Large-aperture automatic focimeter for the measurement of optical power and other optical characteristics of ophthalmic lenses

We propose an optical apparatus enabling the measurement of spherical power, cylindrical power, and optical center coordinates of ophthalmic lenses. The main advantage of this new focimeter is to provide a full bidimensional mapping of the characteristics of ophthalmic glasses. This is made possible thanks to the use of a large-area and high-resolution position-sensitive detector. We describe the measurement principle and present some typical mappings, particularly for progressive lenses. We then discuss the advantages in terms of speed and versatility of such a focimeter for the measurement of complex lens mappings. (C) 2002 Optical Society of America.

Fiber Bragg grating temperature sensor for multiplexed measurement with high resolution

A novel fiber Bragg grating temperature sensor is proposed and experimentally demonstrated with a long-period grating as a linear response edge filter to convert wavelength into intensity-encoded information for interrogation. The sensor is embedded into an aluminum substrate with a larger coefficient of thermal expansion to enhance its temperature sensitivity. A large dynamic range of 110 degreesC and a high resolution of 0.02 degreesC are obtained in the experiments. The technique can be used for multiplexed measurements with one broadband source and one long-period grating, and therefore is low Cost. (C) 2004 Society of PhotoOptical Instrumentation Engineers.

Influence of birefringence dispersion on distributed measurement of polarization coupling in birefringent fibers

A white light interferometer is developed to measure the distributed polarization coupling in high-birefringence polarization-maintaining fibers (PMFs). Usually the birefringence dispersion between two orthogonal eigenmodes of PMFs is neglected in such systems. Theoretical analysis and experimental results show that the birefringence dispersion becomes a nonnegligible factor in a long-fiber test. Significant broadening of interferograms and loss of longitudinal coherence are observed. The spatial resolution and measurement sensitivity of the system decrease correspondingly. Optimum spectrum width selection is presented for better spatial resolution and measurement range. c 2007 Society of Photo-Optical Instrumentation Engineers.

Small-dynamic-angle measurement using tangent relationship and phase-modulating technique

A method using two prisms for measurement of small dynamic angles is proposed in which the measurement is based on a simple tangent equation and a phase-modulating interferometer with a laser diode to measure dynamic optical path differences with higher accuracy. Owing to the simple tangent equation, the symmetry requirement on the two prisms in the optical configuration is eliminated, and easy measurement of the separations between two parallel beams with a position-sensitive detector is achieved. Small-dynamic-angle measurements are experimentally demonstrated with high accuracy. (C) 2007 Society of Photo-Optical Instrumentation Engineers.

Coherence measurement of a Ti:sapphire femtosecond pulsed laser

The interference patterns produced by Gaussian-shaped broad-bandwidth femtosecond pulsed laser sources are derived. The interference pattern contains both spatial and temporal properties of laser beam. Interference intensity dependent on the bandwidth of femtosecond laser are given. We demonstrate experimentally both the spatial and the temporal coherence properties of a Ti:sapphire femtosecond pulse laser, as well as its power spectrum by using a pinhole pair.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement of the diffraction-limit wavefront with double-shearing interferometers

In order to measure the diffraction-limit wavefront, we present three types of common-path double-shearing interferometers based on the theory of double shearing. Two pairs of half-aperture or whole-aperture wedge plates are used to introduce opposite tilt to realize the double-shearing function. By comparing the fringe widths in two fields, the marginal wavefront aberration can be obtained. In the paper, we give three different configurations: half-aperture configuration, whole-field configuration and double-interferometer configuration. The half-aperture configuration has the features of high sensitivity, stabilization and easy alignment. For the whole-field configuration, the interference fringes are displayed in two whole fields. Consequently, the divergent or convergent characteristic and aberration types of a wavefront can be identified visually. The whole-field configuration can be changed to the double-interferometer configuration for continuous test. Both small and large wavefront aberrations can be measured by the double-interferometer configuration. The minimum detectable wavefront aberration (W-0)(min) comes to 0.03 lambda. Lastly, we present the experimental results for the three types of double-shearing interferometers.

Measurement of thermal rise-time of a laser diode based on spectrally resolved waveforms

Thermal resistance and thermal rise-time are two basic parameters that affect most of the performances of a laser diode greatly. By measuring waveforms received after a spectroscope at wavelengths varied step-by-step, the spectrally resolved waveforms can be converted to calculate the thermal rise-time. Basic formulas for the spectrum variation of a laser diode and the measurement set-up by using a Boxcar are described in the paper. As an example, the thermal rise-time of a p-side up packaged short-pulse laser diode was measured by the method to be 390 mu s. The method will be useful in characterizing diode lasers and LID modules in high-power applications. (c) 2005 Elsevier B.V. All rights reserved.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

Quantitative measurement of domain inversion in RuO2 : LiNbO3 crystal by digital holographic interferometry

We quantitatively study the domain inversion in a RuO2:LiNbO3 crystal wafer by the digital holographic interferometry. The crystal wafer is placed into one arm of a Mach-Zehnder-type interferometer to record a series of holograms. Making use of the angular spectrum backward propagation algorithm, we reconstruct the optical wave field in the crystal plane. The extracted phase difference from the reconstructed optical wave field is a well linear function of the applied external voltage. We deduce that the linear electro-optic coefficient of the detected RuO2:LiNbO3 crystal sample is 9.1x10(-12) m/V. An unexpected phase contrast at the antiparallel domain wall is observed and the influence of the applied external voltage on it is studied in detail. Also the built-in internal field is quantitatively measured as 0.72 kV/mm. (c) 2006 American Institute of Physics.

Coma measurement using a PSM and transmission image sensor

As feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. So, fast and accurate in situ measurement of coma is necessary. In the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. By measuring the image positions at multiple NA and partial coherence settings, we are able to extract the coma aberration. The simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 Elsevier GmbH. All rights reserved.

Distributed measurement of birefringence dispersion in polarization-maintaining fibers

A new method to measure the birefringence dispersion in high-birefringence polarization-maintaining fibers is presented using white-light interferometry. By analyzing broadening of low-coherence interferograms obtained in a scanning Michelson interferometer, the birefringence dispersion and its variation along different fiber sections are acquired with high sensitivity and accuracy. Birefringence dispersions of two PANDA fibers at their operation wavelength are measured to be 0.011 ps/(km nm) and 0.018 ps/(km nm), respectively. Distributed measurement capability of the method is also verified experimentally. (c) 2006 Optical Society of America.

Wavefront measurement of double-clad pulsed ytterbium fiber laser

Because of high efficiencies, compact structure, and excellent heat dissipation, high-power fiber lasers are extremely useful for applications such as cutting, welding, precision drilling, trimming, sensing, optical transmitter, material processing, micromachining, and so on. However, the wavefront of the double clad fiber laser doped with ytterbium is still unknown. In this paper, wavefront of a fiber laser is measured and the traditional Hartmann-shack wavefront sensing method is adopted. We measured a double clad fiber laser doped with ytterbium which produces pulse wave output at infrared wavelength. The wavefront shape and contour are reconstructed and the result shows that wavefront is slightly focused and not an ideal plane wavefront. Wavefront measurement of fiber laser will be useful to improving the lasers' performance and developing the coherent technique for its applications.

Measurement of the wavefront of a laser diode system for intersatellite communication by a Jamin double-shearing interferometer

The frame of a laser diode transmitter for intersatellite communication is concisely introduced. A simple, novel and visual method for measuring the diffraction-limited wavefront of the transmitter by a Jamin double-shearing interferometer is proposed. To verify the validity of the measurement, the far-field divergence of beam is additionally rigorously analysed in terms of the Fraunhofer diffraction. The measurement, the necessary analyses and discussion are given in detail. By directly measuring the fringe widths and quantitatively interpreting the interference fringes, the minimum detectable wavefront height (DWH) of the wavefront is only 0.2 gimel (the distance between the perfect plane wavefront and the actual wavefront at the transmitting aperture) and the corresponding divergence is only 65.84 mu rad. This indicates that the wavefront approaches the diffraction-limited condition. The results show that this interferometer is a powerful tool for testing the semiconductor laser beam's wavefront, especially the diffraction-limited wavefront.