赝形δ掺杂 AlGaAs/InGa As/GaAs量子阱的光致发光性质研究

测量了一系列不同隔离层(spacer)厚度、阱宽和硅δ掺杂浓度的单边掺杂的赝形高电子迁移率晶体管(p-HEMTs)量子阱的变温和变激发功率光致发光谱，详细研究了(el-hh1)和(e2-hh1)两个发光峰之间的动态竞争发光机制，并运用有限差分法自洽求解薛定谔和泊松方程以得出电子限制势、子带能级以及相应的电子包络波函数、子带占据几率和δ掺杂电子转移效率，研究了两个峰的相对积分发光强度随隔离层厚度、阱宽和δ掺杂浓度的变化。

Enhancement of Exciton-Phonon Interaction in InGaN Quantum Wells Induced by Electron-Beam Irradiation

InGaN/GAN multiple quantum wells grown by metal-organic chemical vapor deposition were irradiated with the electron beam from a low energy accelerator. The electron irradiation induced a redshift by 50 meV in the photoluminescence spectra of the electron-irradiated InGaN/GaN quantum wells, irrespective of the exposure time to the electron beam which ranges from 10 to 1000s. The localization parameter extracted from the temperature-dependent photoluminescence spectra was found to increase in the Irradiated samples. Analysis of the intensity of the longitudinal optical phonon sidebands showed the enhancement of the exciton-phonon coupling, indicating that the excitons are more strongly localized in the irradiated InGaN wells. The change in the pholotuminescence spectra. In the irradiated InGa/GAN quantum wells were explained in terms of the increase of indium concentration in indium rich clusters induced by the electron irradiation (C) 2009 The Japan Society of Applied Physics

QUANTITATIVE-ANALYSIS OF INXGA1-XAS BY AUGER-ELECTRON SPECTROSCOPY

Quantitative Auger electron spectroscopy analysis for the ternary system InGa1-xAs grown by molecular-beam epitaxy has been studied. The relative sensitivity factors are determined by with an internal reference element. The matrix correction factor for In relative to Ga was shown to be 1.08. No preferential sputtering of As for the ternary compounds was found, and the sputter correction factor, K(s)InGa is 0.75. The results are compared with that measured by the x-ray double-crystal diffraction analysis, electron probe microanalysis, and Auger analysis without matrix and sputter corrections.

快速热退火对高应变InGaAs／GaAs量子阱的影响

用固态分子束外延技术生长了高应变．In0．45Ga0.55As／GaAs量子阱材料．研究了快速热退火对高应变InGaAs／GaAs量子阱材料光学性质的影响．本文采用假设InGaAs／GaAs量子阱中的In—Ga原子扩散为误差函数扩散并解任意形状量子阱的薛定谔方程的方法，对不同退火温度下InGaAs／GaAs量子阱室温光致发光峰值波长拟合，得到了In原子在高应变InGaAs／GaAs量子阱中的扩散系数以及扩散激活能（O．88ev）．