Fast numerical methods for mixed, singular Helmholtz boundary value problems and Laplace eigenvalue problems - with applications to antenna design, sloshing, electromagnetic scattering and spectral geometry

This thesis presents a novel class of algorithms for the solution of scattering and eigenvalue problems on general two-dimensional domains under a variety of boundary conditions, including non-smooth domains and certain "Zaremba" boundary conditions - for which Dirichlet and Neumann conditions are specified on various portions of the domain boundary. The theoretical basis of the methods for the Zaremba problems on smooth domains concern detailed information, which is put forth for the first time in this thesis, about the singularity structure of solutions of the Laplace operator under boundary conditions of Zaremba type. The new methods, which are based on use of Green functions and integral equations, incorporate a number of algorithmic innovations, including a fast and robust eigenvalue-search algorithm, use of the Fourier Continuation method for regularization of all smooth-domain Zaremba singularities, and newly derived quadrature rules which give rise to high-order convergence even around singular points for the Zaremba problem. The resulting algorithms enjoy high-order convergence, and they can tackle a variety of elliptic problems under general boundary conditions, including, for example, eigenvalue problems, scattering problems, and, in particular, eigenfunction expansion for time-domain problems in non-separable physical domains with mixed boundary conditions.

Formal methods in the foundations of science

The intent of this study is to provide formal apparatus which facilitates the investigation of problems in the methodology of science. The introduction contains several examples of such problems and motivates the subsequent formalism.

A general definition of a formal language is presented, and this definition is used to characterize an individual’s view of the world around him. A notion of empirical observation is developed which is independent of language. The interplay of formal language and observation is taken as the central theme. The process of science is conceived as the finding of that formal language that best expresses the available experimental evidence.

To characterize the manner in which a formal language imposes structure on its universe of discourse, the fundamental concepts of elements and states of a formal language are introduced. Using these, the notion of a basis for a formal language is developed as a collection of minimal states distinguishable within the language. The relation of these concepts to those of model theory is discussed.

An a priori probability defined on sets of observations is postulated as a reflection of an individual’s ontology. This probability, in conjunction with a formal language and a basis for that language, induces a subjective probability describing an individual’s conceptual view of admissible configurations of the universe. As a function of this subjective probability, and consequently of language, a measure of the informativeness of empirical observations is introduced and is shown to be intuitively plausible – particularly in the case of scientific experimentation.

The developed formalism is then systematically applied to the general problems presented in the introduction. The relationship of scientific theories to empirical observations is discussed and the need for certain tacit, unstatable knowledge is shown to be necessary to fully comprehend the meaning of realistic theories. The idea that many common concepts can be specified only by drawing on knowledge obtained from an infinite number of observations is presented, and the problems of reductionism are examined in this context.

A definition of when one formal language can be considered to be more expressive than another is presented, and the change in the informativeness of an observation as language changes is investigated. In this regard it is shown that the information inherent in an observation may decrease for a more expressive language.

The general problem of induction and its relation to the scientific method are discussed. Two hypotheses concerning an individual’s selection of an optimal language for a particular domain of discourse are presented and specific examples from the introduction are examined.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

Methods for removal of spurious reflection effect on phase-shifting interferometry

Spurious reflection is one of the troublesome problems in phase-shifting interferometry. This paper deals with the problem on the basis of a two-run-times-two-frame phase-shift algorithm, in which the phase shifts are shared out between the reference beam and the object beam. The effect of spurious reflection on phase measurement is investigated; two simple methods for removal of the effect are presented and each needs only six interferograms. Two other solutions to the spurious reflection problem are also reviewed. The simulation results obtained using these four solutions are compared. The influence of a mix of phase-shifter miscalibration and spurious reflection on phase measurement is also discussed.

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system. (C) 2006 Society of Photo-Optical Instrumentation Engineers.

A novel method to measure coma aberration of projection system

A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method. (c) 2006 Elsevier GmbH. All rights reserved.