铒掺杂钠铝硅玻璃成分对其光谱性质的影响

研究了Na2O含量对Na2O-Al2O3-SiO2(NAS)玻璃的光谱性质的影响。利用Judd-Ofelt(J-O)理论和吸收光谱计算了Er^3+掺杂的铝硅酸盐玻璃的Ωt参数、自发辐射几率和自发辐射寿命，分析了Ωt参数与Na2O含量的关系以及与吸收截面，Er^3+离子^4I13 2能级的自发辐射几率和荧光半峰全宽(FWHM)等性质的关系。随Na2O含量的增加．J-O参数Ωt(t=2，4，6)减小，Er^3+离子1533nm的吸收截面和荧光半峰全宽．Er^3+离子^4I13 2能级的自发辐射几率也减小，而E

Cultura de tecidos e conservação in vitro de Passiflora foetida L.

O gênero Passiflora ocorre principalmente em regiões de clima tropical, sendo o Brasil um importante centro de diversidade. Passiflora foetida L. é uma espécie silvestre que apresenta características de interesse ornamental e medicinal. O objetivo deste trabalho foi o estabelecimento de sistemas de cultura de tecidos e criopreservação para P. foetida. Explantes caulinares foram excisados de culturas primárias obtidas a partir de plântulas derivadas da germinação in vitro. Para isso foram inoculados em meio MSM, suplementado com diferentes concentrações de ANA, PIC, TDZ e BAP utilizado isoladamente ou em combinação com ANA, e mantidos na presença ou ausência de luz. Foi observada a produção de brotos, calos e raízes adventícias, de acordo com o tipo e a concentração do regulador de crescimento testado e da condição de cultura utilizada. A produção de plantas ocorreu via organogênese direta e indireta em resposta a BAP, enquanto que a formação de calos não morfogênicos foi observada a partir de ambos explantes em resposta a PIC. A produção de raízes adventícias ocorreu em resposta a ANA. Tendo em vista a produção de raízes observada em meio sólido, segmentos internodais foram inoculados em meio líquido suplementado com diferentes auxinas e mantidos em imersão contínua ou sobre pontes de papel de filtro. A maior taxa de multiplicação de raízes foi observada a partir de entrenós mantidos no sistema de ponte de papel de filtro, em resposta a ANA. Segmentos radiculares excisados das culturas primárias também foram utilizados visando à produção de brotos e a multiplicação de raízes. Contudo, apenas foi observada a formação de gemas, sem posterior desenvolvimento de brotos. Além disso, a capacidade proliferativa dos segmentos radiculares inoculados em meio suplementado com ANA foi menor que a obtida a partir dos entrenós cultivados nas mesmas condições. Neste trabalho, foram também testados diferentes protocolos de criopreservação para ápices caulinares de P. foetida por meio de vitrificação e encapsulamento-vitrificação. A recuperação de plantas pós-congelamento foi observada unicamente a partir de ápices encapsulados e expostos à solução de vitrificação PVS2 por 120 minutos. Tendo em vista o potencial medicinal já descrito para P. foetida, através dos diferentes sistemas de cultura desenvolvidos neste trabalho serão obtidos materiais para a avaliação de diferentes atividades biológicas.

Investigations on bismuth and aluminum co-doped germanium oxide glasses for ultra-broadband optical amplification

The broadband luminescence covering 1.2-1.6 mu m was observed from bismuth and aluminum co-doped germanium oxide glasses pumped by 808 nm laser at room temperature. The spectroscopic properties of GeO2:Bi,Al glasses strongly depend on the glass compositions and the pumping sources. To a certain extent, the Al3+ ions play as dispersing reagent for the infrared-emission centers in the GeO2:Bi,Al glasses. The broad infrared luminescence with a full width at half maximum larger than 200 nm and a lifetime longer than 200 mu s possesses these glasses with the potential applications in broadly tunable laser sources and ultra-broadband fiber amplifiers in optical communication field. (c) 2005 Elsevier B.V. All rights reserved.

掺Nd^3＋离子的高硅氧玻璃微片激光器

将SiO2含量超过97wt%的具有纳米级微孔的多孔高硅氧玻璃浸泡在含有Nd^3＋离子的溶液后取出，在1100℃烧结成透明无孔高硅氧玻璃。在800nm的激光抽运下，这种Nd^3＋离子掺杂的高硅氧玻璃微片激光器实现了斜率效率为62%，光-光转换效率为42%，波长为1064nm的激光输出。

LD抽运Yb:GSO实现1090nm低阈值激光运转

We report what we believe to be the first demonstration of laser operation with a novel laser material of Yb3(+) -doped Gd-2 SiO2 (Yb: GSO) pumped by a laser diode at 940 nm. We obtained a low lasing threshold of 1.27 kW/cm(2) with the center wavelength of 1090 nm, which is lower than the value of 1.53 kW/cm(2) predicted for Yb: YAG. The maximal output power of 360 mW was obtained with a 2% output, which corresponds to a slope efficiency up to 19%.

Preparation and spectroscopic properties of Er3+-doped high silica glass fabricated by sintering nanoporous glass

A compact nonporous high silica (SiO2 % > 96%) glass containing 3400 ppm Er3+ ions, which was about ten times higher than that in Er-doped silica fiber amplifier (EDSFA), was synthesized by sintering porous glass immersed into erbium nitrate solution. The 1532 nm fluorescence has a FWHM (Full Width at Half Maximum) of 45 nm wider than that of EDSFA and possesses the glass with potential application in broadband fiber amplifiers. The Judd-Ofelt theoretical analysis reflects that Er3+ ions are located in a higher covalent environment which are comparable to those of aluminosilicate glass. (c) 2005 Elsevier B.V. All rights reserved.

Spectroscopic properties of Nd3+-doped high silica glass prepared by sintering porous glass

A new kind of Nd3+, -doped high silica glass (SiO2 > 96% (mass fraction)) was obtained by sintering porous glass impregnated with Nd3+, ions. The absorption and luminescence properties of high silica glass doped with different Nd3+, concentrations were studied. The intensity parameters Omega(t) (t = 2, 4, 6), spontaneous emission probability, fluorescence lifetime, radiative quantum efficiency, fluorescence branching ratio, and stimulated emission cross section were calculated using the Judd-Ofelt theory. The optimal Nd3+ concentration in high silica glass was 0.27% (mole fraction) because of its high quantum efficiency and emission intensity. By comparing the spectroscopic parameters with other Nd3+ doped oxide glasses and commercial silicate glasses, the Nd3+-doped high silica glasses are likely to be a promising material used for high power and high repetition rate lasers.

High quantum efficiency and high concentration erbium-doped silica glasses fabricated by sintering nanoporous glasses

A new method was used to prepare erbium-doped high silica (SiO2% > 96%) glasses by sintering nanoporous glasses. The concentration of erbium ions in high silica glasses can be considerably more than that in silica glasses prepared by using conventional methods. The fluorescence of 1532 nm has an FWHM (Full Wave at Half Maximum) of 50 nm, wider than 35 nm of EDSFA (erbium-doped silica fiber amplifer), and hence the glass possesses potential application in broadband fiber amplifiers. The Judd-Ofelt theoretical analysis reflects that the quantum efficiency of this erbium-doped glass is about 0.78, although the erbium concentration in this glass (6 x 103) is about twenty times higher than that in silica glass. These excellent characteristics of Er-doped high silica glass will be conducive to its usage in optical amplifiers and microchip lasers.

Precipitation of Ge nanoparticles from GeO2 glasses in transmission electron microscope

We show, using spatially resolved energy loss spectroscopy in a transmission electron microscopy (TEM), that GeO2 and GeO2-SiO2 glasses are extremely sensitive to high energy electrons. Ge nanoparticles can be precipitated in GeO2 glasses efficiently by the high-energy electron beam of a TEM. This is relevant to TEM characterization of luminescent Ge nanoparticles in silicate glasses, which may produce artificial results. (C) 2005 American Institute of Physics.

飞秒脉冲激光器中色散补偿膜的设计

阐述了用光学薄膜进行色散补偿的基本原理，介绍了设计的基本过程．根据Ti：Sapphire飞秒激光器中腔内色散补偿的要求，设定了色散补偿目标，通过计算机优化，得到了一种40层的Ta2O5／SiO2介质膜系．该膜系能在720～870am范围获得大于99．5％的反射率，在510～550nm获得大于90％的透射率，在740～850nm提供较平滑的-40fs^2的群延迟色散．这样的结果经过7次反射后，可以补偿5-mm Ti：sapphire晶体产生的绝大部分群延迟色散。

Laser-induced damage morphology of high-reflective optical coatings

Two different kinds of 1064 nm high-reflective (HR) coatings, with and without SiO2 protective layer, were prepared by electron beam evaporation. Three-dimensional damage morphology, caused by a Nd:YAG pulsed laser, was investigated for these HR coatings. Development of laser-induced damage on HR coatings was revealed by both temperature field calculation and discrete meso-element simulation. Theoretical results met experimental very well. (C) 2004 Elsevier B.V. All rights reserved.

Optimization of near-field optical field of multi-layer dielectric gratings for pulse compressor

Multi-layer dielectric (MLD) gratings for pulse compressors in high-energy laser systems should provide high diffraction efficiency as well as high laser induced damage thresholds (LIDT). Nonuniform optical near-field distribution is one of the important factors to limit their damage resistant capabilities. Electric field distributions in the gratings and multi-layer film region are analyzed by using Fourier modal method. Optimization of peak electric field in the gratings ridge is performed with a merit function, including both diffraction efficiency and electric field enhancement when the top layer material is HfO2 and SiO2, respectively. A set of optimized gratings parameters is obtained for each structure, which reduce the peak electric field within the gratings ridge to being respective 1.39 and 1.84 times the value of incident light respectively. Finally, we also discuss the effects of gratings refractive index, gratings sidewall angle and incident angle on peak electric field in the gratings ridge. (c) 2006 Elsevier B.V. All rights reserved.

Overcoat dependence of laser-induced damage threshold of 355 nm HR coatings

A series of HR coatings, with and without overcoat, were prepared by electron beam evaporation using the same deposition process. The laser-induced damage threshold (LIDT) was measured by a 355 nm Nd:YAG laser with a pulse width of 8 ns. Damage morphologies of samples were observed by Leica-DMRXE Microscope. The stress was measured by viewing the substrate deformation before and after coatings deposition using an optical interferometer. Reflectance of the samples was measured by Lambda 900 Spectrometer. The theoretical results of electric field distributions of the samples were calculate by thin film design software (TFCalc). It was found that SiO2 overcoat had improved the LIDT greatly, while MgF2 overcoat had little effect on the LIDT because of its high stress in the HR coatings. The damage morphologies were different among HR coatings with and without overcoats. (c) 2005 Elsevier B.V. All rights reserved.

多层介质膜脉冲压缩光栅近场光学特性分析

利用傅里叶模式理论分析了TE波自准直角入射的使用条件下，多层介质膜光栅的光栅区和多层膜区电场分布的特点．分别讨论了HfO2和SiO2为顶层光栅材料时，光栅结构参数对光栅脊峰值电场的影响，结果表明，对于不同膜厚的顶层材料，存在一个最佳膜厚度，使光栅脊峰值电场最小，并且当膜厚增大时，设计大高宽比的光栅可以降低该电场峰值．最后，在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场．

多层介质膜脉宽压缩光栅的严格矢量分析

用于展宽和压缩激光脉冲的多层膜脉宽压缩光栅是由多层介质高反膜和位于其顶层的浮雕光栅构成。以设计的高反射多层膜为基础，利用傅里叶模式理论分析了其衍射场分布，给出了TE波自准直角入射的使用条件下，多层介质膜脉宽压缩光栅衍射效率的表达式。以-1级衍射效率为评价函数，分别讨论了HfO2和SiO2为顶层材料时，多层膜脉宽压缩光栅-1级衍射效率高于0．95的光栅结构参量范围。结果表明，在该条件下，选择HfO2为顶层材料时，光栅结构参量有较大的取值范围。给出了优化的光栅结构参量，并分析了光栅制作误差及其使用条件的宽容度