999 resultados para Rhodes grass scale


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The HMAX model has recently been proposed by Riesenhuber & Poggio as a hierarchical model of position- and size-invariant object recognition in visual cortex. It has also turned out to model successfully a number of other properties of the ventral visual stream (the visual pathway thought to be crucial for object recognition in cortex), and particularly of (view-tuned) neurons in macaque inferotemporal cortex, the brain area at the top of the ventral stream. The original modeling study only used ``paperclip'' stimuli, as in the corresponding physiology experiment, and did not explore systematically how model units' invariance properties depended on model parameters. In this study, we aimed at a deeper understanding of the inner workings of HMAX and its performance for various parameter settings and ``natural'' stimulus classes. We examined HMAX responses for different stimulus sizes and positions systematically and found a dependence of model units' responses on stimulus position for which a quantitative description is offered. Interestingly, we find that scale invariance properties of hierarchical neural models are not independent of stimulus class, as opposed to translation invariance, even though both are affine transformations within the image plane.

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The present success in the manufacture of multi-layer interconnects in ultra-large-scale integration is largely due to the acceptable planarization capabilities of the chemical-mechanical polishing (CMP) process. In the past decade, copper has emerged as the preferred interconnect material. The greatest challenge in Cu CMP at present is the control of wafer surface non-uniformity at various scales. As the size of a wafer has increased to 300 mm, the wafer-level non-uniformity has assumed critical importance. Moreover, the pattern geometry in each die has become quite complex due to a wide range of feature sizes and multi-level structures. Therefore, it is important to develop a non-uniformity model that integrates wafer-, die- and feature-level variations into a unified, multi-scale dielectric erosion and Cu dishing model. In this paper, a systematic way of characterizing and modeling dishing in the single-step Cu CMP process is presented. The possible causes of dishing at each scale are identified in terms of several geometric and process parameters. The feature-scale pressure calculation based on the step-height at each polishing stage is introduced. The dishing model is based on pad elastic deformation and the evolving pattern geometry, and is integrated with the wafer- and die-level variations. Experimental and analytical means of determining the model parameters are outlined and the model is validated by polishing experiments on patterned wafers. Finally, practical approaches for minimizing Cu dishing are suggested.

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The present success in the manufacture of multi-layer interconnects in ultra-large-scale integration is largely due to the acceptable planarization capabilities of the chemical-mechanical polishing (CMP) process. In the past decade, copper has emerged as the preferred interconnect material. The greatest challenge in Cu CMP at present is the control of wafer surface non-uniformity at various scales. As the size of a wafer has increased to 300 mm, the wafer-level non-uniformity has assumed critical importance. Moreover, the pattern geometry in each die has become quite complex due to a wide range of feature sizes and multi-level structures. Therefore, it is important to develop a non-uniformity model that integrates wafer-, die- and feature-level variations into a unified, multi-scale dielectric erosion and Cu dishing model. In this paper, a systematic way of characterizing and modeling dishing in the single-step Cu CMP process is presented. The possible causes of dishing at each scale are identified in terms of several geometric and process parameters. The feature-scale pressure calculation based on the step-height at each polishing stage is introduced. The dishing model is based on pad elastic deformation and the evolving pattern geometry, and is integrated with the wafer- and die-level variations. Experimental and analytical means of determining the model parameters are outlined and the model is validated by polishing experiments on patterned wafers. Finally, practical approaches for minimizing Cu dishing are suggested.

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Resumen tomado de la publicación

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Embrio and Wuiw, two web interfaces for WPS

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La tecnología LiDAR (Light Detection and Ranging), basada en el escaneado del territorio por un telémetro láser aerotransportado, permite la construcción de Modelos Digitales de Superficie (DSM) mediante una simple interpolación, así como de Modelos Digitales del Terreno (DTM) mediante la identificación y eliminación de los objetos existentes en el terreno (edificios, puentes o árboles). El Laboratorio de Geomática del Politécnico de Milán – Campus de Como- desarrolló un algoritmo de filtrado de datos LiDAR basado en la interpolación con splines bilineares y bicúbicas con una regularización de Tychonov en una aproximación de mínimos cuadrados. Sin embargo, en muchos casos son todavía necesarios modelos más refinados y complejos en los cuales se hace obligatorio la diferenciación entre edificios y vegetación. Este puede ser el caso de algunos modelos de prevención de riesgos hidrológicos, donde la vegetación no es necesaria; o la modelización tridimensional de centros urbanos, donde la vegetación es factor problemático. (...)

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In the last years, the use of every type of Digital Elevation Models has iimproved. The LiDAR (Light Detection and Ranging) technology, based on the scansion of the territory b airborne laser telemeters, allows the construction of digital Surface Models (DSM), in an easy way by a simple data interpolation

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It is possible to obtain habitat suitability maps using several applications like "Biomapper" v. 3.1.5 (http://www2.unil.ch/biomapper) or the "adehabitat" library v. 1.2.1, developed to be used within R program (http//www.R-project.org)

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In this presentation, we would like to focus on GRASS GIS (version 5.x and latest 6.x), one of the oldest GIS developped by the Open-Source Community. Our goal is trying to make it accessible to any GIS user by explaining its main concepts

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Resumen tomado de la publicación

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Se presenta un programa desarrollado mediante GRASS 6.2 que permite calcular el tiempo de concentración en cuencas hidrográficas a partir del modelo digital de elevaciones. El hecho de que no haya ningún comando específico en GRASS que permita calcular el tiempo de concentración nos ha llevado a calcular éste a partir de aquellos comandos que aportan información hidrográfica, utilizando básicamente r.watershed. Además, se analizan los comandos GRASS que dan las direcciones de flujo, sus semejanzas, discrepancias y utilidades. Finalmente, se comparan los resultados obtenidos aplicando diferentes valores a la técnica de adaptación del modelo digital de elevaciones a partir de la información vectorial de la red hidrográfica existente

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Se presenta la implementación del modelo hidrológico distribuido de Témez sobre GRASS GIS. Este modelo se utiliza para la evaluación de recursos hídricos en régimen natural con paso mensual y para la totalidad del territorio español, tal como aparece en el Libro Blanco del Agua en España. A partir de las variables de entrada, precipitación y evapotranspiración potencial y los parámetros hidrológicos, el modelo obtiene los mapas de los distintos almacenamientos, humedad en el suelo y volumen de acuífero, y de las variables de salida del ciclo hidrológico, evapotranspiración y escorrentía total, obtenida esta última como suma de la escorrentía superficial y subterránea. El objetivo final del trabajo es la implementación de los componentes superficiales y subterráneos en el modelo hidrológico, desarrollando para ello un programa que hace funcional en GRASS GIS el modelo matemático en que se basa la evaluación de recursos hídricos

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Resumen tomado de la publicaci??n. Resumen tambi??n en ingl??s