Temperature fields of 355 nm HR coatings based on the interface absorption model

Temperature fields of 355 nm high-reflectance (HR) coatings were investigated based on the interface absorption model. It was found that the highest temperature in the HR coatings increased with an increase in the extinction coefficient of the interface A, B, C, Al2O3 and MgF2. The highest temperature of HR coatings that can be reached increased quickly with the increase in the extinction coefficient of interface A in particular. The temperature rises of 355 nm HR coatings at different layers and different deposition temperatures were investigated based on experiments also. The damage mechanism of 355 nm HR coatings was confirmed with temperature fields and the interface absorption model.

三种不同后处理方式对ZrO_2薄膜性能的影响

采用有氧热处理、激光预处理和离子后处理三种方式对电子束蒸发(EBE)制备的单层ZrO_2薄膜进行了后处理,并分别对样品的光学性能和抗激光损伤阈值(LIDT)特性进行了研究。实验结果表明,热处理方式可以有效排除膜层内吸附的水气,弥补薄膜制备过程中的氧损失,使得光谱短移、吸收减小、损伤阈值增高;激光预处理过程可以在一定程度上减少缺陷、提高损伤阈值,但对膜层的光谱和吸收情况没有明显的改善作用;而离子后处理能够提高膜层的堆积密度、减少缺陷、降低吸收从而提高损伤阈值。由于三种方式处理机制不同,在实际应用中应根据膜层的性能选择合适的处理方式。

Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors

TiO2 single layers and TiO2/SiO2 high reflectors (HR) are prepared by electron beam evaporation at different TiO2 deposition rates. It is found that the changes of properties of TiO2 films with the increase of rate, such as the increase of refractive index and extinction coefficient and the decrease of physical thickness, lead to the spectrum shift and reflectivity bandwidth broadening of HR together with the increase of absorption and decrease of laser-induced damage threshold. The damages are found of different morphologies: a shallow pit to a seriously delaminated and deep crater, and the different amorphous-to-anatase-to-rutile phase transition processes detected by Raman study. The frequency shift of Raman vibration mode correlates with the strain in. film. Energy dispersive X-ray analysis reveals that impurities and non-stoichiometric defects are two absorption initiations resulting to the laser-induced transformation. (C) 2008 Elsevier B. V. All rights reserved.

Uso das técnicas de microbalança de cristal de quartzo e espectroscopia fotoacústica para estudo e monitoramento do processo de fotocura de resinas odontológicas

As resinas fotocuradas são amplamente utilizadas em odontologia. Este processo de cura é assistido pela luz visível que promove ligações químicas que as endurecem. Nesta dissertação, as resinas odontológicas fotocuradas comerciais das marcas Opallis Flow A1, A2, AO 3,5, T, Opallis DA2, Natural Flow e Ebecryl 3720-TP25 foram caracterizadas empregando as técnicas de microbalança de cristal de quartzo (QCM) e espectroscopia fotoacústica (PAS) à temperatura ambiente. A espectroscopia fotoacústica foi utilizada para avaliar a região do espectro eletromagnético responsável pela fotocura das resinas odontológicas. Desta forma, conhecendo-se o comprimento de onda da absorção da resina, possibilitou realizar o processo de fotocura. Adicionalmente, foi possível monitorar o processo de fotocura com a técnica de microbalança. A frequência de ressonância do cristal da microbalança se modifica com a fotocura das resinas estudadas. Deste modo, foi possível estimar por QCM, o tempo de cura para os comprimentos de ondas caracterizados por PAS.