102 resultados para residual stress gradients


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利用MEMS技术制作了不同尺寸的镍(Ni)膜微桥结构样品.采用纳米压痕仪XP系统测量了微桥载荷与位移的关系,并结合微桥力学理论模型得到了两种不同尺寸的Ni膜的弹性模量和残余应力.结果表明,两种不同尺寸的Ni膜的弹性模量结果一致,为190 GPa左右,但是残余应力变化较大.与采用纳米压痕仪直接测得的带有硅(Si)基底的Ni膜弹性模量186.8±7.5 GPa相比较,两者符合较好.

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以激光熔凝表面强韧化处理为背景,应用空间弹塑性有限单元和高精度数值算法同时考虑材料组织性能的变潜模拟工件的温度场及残余应力,研究激光熔凝加工中瞬时温度场及残余应力数值模拟,同时考虑相变潜热及相变塑性的影响,用算例验证了模型的正确性,给出了不同时刻温度场分布及残余应力分布。

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热喷涂构件中的热残余应力分布对其使用寿命的影响很大,在涂层和基底之间加入功能梯度材料可以降低构件中的热残余应力。本文用数值方法研究了热喷涂涂层-基底结构中孔隙率的随机分布对结构中热残余应力的影响,以及结构中热残余应力和界面裂纹的应力强度因子与功能梯度层层数之间的关系,并与实验结果相验证。论文由四部分组成。首先,介绍了热喷涂技术的发展历史和目前的主要应用、热喷涂产品中存在的问题以及研究和解决这些问题的方法。其次,研究了涂层中随机分布的孔隙对构件中热残余应力的影响,第三,分析了功能梯度层分层的层数对构件中热残余应力的影响,最后,分析了功能梯度层分层的层数对构件界面裂纹应力强度因子的影响。主要结论为:在期望和方差相同的情况下,涂层中的孔隙率呈高斯分布还是呈均匀分布,对涂层-功能梯度层-基底中的热残余应力的分布影响不大;在基底、涂层和功能梯度层的相对厚度不变的情况下,功能梯度层的层数愈多(即材料性质的过渡愈平缓),涂层-(功能梯度层)-基底结构中的热残余应力愈小;在基底、涂层和功能梯度层的相对厚度不变的情况下,功能梯度层分层的层数愈多,涂层-(功能梯度层)-基底结构的界面裂纹的应力强度因子愈小。

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This paper aims at investigating the size-dependent self-buckling and bending behaviors of nano plates through incorporating surface elasticity into the elasticity with residual stress fields. In the absence of external loading, positive surface tension induces a compressive residual stress field in the bulk of the nano plate and there may be self-equilibrium states corresponding to the plate self-buckling. The self-instability of nano plates is investigated and the critical self-instability size of simply supported rectangular nano plates is determined. In addition, the residual stress field in the bulk of the nano plate is usually neglected in the existing literatures, where the elastic response of the bulk is often described by the classical Hooke’s law. The present paper considered the effect of the residual stress in the bulk induced by surface tension and adopted the elasticity with residual stress fields to study the bending behaviors of nano plates without buckling. The present results show that the surface effects only modify the coefficients in corresponding equations of the classical Kirchhoff plate theory.

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In the absence of external loading, surface tension will induce a residual stress field in the bulk of nano structures. However, in the prediction of mechanical properties of nano structures, the elastic response of the bulk is usually described by classical Hooke’s law, in which the aforementioned residual stress was neglected in the existing literatures. The present paper investigates the influences of surface tension and the residual stress in the bulk induced by the surface tension on the elastic properties of nano structures. We firstly present the surface elasticity in the Lagrangian and the Eulerian descriptions and point out that even in the case of infinitesimal deformations the reference and the current configurations should be discriminated; otherwise the out-plane terms of surface displacement gradient, associated with the surface tension, may sometimes be overlooked in the Eulerian descriptions, particularly for curved and rotated surfaces. Then, the residual stress in the bulk is studied through the non-classical boundary conditions and used to construct the linear elastic constitutive relations for the bulk material. Finally, these relations are adopted to analyze the size-dependent properties of pure bending of Al nanowires. The present results show that surface tension will considerably affect the effective Young’s modulus of Al nanowires, which decrease with either the decrease of nanowires thickness or the increase of the aspect ratio.

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The technology of laser quenching is widely used to improve the surface properties of steels in surface engineering. Generally, laser quenching of steels can lead to two important results. One is the generation of residual stress in the surface layer. In general, the residual stress varies from the surface to the interior along the quenched track depth direction, and the residual stress variation is termed as residual stress gradient effect in this work. The other is the change of mechanical properties of the surface layer, such as the increases of the micro-hardness, resulting from the changes of the microstructure of the surface layer. In this work, a mechanical model of a laser-quenched specimen with a crack in the middle of the quenched layer is developed to quantify the effect of residual stress gradient and the average micro-hardness over the crack length on crack tip opening displacement (CTOD). It is assumed that the crack in the middle of the quenched layer is created after laser quenching, and the crack can be a pre-crack or a defect due to some reasons, such as a void, cavity or a micro-crack. Based on the elastic-plastic fracture mechanics theory and using the relationship between the micro-hardness and yield strength, a concise analytical solution, which can be used to quantify the effect of residual stress gradient and the average micro-hardness over the crack length resulting from laser quenching on CTOD, is obtained. The concise analytical solution obtained in this work, cannot only be used as a means to predict the crack driving force in terms of the CTOD, but also serve as a baseline for further experimental investigation of the effect after laser-quenching treatment on fracture toughness in terms of the critical CTOD of a specimen, accounting for the laser-quenching effect. A numerical example presented in this work shows that the CTOD of the quenched can be significantly decreased in comparison with that of the unquenched. (C) 2008 Elsevier B.V. All rights reserved.

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激光直接成形中,几何参数、材料属性和工艺参数等众多参量均会对残余应力造成影响,需要进行系统分析.采用量纲分析的方法,分别提取表征几何、传热和变形的3类关键无量纲参数,并结合三维瞬态有限元分析模型来研究这些无量纲参数对热致残余应力的影响规律.研究表明,选用热膨胀系数、屈服应力较小的材料,残余应力会较小;工艺控制中,可通过降低热散失,增大激光功率和提升预热温度来减小残余应力,其中预热的效果最好.

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用扫描电镜(SEM)观察了化学沉积Ni-P合金薄膜/单晶硅基体的结构与颗粒度,利用X射线衍射(XRD)技术测试了其化学沉积后的残余应力,测量了激光热处理后残余应力的变化规律,分析了残余应力对磨损性能及界面结合强度的影响。实验结果表明,化学沉积Ni-P合金薄膜/硅基体的残余应力均表现为拉应力,经过激光热处理后残余应力发生了变化,由高值的拉应力变为低值的拉应力或压应力;薄膜残余应力对其磨损性能有明显的影响,其磨损量随着残余应力的减小而减小;薄膜与基体结合强度随着残余应力的增大而减小,合理地选择激光热处理参数可

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ZrO2/SiO2多层膜由相同沉积条件下的电子束蒸发方法制备而成,通过改变多层膜中高(ZrO2)、低(SiO2)折射率材料膜厚组合周期数的方法,研究了沉积在熔石英和BK7玻璃基底上多层膜中残余应力的变化.用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化,并确定了薄膜中的残余应力.结果发现,该多层膜中的残余应力为压应力,随着薄膜中膜厚组合周期数的增加,压应力值逐渐减小.而且在相同条件下,石英基底上所沉积多层膜中的压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值.用X射线衍射技术测量分析了膜厚组合周

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SiO2薄膜由电子束蒸发方法沉积而成。用GPI数字波面光学干涉仪测量了不同沉积条件下玻璃基底镀膜前后曲率半径的变化,并确定了SiO2薄膜中的残余应力。在其他条件相同的情况下,当沉积温度由190℃升高到350℃时,SiO2薄膜中的压应力由一156MPa增大为-289MPa。氧分压由3.0×10^-3Pa升高到13.0×10^-3Pa时,SiO2薄膜中的应力由-223.5MPa变为20.4MPa。通过对薄膜折射率的测量,发现薄膜的堆积密度随沉积条件的改变也发生了规律性的变化。应力的变化主要是由于沉积时蒸发粒子

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采用ZYGO MarkⅢ-GPI数字波面干涉仪、NamoScopeⅢa型原子力显微镜对不同氧分压下电子束蒸发方法制备的SiO2薄膜中的残余应力及表面形貌进行了研究,结果发现:随着氧分压的增大,薄膜中的压应力值逐渐减小,最后变为张应力状态;同时薄膜的表面粗糙度也随着氧分压的增大而逐渐增大,另外,折射率对氧分压也非常敏感,随着氧分压的增大呈现出了减小的趋势,这些现象主要是由于氧分压的改变使得SiO2薄膜结构发生了变化引起的。

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采用电子束蒸发沉积方法在BK7玻璃基底和熔融石英基底上沉积了HfO2薄膜,研究了不同沉积温度下的应力变化规律。利用ZYGO干涉仪测量了基片镀膜前后曲率半径的变化,计算了薄膜应力。结果发现在所考察的实验条件下HfO2薄膜的残余应力均为张应力,应力值随沉积温度的升高先增大后减小。两种基底上薄膜的残余应力的主要产生机制不同。对于BK7玻璃基底HfO2薄膜的残余应力起决定作用的是内应力,熔融石英基底上HfO2薄膜的残余应力在较低沉积温度下制备的薄膜起决定作用的是热应力,在沉积温度进一步升高后内应力开始起决定作用。

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用电子柬蒸发方法制备了HfO2薄膜,根据镀膜前后基片曲率半径的变化,用Stoney公式计算了薄膜应力。讨论了沉积温度对薄膜残余应力的影响。结果发现,HfO2薄膜的残余应力均为张应力,应力值随沉积温度的升高先增大后减小,在280℃左右出现极大值。对样品进行了XRD测试,从微观结构上对实验结果进行了分析,发现微结构演变引起的内应力变化是引起薄膜残余应力改变的主要因素,HfO2薄膜在所选沉积温度60~350℃内出现了晶态转变,堆积密度随温度升高而增大。

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We investigate the influence of vacuum organic contaminations on laser-induced damage threshold (LIDT) of optical coatings. Anti-reflective (AR) coatings at 1064 nm made by Ta2O5/SiO2 are deposited by the ion beam sputtering method. The LIDTs of AR coatings are measured in vacuum and in atmosphere, respectively. It is exhibited that contaminations in vacuum are easily to be absorbed onto optical surface because of lower pressure, and they become origins of damage, resulting in the decrease of LIDT from 24.5 J/cm(2) in air to 15.7 J/cm(2) in vacuum. The LIDT of coatings in vacuum has is slightly changed compared with the value in atmosphere after the organic contaminations are wiped off. These results indicate that organic contaminations are the main reason of the LIDT decrease in vacuum. Additionally, damage morphologies have distinct changes from vacuum to atmosphere because of the differences between the residual stress and thermal decomposability of filmy materials.

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Single layers and antireflection films were deposited by electron beam evaporation, ion assisted deposition and interrupted ion assisted deposition, respectively. Antireflection film of quite high laser damage threshold (18J/cm(2)) deposited by interrupted ion assisted deposition were got. The electric field distribution, weak absorption, and residual stress of films and their relations to damage threshold were investigated. It was shown that the laser induced damage threshold of film was the result of competition of disadvantages and advantages, and interrupted ion assisted deposition was one of the valuable methods for preparing high laser induced damage threshold films. (c) 2007 Optical Society of America