1000 resultados para oleander scale


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Large-scale uniform Ag microtubes with high length diameter ratios have been first successfully synthesized by a facile approach, using low-cost super fine glass fibers as templates. The samples were characterized by SEM and XRD. The investigations showed that calcining or adding of PEG-1000 and alcohol could greatly improve the mechanical strength of the sample. Especially the products exhibited favorable catalytic properties during the degradation of Rhodamine B by NaBH4. (c) 2007 Elsevier B.V. All rights reserved.

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We present radio images of the compact steep spectrum (CSS) quasar 3C 286 acquired with the Very Large Array (VLA) at 8.4 and 22.5 GHz. The source exhibits a two-sided core-jet structure with a bright central component and two extended components one to the east (P.A. 100degrees) and another to the southwest (P.A. -116degrees). From the compact core, an extension runs towards the southwest component up to similar to 0.7 arcsecond. The emission between the primary central component and the southwest component exhibits a knotty structure. A gradual change of the jet position angles from -135degrees to -120degrees in the inner southwest jet suggests a local bend. The position angle changes of the major eastern components E2 and E1 suggest that the eastern jet likely follows a curved trace. The bends in the jet trace may be associated with a relativistic precession or some interaction between the jet and the ambient matter. A mean spectral index of alpha(8.4)(22.5) similar to -0.76 (S-nu proportional to nu(alpha)) is estimated for the core component. Steep spectra are also obtained for the extended southwest component (2.6", P.A. -116degrees) and eastern component (0.8", P.A. 100degrees), with alpha(8.4)(22.5) similar to -0.88 and alpha(8.4)(22.5) similar to -1.79, respectively. The radio morphologies and spectral index distributions suggest that the core seen in our images is likely to be the beamed inner jet while the real nucleus is dimmed by it beaming away from us.

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A lithography-independent and wafer scale method to fabricate a metal nanogap structure is demon-strated. Polysilicon was first dry etched using photoresist (PR) as the etch mask patterned by photolithography.Then, by depositing conformal SiO_2 on the polysilicon pattern, etching back SiO_2 anisotropically in the perpendic-ular direction and removing the polysilicon with KOH, a sacrificial SiO_2 spacer was obtained. Finally, after metal evaporation and lifting-off of the SiO_2 spacer, an 82 nm metal-gap structure was achieved. The size of the nanogap is not determined by the photolithography, but by the thickness of the SiO_2. The method reported in this paper is compatible with modern semiconductor technology and can be used in mass production.