射线,而核电荷数较大、原子质量较重的靶原子只有其较外壳层的电子能被激发而产生X射线。特征X射线的产额随入射离子动能的增加而增加。

高电荷态离子~(129)Xe~(q+)激发Au表面产生的X射线谱

目的研究高电荷态离子129Xeq+(q=28,29,30)入射金属Au表面产生的特征X射线谱。方法应用高电荷态离子束流激发。结果在束流强度小于139 nA条件下,单离子的X射线产额可达10-8量级,特征X射线的产额随入射离子的动能和势能(电荷态)的增加而增加。结论与传统的X射线产生方法不同,高电荷态离子可以激发重原子的内壳层特征X射线谱,其产额高,品质好。

~(129)Xe~(q+)入射金属表面激发的X射线谱

用高电荷态离子129Xeq+(q=25,26,27)轰击金属Au表面,产生Au原子的特征X射线谱.实验结果表明,足够高的电荷态低速离子激发靶表面原子,无需很强的束流强度(nA量级),便可有效地产生重原子的特征X谱线(Au,Mα),单离子X射线产额可达10-8量级,特征X射线的产额随入射离子的动能和势能(电荷态)的增加而增加.通过Au原子Mα的特征X射线谱,利用Heisenberg不确定关系对Au原子的第N能级寿命进行了估算.

高能Xe离子辐照引起的注碳a:SiO_2中新结构的形成

先用120 keV的碳离子注入非晶二氧化硅a:SiO2薄膜,再用能量为1 754 MeV的Xe离子辐照。注碳量为5.0×1016—8.6×1017ion/cm2,Xe离子辐照剂量为1.0×1011和5.0×1011ion/cm2。辐照后的样品中形成的新结构用显微傅立叶变换红外光谱仪进行测试分析。结果表明,Xe离子辐照引起了注碳a:SiO2中Si—C,C—C,Si—O—C键以及CO和CO2分子的形成与演化。在注碳量较高时,Xe离子辐照在样品中产生了大量的Si—C键。与注入未辐照和辐照的低注碳量样品比较,增强的Si—C键的形成,预示着辐照可引起注碳a:SiO2样品中的SiC结构相变。

经典过垒模型在Xe~(q+) +He碰撞中的应用

采用位置灵敏探测和飞行时间技术研究了高电荷态Xe离子 (q =15 ,17,19,2 1,2 3)与He原子碰撞中双电子转移截面与单俘获截面比随入射离子电荷态的变化规律。提出一步过程假定 ,对扩展的经典过垒(ECB)模型进行了修正 ,利用修正模型计算得到的单、双电子转移绝对截面与Andersson等人和Selberg等人的实验结果符合得很好 ,所得截面比与本实验得到的双电子转移截面与单电子俘获截面符合得比较好。

~(129)Xe~(30+)轰击Ni表面激发靶原子偶极跃迁和禁戒(M1和E2)跃迁的特征光谱线

报道了用高电荷态离子1 2 9Xe30 + (15 0keV)轰击金属Ni表面 ,激发的 2 0 0— 10 0 0nmNiⅠ和NiⅡ的特征光谱线的实验结果 .实验结果表明 :用电荷态足够高的离子作光谱激发源 ,无需很强的束流强度 (nA量级 ) ,便可有效地产生原子和离子的复杂组态间跃迁所形成的可见光波段的特征谱线 ,特别是NiⅠ和NiⅡ偶极禁戒的电四极跃迁E2和磁偶极跃迁M1的特征光谱线 .通过分析发现 ,在禁戒跃迁的谱线中 ,有些是电子组态相同而原子态不同的偶极禁戒跃迁光谱线而且NiⅡ的 6 84 84nm谱线较强