Growth and characterization of strained superlattices delta-GaNxAs1-x/GaAs by molecular beam epitaxy


Autoria(s): Pan Z; Li LH; Lin YW; Zhou ZQ; Zhang W; Wang YT; Wu RH
Data(s)

2000

Resumo

A series of superlattices delta-GaNxAs1-x/GaAs were grown by a DC plasma-N-2-assisted molecular beam epitaxy. The evolution of the surface reconstruction during the growth has been studied with the use of in situ reflection high-energy electron diffraction. The superlattices have been characterized by high-resolution X-ray diffraction measurements. Distinct satellite peaks indicate that the superlattices are of good quality. The N compositions in strained GaNxAs1-x monolayers are obtained from the dynamical simulations of the measured X-ray diffraction patterns. The periodicity fluctuations of N composition are obtained from a kinematical method dependent on the broadening of the satellite peaks of the X-ray diffraction. (C) 2000 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12688

http://www.irgrid.ac.cn/handle/1471x/65314

Idioma(s)

英语

Fonte

Pan Z; Li LH; Lin YW; Zhou ZQ; Zhang W; Wang YT; Wu RH .Growth and characterization of strained superlattices delta-GaNxAs1-x/GaAs by molecular beam epitaxy ,JOURNAL OF CRYSTAL GROWTH,2000,209(4):648-652

Palavras-Chave #半导体材料 #GaNAs/GaAs superlattice #X-ray diffraction #periodicity fluctuation #MBE #RHEED #BAND-GAP ENERGY #NITROGEN #ALLOYS #DIFFRACTION #COEFFICIENT #SOLUBILITY #OPERATION #GAAS1-XNX #GAASN
Tipo

期刊论文