High quality hydrogenated amorphous silicon films with significantly improved stability

High quality hydrogenated amorphous silicon (a-Si:H) films have been prepared by a simple "uninterrupted growth/annealing" plasma enhanced chemical vapor deposition (PECVD) technique, combined with a subtle boron-compensated doping. These a-Si:H films possess a high photosensitivity over 10(6), and exhibit no degradation in photoconductivity and a low light-induced defect density after prolonged illumination. The central idea is to control the growth conditions adjacent to the critical point of phase transition from amorphous to crystalline state, and yet to locate the Fermi level close to the midgap. Our results show that the improved stability and photosensitivity of a-Si:H films prepared by this method can be mainly attributed to the formation of a more robust network structure and reduction in the precursors density of light-induced metastable defects.

In situ doping of 3C-SiC grown on (0001) sapphire substrates by LPCVD

The heteroepitaxial growth of n-type and p-type 3C-SiC on (0001) sapphire substrates has been performed with a supply of SiH4+C2H4+H-2 system by introducing ammonia (NH3) and diborane (B2H6) precursors, respectively, into gas mixtures. Intentionally incorporated nitrogen impurity levels were affected by changing the Si/C ratio within the growth reactor. As an acceptor, boron can be added uniformly into the growing 3C-SiC epilayers. Nitrogen-doped 3C-SiC epilayers were n-type conduction, and boron-doped epilayers were p-type and probably heavily compensated.

Calculation of Hugoniot properties for shocked nitromethane based on the improved Tsien's EOS

We have calculated the Hugoniot properties of shocked nitromethane based on the improved Tsien's equation of state (EOS) that optimized by "exact" numerical molecular dynamic data at high temperatures and pressures. Comparison of the calculated results of the improved Tsien's EOS with the existed experimental data and the direct simulations show that the behavior of the improved Tsien's EOS is very good in many aspects. Because of its simple analytical form, the improved Tsien's EOS can be prospectively used to study the condensed explosive detonation coupling with chemical reaction.

岩体中爆腔内压力脉动特征和爆炸能量分布的数值模拟

分析了对岩体中爆炸能量分布和爆腔内压力研究的现状, 为进行这方面的研究, 在块体离散元基础上独立开发了可变形多尺度计算模型和爆源模型, 改进后的数值模型适合研究爆源近区的爆炸效应. 通过该模型对岩体中爆腔内压力和爆炸能量分布进行了数值模拟, 分析了爆腔内压力脉动特征, 指出爆源近区岩体结构性质对爆腔内压力脉动规律影响不大, 爆腔内压力峰值与炸药量无关; 结合热力学和弹性力学知识分析了不同条件下爆炸能量分布规律, 研究了岩体破坏对爆炸能量分布的影响, 给出了岩石断裂破坏消耗能量、变形能、用于抛掷的能量的比例

beta-Delayed proton decays in the rare-earth region near drip line

The history of experimental study on beta-delayed proton decays in the rare-earth region was simply reviewed. The physical results of the beta-delayed proton decays obtained at IMP, Lanzhou over the last 10 years were summarized, mainly including the first observation of 9 new beta-delayed proton precursors along the odd-Z proton drip line and the new data for 2 waiting-point nuclei in the rp-process. The results were compared and discussed with different nuclear model calculations. Finally, the perspective in near future was briefly introduced.

The effects of the annealing time on helium implantation in Si

The modifications induced in silicon samples by helium implantation before and after isothermal annealing at 673 K have been investigated. The surface morphology has been detected by atomic force microscopy. A hillock structure is observed on the sample surface before and after annealing for 5-10 min. Surface blister formation is observed with an increasing annealing time. The variation of crystal damage with annealing time has been investigated by Rutherford backscattering/channeling. The intensity of the damage peak first increases with annealing time, reaches maximum at an annealing time of 60 min and then decreases. Helium-induced bubbles and residual defects have been observed by transmission electron microscopy, which shows that dislocations are close to the bubbles. (C) 2010 Elsevier B.V. All rights reserved.

Preparation and characterization of PtSn/C anode electrocatalysts for direct ethanol fuel cell

Highly active PtSn/C catalyst was prepared by a polyol method. The catalyst was reduced in H-2/Ar atmosphere at 600 degreesC for 2 h in order to obtain different metallic phase. TEM images show uniform dispersion of spherical metal nanoparticles with average diameters of 1.8 and 3.9 nm for the as-prepared and treated catalysts, respectively. UV-vis spectrophotometry is employed to monitor the preparation process and the results indicate that Pt-Sn complex formed once the precursors of Pt and Sn were mixed together. The structure properties of the samples were characterized using X-ray diffraction. The results show that after reduction, the catalyst tends to form PtSn alloy. TPR experiment results show that Sn exists in multivalent state in the as-prepared sample while only zero-valence Sn was detected in the treated sample, while it could not be excluded that the multivalent tin existed in the treated sample. Cyclic voltammetry (CV) technique and single direct ethanol fuel cell (DEFC) tests indicate that the as-prepared catalyst possesses superior catalytic activity for ethanol oxidation to the treated sample. The results suggest that Pt and multivalent Sn are the active species for ethanol oxidation. (C) 2004 Elsevier B.V. All rights reserved.

The PPh3 ligand modified Rh/SiO2 catalyst for hydroformylation of olefins

A novel family of hybrid catalyst with high turnover frequency (TOF) and high selectivity towards aldehydes for hydroformylation of olefins could be successfully approached through direct coordination with the PPh3 ligand to the highly dispersed Rh metal particle precursors. A further advantage is that the catalyst is easily prepared and recyclable. The results revealed that hydroformylation of olefins to aldehydes dominantly took place on the surface of PPh3 ligand modified Rh metal particles of the hybrid catalyst. It was found that the formation of chemical coordination bond between the Rh metal particles and the lone-pair electron of PPh3 was evident through the TG and P-31 NMR measurement. Moreover, the addition of PPh3 onto the Rh/SiO2 exert a significant influence on the adsorption state of reactant CO, H-2 and C2H4 on the PPh3-Rh/SiO2 sample, which probably lead to good catalytic performances for hydroformylation of olefins. (C) 2004 Elsevier B.V. All rights reserved.