Highly efficient photoluminescence of Er2SiO5 films grown by reactive magnetron sputtering method

E2SiO5 thin films were fabricated on Si substrate by reactive magnetron sputtering method with subsequent annealing treatment. The morphology properties of as-deposited films have been studied by scanning electron microscope. The fraction of erbium is estimated to be 23.5 at% based on Rutherford backscattering measurement in as-deposited Er-Si-O film. X-ray diffraction measurement revealed that Er2SiO5 crystalline structure was formed as sample treated at 1100 degrees C for 1 h in O-2 atmosphere. Through proper thermal treatment, the 1.53 mu m Er3+-related emission intensity can be enhanced by a factor of 50 with respect to the sample annealed at 800 degrees C. Analysis of pump-power dependence of Er3+ PL intensity indicated that the upconversion phenomenon could be neglected even under a high photon flux of 10(21) (photons/cm(2)/sec). Temperature-dependent photoluminescence (PL) of Er2SiO5 was studied and showed a weak thermal quenching factor of 2. Highly efficienct photoluminescence of Er2SiO5 films has been demonstrated with Er3+ concentration of 10(22)/cm(3), and it opens a promising way towards future Si-based light source for Si photonics. (C) 2009 Elsevier B.V. All rights reserved.

Role of Bi3+ ions for Er3+ ions efficient 1.54 mu m light emission in Er/Bi codoped SiO2 thin film prepared by sol-gel method

Er/Bi codoped SiO2 thin films were prepared by sol-gel method and spin-on technology with subsequent annealing process. The bismuth silicate crystal phase appeared at low annealing temperature while vanished as annealing temperature exceeded 1000 degrees C, characterized by X-ray diffraction, and Rutherford backscattering measurements well explained the structure change of the films, which was due to the decrease of bismuth concentration. Fine structures of the Er3+-related 1.54 mu m light emission (line width less than 7 nm) at room temperature was observed by photoluminescence (PL) measurement. The PL intensity at 1.54 gm reached maximum at 800 degrees C and decreased dramatically at 1000 degrees C. The PL dependent annealing temperature was studied and suggested a clear link with bismuth silicate phase. Excitation spectrum measurements further reveal the role of Bi3+ ions for Er3+ ions near infrared light emission. Through sol-gel method and thermal treatment, Bi3+ ions can provide a perfect environment for Er3+ ion light emission by forming Er-Bi-Si-O complex. Furthermore, energy transfer from Bi3+ ions to Er3+ ions is evidenced and found to be a more efficient way for Er3+ ions near infrared emission. This makes the Bi3+ ions doped material a promising application for future erbium-doped waveguide amplifier and infrared LED

Fabrication of 1.55-mu m Si-based resonant cavity enhanced photodetectors using sol-gel bonding

In this work, a novel bonding method using silicate gel as the bonding medium was developed to fabricate an InGaAs narrow-band response resonant cavity enhanced photodetector on a silicon substrate. The bonding was performed at a low temperature of 350 degreesC without any special treatment on bonding surfaces and a Si-based narrow-band response InGaAs photodetector was successfully fabricated, with a quantum efficiency of 34.4% at the resonance wavelength of 1.54 mum, and a full-width at half-maximum of about 27 nm. The photodetector has a linear photoresponse up to 4-mW optical power under 1.5 V or higher reverse bias. The low temperature wafer bonding process demonstrates a great potential in device fabrication.

Demonstration of low-cost Si-based tunable long-wavelength resonant-cavity-enhanced photodetectors

A simple process for fabricating low-cost Si-based continuously tunable long-wavelength resonant-cavity-enhanced (RCE) photodetectors has been investigated. High-contrast SiO2/Si(Deltan similar to2) was employed as mirrors to eliminate the need to grow thick epitaxial distributed Bragg reflectors. Such high-reflectivity SiO2/Si mirrors were deposited on the as-grown InGaAs epitaxy layers, and then were bonded to silicon substrates at a low temperature of 350 C without any special treatment on bonding surfaces, employing silicate gel as the bonding medium. The cost is thus decreased. A thermally tunable Si-based InGaAs RCE photodetector operating at 1.3-1.6 mum was obtained, with a quantum efficiency of about 44% at the resonant wavelength of 1476 nm and a tuning range of 14.5 nm. It demonstrates a great potential for industry processes. (C) 2005 American Institute of Physics.

Yb3+-doped 200 mu m diameter core, gain guided index-antiguided fiber

The lasing in an end-pumped gain guided index-antiguided (GG-IAG) Yb3+-doped silicate glass fiber with a 200 mu m diameter core is demonstrated. Laser beams with similar beam propagation factors M (2) and mode field diameters W (0) (> 160 mu m) were observed at the output end of the GG-IAG fibers under different pump powers, which indicated that single mode behavior and excellent beam quality were achieved during propagation. Furthermore, the laser amplifier characteristics in the present Yb3+-doped GG-IAG fiber were also evaluated.

溶胶-凝胶软石印法制备硅酸盐发光薄膜及其图案化

利用瑞利波信息反演层状半空间介质的性质和状态，是地震勘探、岩土工程、及超声检测领域关注的研究课题。本文由层状半空间瑞利波的实验数据，分析给出了层状半空间中瑞利波的传播模式和频散曲线，并进而利用基阶和（或）高阶模式瑞利波频散曲线反演了层状介质参数。本文分别用数值模拟和实验分析进行了深入的研究。在数值模拟中，采用地震勘探中常用的爆炸点源激发产生的瑞利波，利用频率波数分析方法分析了层状半空间瑞利波的频散，考察了源检距，道间距，接收道数目等因素对频散曲线的影响，给出了这些参数的定量要求。研究表明频率波数分析方法得到的频散曲线和按激发强度占主导的模式随频率的变化而形成的跳跃频散曲线一致。对于速度递增的层状半空间，反演时可以仅考虑基阶模式的瑞利波频散曲线，对于含有低速层的层状半空间，则必须考虑模式跳跃后形成的“之”字形频散曲线。在用遗传算法反演介质参数时，也必须考虑激发强度占主导地位的模式随频率的变化，从而恰当地设计目标函数，才能得出对层状介质参数的正确反演。在超声实验中，用表面圆形法向力源激发的瑞利波，对三个层状半空间模型，即均匀半空间，速度递增的两层半空间，含低速层的三层半空间，利用我们实验室自行研制的数字式多通道发射和接收系统，进行了超声探测实验。通过对实验得到的多道瑞利波信号，利用频率波数分析的方法得到了和理论结果一致的实验频散曲线，并基此利用遗传算法实现了层状介质参数的正确反演，得到了和实际介质参数相符的反演结果。数值模拟和实验研究的结果均表明，由实验数据正确给出频散曲线和相应的采用遗传算法发展的适合层状半空间介质的反演方法，是一种优良的反演方法，一般可以找到全局的最优解。获得介质性状较好反演结果的原因，是因为我们首次考虑到了由激发强度决定的占主导地位的模式随频率的变化规律，对应地我们建立了爆炸点源和表面法向力源激发下，分层半空间多模瑞利波模式分析及频散曲线获取和介质参数反演的系统方法。此外，本文最后为了与频率波数分析的结果进行对比，研究了时频分析方法一魏格纳维尔分布，用数值模拟和实验结果分析了层状介质中瑞利波的频散曲线。结果表明时频分析方法获得的频散曲线不及多道频率波数分析得到的瑞利波频散曲线准确。不过由于时频分析仅需要一个接收道的数据就能给出结果，比多道频率波数分析方法要简便，如果能对此方法加以改进，还是一种具有前景的分析方法。总的来说，本文系统地给出了用瑞利波反演分层半空间介质性质和层厚的方法，并给出了相应的软件。数值模拟和实验研究表明，本文给出的建立在严格理论基础上的方法，为用瑞利波探测地层和超声探测层状介质，奠定了可靠的基础。在此基础上，进一步发展相应的系统解释软件，可望能提供给地层勘探，层状材料和薄膜的超声探测等领域应用。

Fabrication of 1.55μm Si-Based Resonant Cavity Enhanced Photodetectors

A novel bonding method using silicate gel as bonding medium is developed.High reflective SiO2/Si mirrors deposited on silicon substrates by e-beam deposition are bonded to the active layers at a low temperature of 350℃ without any special treatment on bonding surfaces.The reflectivities of the mirrors can be as high as 99.9%.A Si-based narrow band response InGaAs photodetector is successfully fabricated,with a quantum efficiency of 22.6% at the peak wavelength of 1.54μm,and a full width at half maximum of about 27nm.This method has a great potential for industry processes.

应用负载型纳米铁去除饮用水中砷的研究

砷是毒性最强的元素之一，水体中砷的污染己经引起人们广泛的关注。我国的新疆、内蒙、山西和台湾等省和地区地下水砷含量严重超标。全球共有5,000多万人遭受高砷饮用水的威胁，其中中国有1,500多万，是饮用水砷污染最严重的国家之一。WHO推荐饮用水砷的最高允许浓度从原来的50 µg•L-1已降至10 µg•L-1。更为严格的砷卫生标准的颁布，对作为饮用水源的地下水中的砷去除工艺提出了更高的要求。吸附法除砷比膜法、混凝法和离子交换法更安全、简便，是砷去除工艺中最有效的方法之一。 首先，本研究通过优化制备条件（包括炭种类的选择、炭的粒径大小、还原剂的浓度及滴定速率、反应温度、铁盐的种类及浓度、分散剂的比例及浓度），制备了负载型纳米铁。考虑到砷的去除效率、工程应用的可行性以及经济性，最优的制备条件如下：选用粒径为20~40目煤质炭，在室温、一定的分散剂比例及浓度，0.2 M KBH4滴速为20 d•min-1时所制备的Fe/炭为82.0 mg•g-1；纳米铁在活性炭孔内呈针状，其直径为30~500 nm，长度为1,000~2,000 nm。绝大多数的铁都负载到活性炭内部，这在处理水时铁不流失很重要。 其次，利用制备的负载型纳米铁作吸附载体，进行了饮用水中As(Ⅴ)的吸附去除实验。研究了该吸附剂对As(Ⅴ)的吸附等温线、动力学以及影响动力学的各种因素（包括As(Ⅴ)的不同初始浓度、吸附剂用量、pH值、共存离子和不同温度）、pH值、共存离子等环境条件对As(Ⅴ)去除的影响；以及吸附剂的再生及再生后的吸附效率等。研究发现在前12 h内吸附较快，72 h时达到了平衡。用Langmuir 吸附等温式估算出As(Ⅴ)的吸附量为12.0 mg•g-1。该吸附剂在pH 6.5， (25±2)℃， As(Ⅴ)初始浓度为2 mg•L-1，吸附剂用量为1.0 g•L-1时，As(Ⅴ)的去除率为75.2%；当把吸附剂的用量增加到1.5 g•L-1时，As(Ⅴ)的去除率可达99.9%以上。吸附剂可以用0.1M的NaOH浸泡12 h后即可再生，再生效率较高。常见的阴离子中PO43-、SiO32-对As(Ⅲ)的去除抑制较大，而SO42-、CO32-、C2O42-等离子对砷的去除影响较小。Fe2+对As(Ⅲ)的吸附抑制作用较大而其它阳离子影响不大。吸附剂可用0.1 M NaOH 有效再生，并且具有良好的机械性能。实验室初步实验数据表明，该吸附剂对饮用水除砷具有较好的应用前景。 第三，利用实验室制备的负载型纳米铁对饮用水中As(Ⅲ)的吸附去除也进行了研究。考察了吸附等温线、动力学以及影响动力学的各种因素、pH值、共存离子等环境条件对As(Ⅲ)去除的影响；以及吸附剂的再生及再生后的吸附效率等。研究发现，该吸附剂在pH 6.5， (25±2)℃， As(Ⅲ)初始浓度为2 mg•L-1，吸附剂用量为1.0 g•L-1时， 对As(Ⅲ)的去除率为99.8%；其吸附容量为1.996mg•g-1。吸附过程中部分As(Ⅲ)被氧化。与As(Ⅴ)的吸附相比，该吸附剂对As(Ⅲ)的效率比较高-而常见的其它除砷吸附剂如载铁纤维棉等，对As(Ⅴ)的效率比As(Ⅲ)高，为有效去除As(Ⅲ)，常常需要专门加上氧化这一过程。 最后，利用负载型纳米铁对饮用水中As(Ⅲ) 的氧化性能进行考察，发现该吸附剂不但能够有效吸附去除饮用水中的砷，而且还能把As(Ⅲ)有效地氧化为As(Ⅴ)。经过对吸附剂的构成组分分析发现，活性炭表面因富含多种官能团而对三价砷的氧化作用最大；其次是纳米铁也能把As(Ⅲ)氧化为As(Ⅴ)。

硅酸盐细菌的优选和发酵培养基的改进

硅酸盐细菌具有分解含钾矿物释放速效钾和产生植物生长刺激物质的作用，以硅酸盐细菌芽孢制成的硅酸盐细菌菌剂是生物肥料的一类重要产品.菌种性能、芽孢浓度和芽孢的存活能力是影响硅酸盐细菌菌剂质量的主要因素.该课题通过考察硅酸盐细菌菌株的适应性，辅以解钾活性综合评价了五株生产菌株的性能.研究探讨了芽孢存活能力与芽孢大小、芽孢浓度的关系，芽孢大存活能力强，芽孢浓度低易获得较大的芽孢.优化了原生产培养基，芽孢浓度稳定提高了4倍以上，芽孢形成率达98%，芽孢大小适中，生长时间、芽孢浓度稳定提高了4倍以上，芽孢形成率达98%，芽孢大小适中，生长时间、芽孢形成时间、发酵液pH和粘度均达到生产要求.同时对K<'+>对硅酸盐细菌生长的影响进行了研究，结果表明低浓度的K<'+>（约1×10<'-3>mol/L）对硅酸盐细菌的生长是有利的.