LIFETIME MEASUREMENTS OF SOME TMI ODD PARITY LEVELS

Eleven new lifetimes of odd parity excited energy levels in four configurations: 4f12 5d 6s 6p, 4f12 6S2 6p, 4f13 5d 6s and 4f13 6s 7s of atomic thulium have been mesured with atomic-beam laser spectrocopy. Two pulsed dye lasers are used for stepwise excitation and the time-resolved fluorescence decay was used to determine lifetime values. The accuracy of the measurements is about 10%.

HYPERFINE-STRUCTURE OF SOME ODD PARITY LEVELS IN THE THULIUM SPECTRUM

The laser-atomic-beam spectroscopy technique has been used to make measurements of the hyperfine structure in some odd parity levels of thulium by stepwise excitation. With the experimental results the magnetic dipole hyperfine constants A for the four levels in the configurations 4f12 5d6s6p and 4f12 (H-3(5))6s2 6p3/2 and for two intermediate levels have been obtained.

An Effective Method of Determining the Residual Stress Gradients in a Micro-Cantilever

A method of determining the micro-cantilever residual stress gradients by studying its deflection and curvature is presented. The stress gradients contribute to both axial load and bending moment, which, in prebuckling regime, cause the structural stiffness change and curving up/down, respectively. As the axial load corresponds to the even polynomial terms of stress gradients and bending moment corresponds to the odd polynomial terms, the deflection itself is not enough to determine the axial load and bending moment. Curvature together with the deflection can uniquely determine these two parameters. Both linear analysis and nonlinear analysis of micro-cantilever deflection under axial load and bending moment are presented. Because of the stiffening effect due to the nonlinearity of (large) deformation, the difference between linear and nonlinear analyses enlarges as the micro-cantilever deflection increases. The model developed in this paper determines the resultant axial load and bending moment due to the stress gradients. Under proper assumptions, the stress gradients profile is obtained through the resultant axial load and bending moment.

Fission of solitary wave in stratified fluid

In this paper, we study the fission of a solitary wave in the stratified fluid with a free surface. It has been discovered that there is no difference between the fissions of the internal solitary waves in odd or even modes, and the effect of the stratification on the fission of a surface solitary wave can almost be neglected

飞秒脉冲波列激发的半导体量子阱中再发射场的相位演变

本文研究了在被飞秒脉冲波列激发的半导体量子阱中再发射场的相位性质。再发射场的相位演化受入射脉冲波列的相对相位控制。对于所有的奇数次入射脉冲激发，再发射场与入射场相位演化是：反相到同相再到反相；但是对于所有的偶数次入射脉冲激发，情况发生了反转，即再发射场与入射场相位演化是：同相到反相再到同相。

Generation of attosecond pulses in a system with permanent dipole moment

The generation of attosecond pulses in a two-level system with permanent dipole moment is investigated. It is shown due to the presence of permanent dipole moments, that the plateau of the high-order harmonic generation spectrum can be extended to X-ray range. Moreover, attosecond pulses with higher intensity can be synthesized by using both even and odd harmonics because of their quantum interference. (c) 2006 Elsevier B.V. All rights reserved.

NUMERICAL STUDY OF DAMMANN ARRAY ILLUMINATORS

The numerical solutions of binary-phase (0, tau) gratings for one-dimensional array illuminators up to 32 are presented. Some fabrication errors, which are due to position-quantization errors, phase errors, dilation (or erosion) errors, and the side-slope error, are calculated and show that even-number array illuminators are superior to odd-number array illuminators when these fabrication errors are considered. One (0, tau) binary-phase, 8 x 16 array illuminator made with the wet-chemical-etching method is given in this paper.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Inverse symmetric Dammann gratings

Inverse symmetric Dammann grating is a special grating, whose transition points are reflection symmetric about the midpoint with inverse phase offset in one period. It can produce even-numbered or odd-numbered array illumination when the phase modulations are pi or a specific value. Numerical solutions optimized by the steepest-descent algorithm for binary phase and multilevel phases with splitting ratio from I x 4 to 1 x 14 are given. Fabrication of 1 x 6 array without the zero-order intensity and 1 x 7 array with the zero-order intensity are made from the same amplitude mask. A 6 x 6 output without the crossed zero-orders was achieved by crossing two one-dimensional 1 x 6 inverse symmetric Dammann gratings. This grating may have potential value for practical applications. (C) 2008 Elsevier B.V. All rights reserved.

Spatiotemporal instabilities in nonlinear Kerr media in the presence of arbitrary higher-order dispersions

Spatiotemporal instabilities in nonlinear Kerr media with arbitrary higher-order dispersions are studied by use of standard linear-stability analysis. A generic expression for instability growth rate that unifies and expands on previous results for temporal, spatial, and spatiotemporal instabilities is obtained. It is shown that all odd-order dispersions contribute nothing to instability, whereas all even-order dispersions not only affect the conventional instability regions but may also lead to the appearance of new instability regions. The role of fourth-order dispersion in spatiotemporal instabilities is studied exemplificatively to demonstrate the generic results. Numerical simulations confirm the obtained analytic results. (C) 2002 Optical Society of America.

Raman and infrared properties and layer dependence of the phonon dispersions in multilayered graphene

The symmetry group analysis is applied to classify the phonon modes of N-stacked graphene layers (NSGLs) with AB and AA stacking, particularly their infrared and Raman properties. The dispersions of various phonon modes are calculated in a multilayer vibrational model, which is generalized from the lattice vibrational potentials of graphene to including the interlayer interactions in NSGLs. The experimentally reported redshift phenomena in the layer-number dependence of the intralayer optical C-C stretching mode frequencies are interpreted. An interesting low-frequency interlayer optical mode is revealed to be Raman or infrared active in even or odd NSGLs, respectively. Its frequency shift is sensitive to the layer number and saturated at about 10 layers.

Investigation of filling factor in In0.53Ga0.47As/In0.52Al0.48As quantum wells with two occupied subbands

The magnetic field dependence of filling factors has been investigated on InP based In-0.53 Ga0.47As/In-0.52 Al-0.48 As quantum well samples with two occupied subbands by means of magnetotransport measurements at the temperature of 1.5 K in a magnetic field range of 0 to 13 T. Under the condiction that Laundau-level broadening is larger than the spin splitting of each subband, filling factors are even when the splitting energy of two subbands is an integer multiple of the cyclotron energy, i. e. Delta E-21 = khw(c). If the splitting energy of two subbands is half of an odd interger multiple of the cyclotron erergy, i. e. Delta E-21 = (2 k + 1) hw(c) /2, the filling factor is odd.

Mode quality factor based on far-field emission for square resonators

The quality factors of modes in square resonators are calculated based on the far-field emission of the analytical field distribution. The obtained quality factors are in reasonable agreement with those calculated by the finite-difference time-domain (FDTD) technique and Pade approximation method. The emission power in the square diagonal directions for whispering-gallery-like modes in square resonators is zero due to the interference cancellation caused by the odd field distributions relative to the diagonal mirror planes, so they have larger quality factors than the modes with even field distribution.