275 resultados para Beam Dynamics with Delay
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采用一种特殊的二次光栅用于激光波前测量, 它对非零级衍射光束具有不同的聚焦效应, 其光栅线为圆弧型而非直线。导出了在会聚光束情况下的两平面成像在单一像平面上的距离关系, 实验上实现了二次光栅用于会聚光束的波前测量, 测量得到会聚光束具有较大的散焦(-2.93λ)和球差(1.34λ), 与该透镜引起波前的离焦像差理论理想值(-2.695λ)基本符合。该技术可以实现波前的高空间分辨力和高精度实时测量, 大大减少光学元件数量, 降低装置成本。由于大功率激光束的不稳定性, 其波前变化非常快, 所以该方法的实时性非
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采用反射式达曼光栅对飞秒激光进行分束,可以避免材料色散的影响。搭建了利用反射式1×2达曼光栅为基础的频率分辨光学开关(FROG)装置,并把测量结果与传统多发频率分辨光学开关装置的测量结果进行了对比。理论和实验结果表明,当输入脉冲宽度大于50 fs时,用达曼光栅作为分光器和使用分光镜分光的效果是一样的;当输入脉冲的宽度小于50 fs时,用达曼光栅作为分光器引入的展宽量明显小于分光镜引入的展宽量,尤其是当输入脉冲的宽度小于20 fs时用达曼光栅作为分光器的效果更为突出。
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基于掺镧锆钛酸铅(PLZT)电光陶瓷材料的光学特性,提出了一种具有上下电极结构的光学相控阵高速光束扫描器。在理论上,分析了具有这种结构的光学相控阵的光束电光偏转特性和机制;在实验上,分析了掺镧锆钛酸铅材料的相位调制特性和损耗特性,制作了相关的光学相控阵器件,并构建了相应的测试系统,获得了光束在空间的角度偏转,与理论分析结果相符。
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结合理想坐标系下立方镜镜面微小倾斜后其三个平面法线坐标,利用刚体微量转动的反射法线向量公式,获得非理想立方镜反射矩阵;为了研究在光斜入射时镜面倾斜对出射光方向的影响,利用立方镜绕顶点旋转等效于光斜入射的方法,计算出光束夹角δ与单一镜面偏差角ε和立方镜旋转角θ之间的关系式;对于理想情况下的立方镜,利用几何光学可以证明出射光与入射光不但平行,而且过顶点作任意截面交于两光线所得的两个交点关于顶点对称,从而计算出立方镜绕顶点以外任意轴旋转造成出射光束相对原出射光的偏移量与旋转角关系式,理论计算值与实验数据吻合得很
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基于衍射理论和坐标变换,采用数值模拟的方法分析了硬边非稳腔平面波导激光器的光束特性,研究了存在非均匀抽运和增益饱和时,输出激光的光束质量.在端面抽运和边缘抽运时,比较了正支和负支非稳腔的输出光束特性.结果表明:利用优化的离轴硬边非稳腔可以得到近衍射极限的输出.在相同的抽运不均匀性情况下,对于边缘抽运和端面抽运,正支非稳腔的光束质量因子M^2分别为3.9和2.3,而相同条件下负支非稳腔的M^2因子为1.8和1.7.
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对InnoSlab Laser用混合腔的输出光束质量问题从热透镜效应和腔镜的不对准两个方面的影响进行理论分析,并从远场光强分布、远场发散角、光腰半径、光束质量因子M2值和桶中功率曲线等几个角度进行了讨论,特别是离轴非稳腔方向上腔镜倾斜对光束质量的影响,利用M2值和PIB曲线两个参数共同评价非稳腔的光束质量,对目前并无统一标准的非稳腔光束质量评价问题提供了有意义的参考.
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多层介质反射镜在非正入射的时候,两个不同的偏振态之间会产生不同的相移。利用矩阵法,根据菲涅耳公式和电磁场边界条件,推导出p,s波的相移。通过优化设计.入射角为54°,在1285~1345nm之间p,s波获得了270°±1°的相移,同时也使反射率在99.5%以上。用离子束溅射技术制备相位延迟膜,用分光光度计测试了光谱特性和用椭偏仪测试了相位特性,在相应波段获得了262.4°±1.8°的相移,同时也使反射率在99.6%以上。误差的主要来源是离子源工作特性会产生不均匀的过渡层和最外层会吸收一些水气、灰尘等也产生
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通过对主膜系添加匹配层并借助计算机对膜系进行优化,设计出结构规整、性能优良的1064ilm倍频波长分离膜。用电子束蒸发及光电极值监控技术在K9玻璃基底上沉积薄膜,将样品置于空气中在260℃温度下进行3h热退火处理。然后用Lambda 900分光光度计测量了样品的光谱性能;用表面热透镜(STL)技术测量了样品的弱吸收值;用调Q脉冲激光装置测试了样品的抗激光损伤阈值(LIDT)。实验结果发现,样品的实验光谱性能与理论光谱性能有很好的一致性。退火前后其光谱性能几乎没有发生温漂,说明薄膜的温度稳定性好;同时退火使
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A method for the control of polarization for a broadband dichroic filter was reported and some design examples were elaborated. This method could be applied over a wide range of wavelengths and a wide range of polarizations in the transmission region. A nonpolaiizing broadband dichroic filter and a broadband dichroic filter with certain polarization were designed and fabricated by electron beam evaporation with ion beam assisted deposition. The experimental spectral performances showed good agreement with their theoretical curves. In addition, the application of the method was discussed. (c) 2007 Optical Society of America
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TiO2 films deposited by electron beam evaporation with glancing angle deposition (GLAD) technique were reported. The influence of flux angle on the surface morphology and the microstructure was investigated by scanning electron microscopy. The GLAD TiO2 films are anisotropy with highly orientated nanostructure of the slanted columns. With the increase of flux angle, refractive index and packing density decrease. This is caused by the shadowing effect dominating film growth. The anisotropic structure of TiO2 films results in optical birefringence, which reaches its maximum at the flux angle alpha = 65 degrees. The maximum birefringence of GLAD TiO2 films is higher than that of common bulk materials. It is suggested that glancing angle deposition may offer an effective method to obtain tailorable refractive index and birefringence in a large continuous range. (c) 2006 Elsevier B.V. All rights reserved.
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ZrO2 films were prepared by electron beam evaporation with glancing angle deposition (GLAD) technique. The as-deposition and annealed ZrO2 films are all amorphous, different from that deposited at normal incidence. Due to the shadowing effect, a highly orientated structure composed of slanted columns formed, and the obtained films became the mixture of slanted columns and voids. The relationship among the effective refractive index, packing density and flux incident angle was investigated. The refractive index and packing density of ZrO2 films decrease with the increase of the incident angle. The in-plane birefringence of GLAD ZrO2 films was calculated. At the packing density of 0.576, the maximum birefringence is 0.037. (c) 2006 Elsevier B.V. All rights reserved.
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采用电子束蒸发方式制备了两种不同材料组合的分光膜,分别对其在波长1064 nm激光辐照下的损伤阈值进行了测试,用Alpha-Step 500台阶仪对破斑进行了深度测量。实验结果表明,破斑呈现出表面层的剥落和深坑破坏两种形态。表面层的剥落深度在一定范围内不随能量密度的变化而变化;深坑破坏深浅不一,是膜内缺陷融化、汽化及喷发的综合作用的结果,是损伤阈值降低的主要原因。
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电阻加热具有比较好的加热均匀性,可以认为对于非升华性材料,具有比较理想的平面源发射特性n=1。而电子束加热时,通常n=2~3,甚至可以为6,发射特性参数的范围大,没有取值指导理论或规律,具有很大的不确定性,这对分析薄膜均匀性非常不利。采用细分蒸发源为无数个小的面蒸发源的思想,建立了镀膜材料出现挖坑效应时薄膜厚度均匀性的分析模型。分析结果表明电子束蒸发方法很难获得理想的平面蒸发源,不同程度的挖坑效应将使得n值不同程度地偏离n=1,挖坑效应越明显,n值越大。可以从镀膜机结构设计及薄膜沉积工艺选取两方面着手,降低挖坑效应带来的影响。该研究对认识蒸发源材料发射特性的物理含义具有重要意义,对实验工作同样具有指导性意义。
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Nb2O5 sculptured thin. films deposited by electron beam evaporation with glancing angle deposition were prepared. Nb2O5 sculptured thin. films with tilted columns are optical anisotropy. XRD, SEM, UV-vis-NIR spectra are employed to characterize the microstructure and optical properties. The maximum of birefringence (Delta n) is up to 0.045 at alpha = 70 degrees with packing density of 0.487. With increasing the deposition angle, refractive index and packing density of Nb2O5 STF are decreasing. The relationship among deposition parameter, microstructure and optical properties was investigated in detail. (C) 2008 Elsevier B. V. All rights reserved.
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The structural and magnetic properties of Cu+ ions-implanted GaN films have been reported. Eighty kilo-electron-volt Cu+ ions were implanted into n-type GaN film at room temperature with fluences ranging from 1 x 10(16) to 8 x 10(16) cm(-2) and subsequently annealed at 800 degrees C for 1 h in N-2 ambient. PIXE was employed to determine the Cu-implanted content. The magnetic property was measured by the Quantum Design MPMS SQUID magnetometer. No secondary phases or clusters were detected within the sensitivity of XRD. Raman spectrum measurement showed that the Cu ions incorporated into the crystal lattice positions of GaN through substitution of Ga atoms. Apparent ferromagnetic hysteresis loops measured at 10 K were presented. The experimental result showed that the ferromagnetic signal strongly increased with Cu-implanted fluence from 1 x 10(16) to 8 x 10(16) cm(-2).