1000 resultados para Etching, English
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This paper investigates certain methods of training adopted in the Statistical Machine Translator (SMT) from English to Malayalam. In English Malayalam SMT, the word to word translation is determined by training the parallel corpus. Our primary goal is to improve the alignment model by reducing the number of possible alignments of all sentence pairs present in the bilingual corpus. Incorporating morphological information into the parallel corpus with the help of the parts of speech tagger has brought around better training results with improved accuracy
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A methodology for translating text from English into the Dravidian language, Malayalam using statistical models is discussed in this paper. The translator utilizes a monolingual Malayalam corpus and a bilingual English/Malayalam corpus in the training phase and generates automatically the Malayalam translation of an unseen English sentence. Various techniques to improve the alignment model by incorporating the morphological inputs into the bilingual corpus are discussed. Removing the insignificant alignments from the sentence pairs by this approach has ensured better training results. Pre-processing techniques like suffix separation from the Malayalam corpus and stop word elimination from the bilingual corpus also proved to be effective in producing better alignments. Difficulties in translation process that arise due to the structural difference between the English Malayalam pair is resolved in the decoding phase by applying the order conversion rules. The handcrafted rules designed for the suffix separation process which can be used as a guideline in implementing suffix separation in Malayalam language are also presented in this paper. Experiments conducted on a sample corpus have generated reasonably good Malayalam translations and the results are verified with F measure, BLEU and WER evaluation metrics
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In Statistical Machine Translation from English to Malayalam, an unseen English sentence is translated into its equivalent Malayalam sentence using statistical models. A parallel corpus of English-Malayalam is used in the training phase. Word to word alignments has to be set among the sentence pairs of the source and target language before subjecting them for training. This paper deals with certain techniques which can be adopted for improving the alignment model of SMT. Methods to incorporate the parts of speech information into the bilingual corpus has resulted in eliminating many of the insignificant alignments. Also identifying the name entities and cognates present in the sentence pairs has proved to be advantageous while setting up the alignments. Presence of Malayalam words with predictable translations has also contributed in reducing the insignificant alignments. Moreover, reduction of the unwanted alignments has brought in better training results. Experiments conducted on a sample corpus have generated reasonably good Malayalam translations and the results are verified with F measure, BLEU and WER evaluation metrics.
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In Statistical Machine Translation from English to Malayalam, an unseen English sentence is translated into its equivalent Malayalam translation using statistical models like translation model, language model and a decoder. A parallel corpus of English-Malayalam is used in the training phase. Word to word alignments has to be set up among the sentence pairs of the source and target language before subjecting them for training. This paper is deals with the techniques which can be adopted for improving the alignment model of SMT. Incorporating the parts of speech information into the bilingual corpus has eliminated many of the insignificant alignments. Also identifying the name entities and cognates present in the sentence pairs has proved to be advantageous while setting up the alignments. Moreover, reduction of the unwanted alignments has brought in better training results. Experiments conducted on a sample corpus have generated reasonably good Malayalam translations and the results are verified with F measure, BLEU and WER evaluation metrics
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HINDI
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The rise of the English novel needs rethinking after it has been confined to the "formal realism" of Defoe, Richardson, and Fielding (Watt, 1957), to "antecedents, forerunners" (Schlauch, 1968; Klein, 1970) or to mere "prose fiction" (McKillop, 1951; Davis, Richetti, 1969; Fish, 1971; Salzman, 1985; Kroll, 1998). My paper updates a book by Jusserand under the same title (1890) by proving that the social and moral history of the long prose genre admits no strict separation of "novel" and "romance", as both concepts are intertwined in most fiction (Cuddon, Preston, 1999; Mayer, 2000). The rise of the novel, seen in its European context, mainly in France and Spain (Kirsch, 1986), and equally in England, was due to the melting of the nobility and high bourgeoisie into a "meritocracy", or to its failure, to become the new bearer of the national culture, around 1600. (Brink, 1998). My paper will concentrate on Euphues (1578), a negative romance, Euphues and His England (1580), a novel of manners, both by Lyly; Arcadia (1590-93) by Sidney, a political roman à clef in the disguise of a Greek pastoral romance; The Unfortunate Traveller (1594) by Nashe, the first English picaresque novel, and on Jack of Newbury (1596-97) by Deloney, the first English bourgeois novel. My analysis of the central values in these novels will prove a transition from the aristocratic cardinal virtues of WISDOM, JUSTICE, COURAGE, and HONOUR to the bourgeois values of CLEVERNESS, FAIR PLAY, INDUSTRY, and VIRGINITY. A similar change took place from the Christian virtues of LOVE, FAITH, HOPE to business values like SERVICE, TRUST, and OPTIMISM. Thus, the legacy of history proves that the main concepts of the novel of manners, of political romance, of picaresque and middle-class fiction were all developed in the time of Shakespeare.
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In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.
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The progress in microsystem technology or nano technology places extended requirements to the fabrication processes. The trend is moving towards structuring within the nanometer scale on the one hand, and towards fabrication of structures with high aspect ratio (ratio of vertical vs. lateral dimensions) and large depths in the 100 µm scale on the other hand. Current procedures for the microstructuring of silicon are wet chemical etching and dry or plasma etching. A modern plasma etching technique for the structuring of silicon is the so-called "gas chopping" etching technique (also called "time-multiplexed etching"). In this etching technique, passivation cycles, which prevent lateral underetching of sidewalls, and etching cycles, which etch preferably in the vertical direction because of the sidewall passivation, are constantly alternated during the complete etching process. To do this, a CHF3/CH4 plasma, which generates CF monomeres is employed during the passivation cycle, and a SF6/Ar, which generates fluorine radicals and ions plasma is employed during the etching cycle. Depending on the requirements on the etched profile, the durations of the individual passivation and etching cycles are in the range of a few seconds up to several minutes. The profiles achieved with this etching process crucially depend on the flow of reactants, i.e. CF monomeres during the passivation cycle, and ions and fluorine radicals during the etching cycle, to the bottom of the profile, especially for profiles with high aspect ratio. With regard to the predictability of the etching processes, knowledge of the fundamental effects taking place during a gas chopping etching process, and their impact onto the resulting profile is required. For this purpose in the context of this work, a model for the description of the profile evolution of such etching processes is proposed, which considers the reactions (etching or deposition) at the sample surface on a phenomenological basis. Furthermore, the reactant transport inside the etching trench is modelled, based on angular distribution functions and on absorption probabilities at the sidewalls and bottom of the trench. A comparison of the simulated profiles with corresponding experimental profiles reveals that the proposed model reproduces the experimental profiles, if the angular distribution functions and absorption probabilities employed in the model is in agreement with data found in the literature. Therefor the model developed in the context of this work is an adequate description of the effects taking place during a gas chopping plasma etching process.
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Cuaderno de trabajo dirigido a alumnos de Ense??anza Primaria que puede ser utilizado como material de apoyo y complementario. Se presenta un total de 22 unidades organizadas en dos partes: la primera presenta la canci??n o rima y la segunda una partitura con la melod??a. Se incluye un cap??tulo dedicado a la autoevaluaci??n con un total de 100 preguntas y otro dedicado al vocabulario. Se complementa este trabajo con un CD cuyo objetivo es combinar el aprendizaje y la pr??ctica del idioma ingl??s con el uso de las nuevas tecnolog??as.
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Materiales didácticos (guías didácticas y manuales para profesores) del proyecto titulado 'Find out in English' que aúna varios objetivos a través de la utilización de diferentes disciplinas que convergen para lograr un mejor conocimiento del patrimonio histórico-artístico regional, mediante la utilización, como vehículo, de una lengua extranjera. La explotación didáctica de los materiales se realiza en tres fases. La primera que se basa en el tratamiento en el aula de los contenidos y procedimientos, la segunda, que consiste en la visita a diversos museos de la región en los que se asiste a una dramatización en lengua inglesa que supone un acercamiento histórico a los fondos de los museos visitados y la tercera que pretende consolidar los conocimientos adquiridos en las dos anteriores mediante actividades y juegos diversos. Los museos son el Medina Siyasa (Cieza - Murcia) y el Salzillo (Murcia).
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In this report, we investigate the relationship between the semantic and syntactic properties of verbs. Our work is based on the English Verb Classes and Alternations of (Levin, 1993). We explore how these classes are manifested in other languages, in particular, in Bangla, German, and Korean. Our report includes a survey and classification of several hundred verbs from these languages into the cross-linguistic equivalents of Levin's classes. We also explore ways in which our findings may be used to enhance WordNet in two ways: making the English syntactic information of WordNet more fine-grained, and making WordNet multilingual.
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Nanoporous GaN films are prepared by UV assisted electrochemical etching using HF solution as an electrolyte. To assess the optical quality and morphology of these nanoporous films, micro-photoluminescence (PL), micro-Raman scattering, scanning electron microscopy (SEM), and atomic force microscopy (AFM) techniques have been employed. SEM and AFM measurements revealed an average pore size of about 85-90 nm with a transverse dimension of 70-75 nm. As compared to the as-grown GaN film, the porous layer exhibits a substantial photoluminescence intensity enhancement with a partial relaxation of compressive stress. Such a stress relaxation is further confirmed by the red shifted E₂(TO) phonon peak in the Raman spectrum of porous GaN.
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El CEIP Manuel Pérez de Bollullos Par del Condado (Huelva) ha recibido el Primer Premio de Páginas Web Educativas de la Junta de Andalucía, y ha sido galardonado con la Medalla de Oro al Mérito Educativo
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