The gated integration technique for the accurate measurement of the autocorrelation function of speckle intensities scattered from random phase screens

A new approach based on the gated integration technique is proposed for the accurate measurement of the autocorrelation function of speckle intensities scattered from a random phase screen. The Boxcar used for this technique in the acquisition of the speckle intensity data integrates the photoelectric signal during its sampling gate open, and it repeats the sampling by a preset number, in. The average analog of the in samplings output by the Boxcar enhances the signal-to-noise ratio by root m, because the repeated sampling and the average make the useful speckle signals stable, while the randomly varied photoelectric noise is suppressed by 1/ root m. In the experiment, we use an analog-to-digital converter module to synchronize all the actions such as the stepped movement of the phase screen, the repeated sampling, the readout of the averaged output of the Boxcar, etc. The experimental results show that speckle signals are better recovered from contaminated signals, and the autocorrelation function with the secondary maximum is obtained, indicating that the accuracy of the measurement of the autocorrelation function is greatly improved by the gated integration technique. (C) 2006 Elsevier Ltd. All rights reserved.

Measurement of small vibration amplitudes of a rough surface by an interferometer with a self-pumped phase-conjugate mirror

The application of a Michelson interferometer with a self-pumped phase-conjugate mirror to measure small vibration amplitudes of a rough surface is described. The distorted wave front of the light that is diffusely reflected from the rough surface is restored by phase conjugation to provide an interference signal with a high signal-to-noise ratio. The vibration amplitudes of a stainless-steel sample are measured with a precision of similar to 5 nm. (C) 2000 Optical Society of America OCIS codes: 120.3180, 190.5040, 120.7280.

Large-aperture automatic focimeter for the measurement of optical power and other optical characteristics of ophthalmic lenses

We propose an optical apparatus enabling the measurement of spherical power, cylindrical power, and optical center coordinates of ophthalmic lenses. The main advantage of this new focimeter is to provide a full bidimensional mapping of the characteristics of ophthalmic glasses. This is made possible thanks to the use of a large-area and high-resolution position-sensitive detector. We describe the measurement principle and present some typical mappings, particularly for progressive lenses. We then discuss the advantages in terms of speed and versatility of such a focimeter for the measurement of complex lens mappings. (C) 2002 Optical Society of America.

Fiber Bragg grating temperature sensor for multiplexed measurement with high resolution

A novel fiber Bragg grating temperature sensor is proposed and experimentally demonstrated with a long-period grating as a linear response edge filter to convert wavelength into intensity-encoded information for interrogation. The sensor is embedded into an aluminum substrate with a larger coefficient of thermal expansion to enhance its temperature sensitivity. A large dynamic range of 110 degreesC and a high resolution of 0.02 degreesC are obtained in the experiments. The technique can be used for multiplexed measurements with one broadband source and one long-period grating, and therefore is low Cost. (C) 2004 Society of PhotoOptical Instrumentation Engineers.

Influence of birefringence dispersion on distributed measurement of polarization coupling in birefringent fibers

A white light interferometer is developed to measure the distributed polarization coupling in high-birefringence polarization-maintaining fibers (PMFs). Usually the birefringence dispersion between two orthogonal eigenmodes of PMFs is neglected in such systems. Theoretical analysis and experimental results show that the birefringence dispersion becomes a nonnegligible factor in a long-fiber test. Significant broadening of interferograms and loss of longitudinal coherence are observed. The spatial resolution and measurement sensitivity of the system decrease correspondingly. Optimum spectrum width selection is presented for better spatial resolution and measurement range. c 2007 Society of Photo-Optical Instrumentation Engineers.

Small-dynamic-angle measurement using tangent relationship and phase-modulating technique

A method using two prisms for measurement of small dynamic angles is proposed in which the measurement is based on a simple tangent equation and a phase-modulating interferometer with a laser diode to measure dynamic optical path differences with higher accuracy. Owing to the simple tangent equation, the symmetry requirement on the two prisms in the optical configuration is eliminated, and easy measurement of the separations between two parallel beams with a position-sensitive detector is achieved. Small-dynamic-angle measurements are experimentally demonstrated with high accuracy. (C) 2007 Society of Photo-Optical Instrumentation Engineers.

Coherence measurement of a Ti:sapphire femtosecond pulsed laser

The interference patterns produced by Gaussian-shaped broad-bandwidth femtosecond pulsed laser sources are derived. The interference pattern contains both spatial and temporal properties of laser beam. Interference intensity dependent on the bandwidth of femtosecond laser are given. We demonstrate experimentally both the spatial and the temporal coherence properties of a Ti:sapphire femtosecond pulse laser, as well as its power spectrum by using a pinhole pair.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement of the diffraction-limit wavefront with double-shearing interferometers

In order to measure the diffraction-limit wavefront, we present three types of common-path double-shearing interferometers based on the theory of double shearing. Two pairs of half-aperture or whole-aperture wedge plates are used to introduce opposite tilt to realize the double-shearing function. By comparing the fringe widths in two fields, the marginal wavefront aberration can be obtained. In the paper, we give three different configurations: half-aperture configuration, whole-field configuration and double-interferometer configuration. The half-aperture configuration has the features of high sensitivity, stabilization and easy alignment. For the whole-field configuration, the interference fringes are displayed in two whole fields. Consequently, the divergent or convergent characteristic and aberration types of a wavefront can be identified visually. The whole-field configuration can be changed to the double-interferometer configuration for continuous test. Both small and large wavefront aberrations can be measured by the double-interferometer configuration. The minimum detectable wavefront aberration (W-0)(min) comes to 0.03 lambda. Lastly, we present the experimental results for the three types of double-shearing interferometers.

Measurement of thermal rise-time of a laser diode based on spectrally resolved waveforms

Thermal resistance and thermal rise-time are two basic parameters that affect most of the performances of a laser diode greatly. By measuring waveforms received after a spectroscope at wavelengths varied step-by-step, the spectrally resolved waveforms can be converted to calculate the thermal rise-time. Basic formulas for the spectrum variation of a laser diode and the measurement set-up by using a Boxcar are described in the paper. As an example, the thermal rise-time of a p-side up packaged short-pulse laser diode was measured by the method to be 390 mu s. The method will be useful in characterizing diode lasers and LID modules in high-power applications. (c) 2005 Elsevier B.V. All rights reserved.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.