Digital holographic aberration compensation in electron holography

This paper proposes a new digital method to compensate for the aberration of an electron objective lens in electron holography. In this method, the object wavefront in the exit pupil plane is numerically reconstructed from a digitized electron hologram, and is corrected by multiplying it with the conjugated phase-error function. Then, an aberration-free image can be obtained by calculating the Fresnel integral of this corrected wavefront. In comparison with traditional methods, this method is much more convenient and accurate. Some verifying experiments are also presented in this paper. (C) 2003 Society of Photo-optical Instrumentation Engineers.

变形镜对千赫兹掺钛蓝宝石飞秒激光频谱相位补偿

尝试用光谱展宽的方法从频谱相位(而非时域相位)的角度利用变形反射镜来补偿1kHz飞秒激光系统输出光路的频谱相位畸变，从而提高飞秒激光脉冲的时域强度衬比度，改善其光束质量。频谱相位补偿实验是在一台1kHz掺钛蓝宝石飞秒激光系统输出光路中，针对超短脉冲光束通过传输介质后的频谱相位畸变，引入变形反射镜进行补偿。应用频谱相位干涉直接电场重构(SPIDER)方法和仪器作为测量手段，建立了一套相位测量补偿系统。实验结果表明用变形反射镜可使激光脉冲的相位畸变得到较好的补偿，脉冲的光束质量得到改善。这种方法的主要思想就是

Performance analysis of bit error rate for free space optical communication with tip-tilt compensation based on gamma-gamma distribution

In this paper, the gamma-gamma probability distribution is used to model turbulent channels. The bit error rate (BER) performance of free space optical (FSO) communication systems employing on-off keying (OOK) or subcarrier binary phase-shift keying (BPSK) modulation format is derived. A tip-tilt adaptive optics system is also incorporated with a FSO system using the above modulation formats. The tip-tilt compensation can alleviate effects of atmospheric turbulence and thereby improve the BER performance. The improvement is different for different turbulence strengths and modulation formats. In addition, the BER performance of communication systems employing subcarrier BPSK modulation is much better than that of compatible systems employing OOK modulation with or without tip-tilt compensation.

Dispersion analysis and compensation of collinear optical parametric chirped pulse amplification systems

In an optical parametric chirped pulse amplification (OPCPA) laser system, residual phase dispersion should be compensated as much as possible to shorten the amplified pulses and improve the pulse contrast ratio. Expressions of orders of the induced phases in collinear optical parametric amplification (OPA) processes are presented at the central signal wavelength to depict a clear physics picture and to simplify the design of phase compensation. As examples, we simulate two OPCPA systems to compensate for the phases up to the partial fourth-order terms, and obtain flat phase spectra of 200-nm bandwidth at 1064 nm and 90-nm at 800 nm.

Investigation of the influence of the aberration induced by a plane interface on STED microscopy

The structure of the inhibition patterns is important to the stimulated emission depletion (STED) microscopy. Usually, Laguerre-Gaussian (LG) beam and the central zero-intensity patterns created by inserting phase masks in Gaussian beams are used as the erase beam in STED microscopy. Aberration is generated when focusing beams through an interface between the media of the mismatched refractive indices. By use of the vectorial integral, the effects of such aberration on the shape of depletion patterns and the size of fluorescence emission spot in the STED microscopy are studied. Results are presented as a comparison between the aberration-free case and the aberrated cases. (C) 2009 Optical Society of America

Pulse compression by filamentation in argon with an acoustic optical programmable dispersive filter for predispersion compensation

We have experimentally demonstrated pulses 0.4 mJ in duration smaller than 12 fs; with an excellent spatial beam profile by self-guided propagation in argon. The original 52 fs pulses from the chirped pulsed amplification laser system are first precompressed to 32 fs by inserting an acoustic optical programmable dispersive filter instrument into the laser system for spectrum reshaping and dispersion compensation, and the pulse spectrum is subsequently broadened by filamentation in an argon cell. By using chirped mirrors for post-dispersion compensation, the pulses are successfully compressed to smaller than 12 fs.

Splitting of femtosecond laser pulses by using a Dammann grating and compensation gratings

When a Dammann grating is used to split a beam of femtosecond laser pulses into multiple equal-intensity beams, chromatic dispersion will occur in beams of each order of diffraction and with different scale of angular dispersion because the incident ultrashort pulse contains a broad range of spectral bandwidths. We propose a novel method in which the angular dispersion can be compensated by positioning an m-time-density grating to collimate the mth-order beam that has been split, producing an array of beams that are free of angular dispersion. The increased width of the compensated output pulses and the spectral walk-off effect are discussed. We have verified this approach theoretically and validated it through experiments. It should be highly interesting in practical applications of splitting femtosecond laser pulses for pulse-width measurement, pump-probe measurement, and micromachining at multiple points. (c) 2005 Optical Society of America.

Analysis of dispersion compensation for position-dependence in externally modulated CATV lightwave systems by using chirped fiber grating

The dispersion compensation characteristics of the chirped fiber grating (CFG) for different dispersion compensation positions are analyzed in externally modulated cable television (CATV) lightwave system and the analytic expression of the composite second order (CSO) distortion is derived. The analyses give a reasonable explanation for the position-dependent effect of CFG dispersion compensator, which was found in practical systems. Moreover, the theoretical result is also verified by an experiment. It is believed that the theory will be helpful in designing optical CATV fiber links with nodes at proper positions both for intensity amplification and dispersion compensation.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

A novel method to measure coma aberration of projection system

A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method. (c) 2006 Elsevier GmbH. All rights reserved.

Analysis of dispersion compensation by chirped fiber grating in directly and externally modulated CATV systems

The dispersion compensation effect of the chirped fiber grating (CFG) is analyzed theoretically, and analytic expressions are derived for composite second-order (CSO) distortion in analog modulated sub-carrier multiplexed (AM-SCM) cable television (CATV) systems with externally and directly modulated transmitters. Simulations are given for the two kinds of modulations and for standard single mode fiber and non-zero dispersion shift fiber (NZDSF) systems. The results show that CFG could be used as a dispersion compensator in directly modulated systems, but its dispersion coefficient should be adjusted much more precisely than the externally modulated system. The requirements for the NZDSF system could be loosened much. It is proposed that directly modulated source may be used as a transmitter in CATV systems combined with tunable CFG dispersion compensator being adjusted precisely, which may be more cost-effective than externally modulation technology. (c) 2006 Elsevier GmbH. All rights reserved.

Even aberration measurement of lithographic projection system based on optimized phase-shifting marks

In the present paper, we propose a novel method for measuring the even aberrations of lithographic projection optics by use of optimized phase-shifting marks on the test mask. The line/space ratio of the phase-shifting marks is optimized to obtain the maximum sensitivities of Zernike coefficients corresponding to even aberrations. Spherical aberration and astigmatism can be calculated from the focus shifts of phase-shifting gratings oriented at 0 degrees, 45 degrees, 90 degrees and 135 degrees at multiple illumination settings. The PROLITH simulation results show that, the measurement accuracy of spherical aberration and astigmatism obviously increase, after the optimization of the measurement mark. (C) 2008 Elsevier B.V. All rights reserved.