A wide-bandgap semiconducting polymer for ultraviolet and blue light emitting diodes

A novel wide-bandgap conjugated polymer (PDHFSCHD) consisting of alternating dihexylfluorene and rigidly twisted biphenyl units has been synthesized. The new fluorene-based copolymer composed of rigid twisting segments in the main-chain exhibits an optical bandgap of as high as 3.26 eV, and a highly efficient ultraviolet emission with peaks at 368 nm and 386 nm. An electroluminescence device from PDHFSCHD neat film as an active layer shows UV emission which peaks at 395 nm with a turn on voltage below 8 V By optimizing the device conditions, a peak EL quantum efficiency of 0.054% and brightness of 10 cd.m(-2) was obtained. Furthermore, blending a poly(dihexylfluorene) in the PDHFSCHD host gave pure blue emission peaking at 417 nm, and 440 nm without long wavelength emission from aggregated species. Efficient energy transfer from PDHFSCHD to PDHF was demonstrated in these blended systems. Depressed chain-aggregation of PDHF in the PDHFSCHD host can correspond to pure blue emission behaviors.

Synthesis, crystal structure, and magnetic properties of {[Cu(oxbe)]Mn(H2O)[Cu(oxbe)(DMF)]}(n)center dot nDMF center dot nH(2)O: From dissymmetrical mononuclear entities to a 3D heterometallic supramolecular coordination polymer

Self-assembly of the building block [Cu(oxbe)](-) with Mn(II) led to a novel coordination polymer {[Cu(oxbe)]Mn(H2O)(Cu(oxbe)(DMF)]}(n).nDMF.nH(2)O, where H(3)oxbe is a new dissymmetrical ligand N-benzoato-N'-(2-aminoethyl)-oxamido and DMF = dimethylformamide. The crystal forms in the triclinic system, space group P(1)over-bar, with a = 9.260(4) angstorm, b = 12.833(5) angstrom, c = 15.274(6) angstrom , alpha = 76.18(3)degrees, beta = 82.7(3)degrees, gamma = 82.31(3)degrees, and Z = 2. The crystal structure of the title complex reveals that the two-dimensional bimetallic layers are constructed of (CuMnII)-Mn-II-Cu-II chains linked together by carboxylate bridge and hydrogen bonds help to produce a novel three-dimensional channel-like structure. The magnetic susceptibility measurements (5-300 K) were analyzed by means of the Hamiltonian (H)over-cap = -2J(S)over-cap (Mn)((S)over-cap(Cu1) + (S)over-cap(Cu2)), leading to J = -17.4 cm(-1).

Fabrication of a metal particle array based on a self-assembled template from a two-armed polymer

A two-armed polymer with a crown ether core self-assembles to produce macroporous films with pores perpendicularly reaching through the film down to the substrate. A possible assembling mechanism is discussed. The pore size can be conveniently adjusted by changing the solution concentration. These through-hole macroporous films provide a template for fabricating an array of Cu nanoparticle aggregates.

How to form regular polymer microstructures by surface-pattern-directed dewetting

The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

Patterning thin polymer films by surface-directed dewetting and pattern transfer

The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.

Pattern formation in polymer films under the mask

This paper presents a straightforward method for patterning thin films of polymers, i.e. a prepatterned mask is used to induce self-assembly of polymers and the resulting pattern is the same as the lateral structures in the mask on a submicrometre length scale, The patterns can be formed at above T-g + 30 degreesC in a short time and the external electric field is not crucial. Electrostatic force is assumed to be the driving force for the pattern transfer. Viscous fingering and novel stress-relief lateral morphology induced under the featureless mask are also observed and the formation mechanisms are discussed.

Surface morphology control of immiscible polymer-blend thin films

The effects of the molecular weights (molecular weight of polystyrene, M-w,M-PS, varying from 2.9 to 129 k) on the surface morphologies of spin-coated and annealed polystyrene/poly (methyl methacrylate) (PS/PMMA = 50/50, w/w) blend films were investigated by atomic force microscopy and X-ray photoelectron spectroscopy. For the spin-coated films, when the M-w,M-PS varied from 2.9 to 129 k, three different kinds of surface morphologies (a nanophase-separated morphology, a PMMA cellular or network-like morphology whose meshes filled with PS, a sea-island like morphology) were observed and their formation mechanisms are discussed, respectively. Upon annealing, two different morphology-evolution processes were observed. It is found that a upper PS-rich phase layer is formed when M-w,M-PS < 4 k, and this behavior is mainly attributed to the low interfacial tension between PS and PMMA component. When M-w,M-PS > 4 k, the PS-rich phase forms droplets on top of the PMMA-rich phase layer which wets the SiOx substrate. These results indicate that the surface morphology of the polymer blend films can be controlled by the polymer molecular weight and annealing conditions.

Embossing of polymers using a thermosetting polymer mold made by soft lithography

In this article we present a mechanical pattern transfer process where a thermosetting polymer mold instead of a metal, dielectric, ceramic, or semiconductor master made by conventional lithography was used as the master to pattern thermoplastic polymers in hot embossing lithography. The thermosetting polymer mold was fabricated by a soft lithography strategy, microtransfer molding. For comparison, the thermosetting polymer mold and the silicon wafer master were both used to imprint the thermoplastic polymer, polymethylmethacrylate. Replication of the thermosetting polymer mold and the silicon wafer master was of the same quality. This indicates that the thermosetting polymer mold could be used for thermoplastic polymer patterning in hot embossing lithography with high fidelity.

Formation of regular hole pattern in polymer films

Ordered macroporous materials recently have attracted much attention. A method that utilizes the condensation of monodisperse water droplets on a polymer solution is proposed for the preparation of honeycomb microporous films. Our results show that it is a general method that can be used for patterning a wide range of polymers. The presence of water vapor and polymer is necessary for the formation of regular holes in films. The formation of hexagonal packing instead of other kinds of packing takes place because the hexagonal packing has the lowest free energy. The formation mechanisms of regular hole pattern and imperfections in the hexagonal packing are proposed.

A new method for fabrication of three-dimensional polymer micropatterning - Microtransfer molding

Microtransfer molding (muTM) is a kind of soft lithography for polymer micropatterning. In muTM, a liquid prepolymer(or concentrated polymer solution) is applied to the patterned surface of an elastomeric mold and then brought into the contact with a substrate. After prepolymer is cured thermally or by UV light, the elastomeric mold is peeled away. A pattern is left on the surface of the substrate. In this study, similar to300 nm lines and three-dimensional patterns of PMMA and epoxy on planar and/or non-planar substrates are realized.

Polymer light-emitting diodes based on a bipolar transporting luminescent polymer

A soluble electroluminescent polymer containing hole-deficient triphenylamine and electron-deficient oxadiazole units in the main chains has been designed and studied. The design is based on the consideration that the triphenylamine group possesses good hole-transporting property and the oxadiazole unit is known to be of electron-transporting character. Because of the good bipolar transporting performance, the brightness and electroluminescent efficiency are significantly improved and the turn-on voltage is reduced compared with a similar polymer without the electron-deficient oxadiazole units in the main chains. For a device with configuration ITO/PEDOT/polymer/CsF/Al, a maximum brightness of 3600 cd m(-2) and a maximum luminescent efficiency of 0.65 cd A(-1) (quantum efficiency of 0.3%) were obtained in the polymer with oxadiazole units, about 15 times brighter and 15 times more efficient than the corresponding polymer without oxadiazole units.

Monte Carlo simulation of miscibility of polymer blends with repulsive interactions: effect of chain structure

The effects of the chain structure and the intramolecular interaction energy of an A/B copolymer on the miscibility of the binary blends of the copolymer and homopolymer C have been studied by means of a Monte Carlo simulation. In the system, the interactions between segments A, B and C are more repulsive than those between themselves. In order to study the effect of the chain structure of the A/B copolymer on the miscibility, the alternating, random and block copolymers were introduced in the simulations, respectively. The simulation results show that the miscibility of the binary blends strongly depends on the intramolecular interaction energy ((ε) over bar (AB)) between segments A and B within the A/B copolymers. The higher the repulsive interaction energy, the more miscible the A/B copolymer and homopolymer C are. For the diblock copolymer/homopolymer blends, they tend to form micro phase domains. However, the phase domains become so small that the blend can be considered as a homogeneous phase for the alternating copolymer/ homopolymer blends. Furthermore, the investigation of the average end-to-end distance ((h) over bar) in different systems indicates that the copolymer chains tend to coil with the decrease Of (ε) over bar (AB) whereas the (h) over bar of the homopolymer chains depends on the chain structure of the copolymers.

Computer simulation of miscibility and self-assembly structure for polymer-containing systems with special interactions

The miscibility and structure of A-B copolymer/C homopolymer blends with special interactions were studied by a Monte Carlo simulation in two dimensions. The interaction between segment A and segment C was repulsive, whereas it was attractive between segment B and segment C. In order to study the effect of copolymer chain structure on the morphology and structure of A-B copolymer/C homopolymer blends, the alternating, random and block A-B copolymers were introduced into the blends, respectively. The simulation results indicated that the miscibility of A-B block copolymer/C homopolymer blends depended on the chain structure of the A-B copolymer. Compared with alternating or random copolymer, the block copolymer, especially the diblock copolymer, could lead to a poor miscibility of A-B copolymer/C homopolymer blends. Moreover, for diblock A-B copolymer/C homopolymer blends, obvious self-organized core-shell structure was observed in the segment B composition region from 20% to 60%. However, if diblock copolymer composition in the blends is less than 40%, obvious self-organized core-shell structure could be formed in the B-segment component region from 10 to 90%. Furthermore, computer statistical analysis for the simulation results showed that the core sizes tended to increase continuously and their distribution became wider with decreasing B-segment component.

Pressure effects on the thermodynamics of trans-decahydronaphthalene/polystyrene polymer solutions: Application of the Sanchez-Lacombe lattice fluid theory

The cloud-point temperatures (T-cl's) of trans-decahydronaphthalene(TD)/polystyrene (PS, (M) over bar (w) = 270 000) solutions were determined by light scattering measurements over a range of temperatures (1-16degreesC), pressures (100-900 bar), and compositions (4.2-21.6 vol.-% polymer). The system phase separates upon cooling and T-cl was found to increase with rising pressure for constant composition. In the absence of special effects, this finding indicates positive excess volume for the mixing. Special attention was paid to the demixing temperatures as a function of pressure for different polymer solutions and the plots in the T-phi plane (where phi signifies volume fractions). The cloud-point curves of polymer solutions under different pressures were observed for different compositions, which demonstrated that pressure has a greater effect on the TD/PS solutions when far from the critical point as opposed to near the critical point. The Sanchez-Lacombe lattice fluid theory (SLLFT) was used to calculate the spinodals, the binodals, the Flory-Huggins (FH) interaction parameter, the enthalpy of mixing, and the volume changes of mixing. The calculated results show that modified PS scaling parameters can describe the thermodynamics of the TD/PS system well. Moreover the SLLFT describes the experimental results well.