Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings
Data(s) |
2005
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Resumo |
Laser conditioning effects of the HfO2/SiO2 antireflective (AR) coatings at 1064 nm and the accumulation effects of multishot laser radiation were investigated. The HfO2/SiO2 AR coatings were prepared by E-beam evaporation (EBE). The singleshot and multi-shot laser induced damage threshold was detected following ISO standard 11254-1.2, and the laser conditioning was conducted by three-step raster scanning method. It was found that the single-shot LIDT and multi-shot LIDT was almost the same. The damage mostly > 80% occurred in the first shot under multi-shot laser radiation, and after that the damage occurring probability plummeted to < 5%. There was no obvious enhancement of the laser damage resistance for both the single-shot and multi-shot laser radiation of the AR coatings after laser conditioning. A Nomarski microscope was employed to map the damage morphology, and it found that the damage behavior is defect-initiated for both unconditioned and conditioned samples. © 2004 Elsevier B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Zhao YN;Wang T;Zhang DW;邵建达;范正修.,Appl. Surf. Sci.,2005,245(1~4):335-339 |
Palavras-Chave | #光学薄膜 #antireflective coatings #laser conditioning #single-shot #multi-shot #laser-induced damage threshold #accumulation effects #defect #damage morphology |
Tipo |
期刊论文 |