872 resultados para etching
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Mechanical stability of EWT solar cells deteriorates when holes are created in the wafer. Nevertheless, the chemical etching after the hole generation process improves the mechanical strength by removing part of the damage produced in the drilling process. Several sets of wafers with alkaline baths of different duration have been prepared. The mechanical strength has been measured by the ring on ring bending test and the failure stresses have been obtained through a FE simulation of the test. This paper shows the comparison of these groups of wafers in order to obtain an optimum value of the decreased thickness produced by the chemical etching
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Auxetic materials (or metamaterials) have negative Poisson ratios (NPR) and display the unexpected properties of lateral expansion when stretched, and equal and opposing densification when compressed. Such auxetic materials are being used more frequently in the development of novel products, especially in the fields of intelligent expandable actuators, shape-morphing structures, and minimally invasive implantable devices. Although several micromanufacturing technologies have already been applied to the development of auxetic materials and devices, additional precision is needed to take full advantage of their special mechanical properties. In this study, we present a very promising approach for the development of auxetic materials and devices based on the use of deep reactive ion etching (DRIE). The process stands out for its precision and its potential applications to mass production. To our knowledge, it represents the first time this technology has been applied to the manufacture of auxetic materials with nanometric details. We take into account the present capabilities and challenges linked to the use of DRIE in the development of auxetic materials and auxetic-based devices.
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Translation of: Traité de la gravure à l'eau-forte.
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Most of the plates printed on both sides.
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At head of title: Victoria and Albert museum. Department of engraving, illustration and design.
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Each plate accompanied by leaf with descriptive letterpress in red.
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Mode of access: Internet.
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Includes index.
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Errata for Ars pictoria, p. [8] of preliminaries. Errata for Appendix, p. 39.
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Image creator Shaw was General Secretary of the Alumni Association, 1904-1029 and Director of the Bureau of Alumni relations, 1929 -1950. He edited and illustrated the Michigan Alumnus and Michigan Alumnus Quarterly Review.
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Shaw was General Secretary of the Alumni Association, 1904-1029; Director of the Bureau of Alumni relations, 1929 -1950. He was both editor and illustrator of the Michigan Alumnus and Michigan Alumnus Quarterly Review.
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Image creator Shaw was General Secretary of the Alumni Association, 1904-1029 and Director of the Bureau of Alumni relations, 1929 -1950. He edited and illustrated the Michigan Alumnus and Michigan Alumnus Quarterly Review.
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Image creator Shaw was General Secretary of the Alumni Association, 1904-1029 and Director of the Bureau of Alumni relations, 1929 -1950. He edited and illustrated the Michigan Alumnus and Michigan Alumnus Quarterly Review.
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Shaw was General Secretary of the Alumni Association, 1904-1029; Director of the Bureau of Alumni relations, 1929 -1950. He was both editor and illustrator of the Michigan Alumnus and Michigan Alumnus Quarterly Review.
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Image creator Shaw was General Secretary of the Alumni Association, 1904-1029 and Director of the Bureau of Alumni relations, 1929 -1950. He edited and illustrated the Michigan Alumnus and Michigan Alumnus Quarterly Review.