Determination of the tilt and twist angles of curved GaN layers by high-resolution x-ray diffraction

The full-width at half-maximum (FWHM) of an x-ray rocking curve (XRC) has been used as a parameter to determine the tilt and twist angles of GaN layers. Nevertheless, when the thickness of GaN epilayer reaches several microns, the peak broadening due to curvature becomes non-negligible. In this paper, using the (0 0 l), l = 2, 4, 6, XRC to minimize the effects of wafer curvature was studied systematically. Also the method to determine the tilt angle of a curved GaN layer was proposed while the Williamson-Hall plot was unsuitable. It was found that the (0 0 6) XRC-FWHM had a significant advantage for high-quality GaN layers with the radius curvature of r less than 3.5 m. Furthermore, an extrapolating method of gaining a reliable tilt angle has also been proposed, with which the calculated error can be improved by 10% for r < 2 m crystals compared with the (0 0 6) XRC-FWHM. In skew geometry, we have demonstrated that the twist angles deriving from the (2 0 4) XRC-FWHM are in accord with those from the grazing incidence in-plane diffraction (IP-GID) method for significantly curved samples.

Effects of annealing ambient on the formation of compensation defects in InP

Positron annihilation lifetime (PAL) and photoinduced current transient spectroscopies (PICTS) have been employed to study the formation of compensation defects in undoped InP under different annealing processes with pure phosphorus (PP) ambience and iron phosphide (IP) ambience, respectively. The different annealing ambiences convert the as-grown n-type undoped InP into two types of semi-insulating (SI) states. The positron average lifetimes of as-grown InP, PP SI-InP, and IP SI-InP are found to be 246, 251, and 243 ps, respectively, which are all longer than the bulk lifetime of 240 ps, indicating the existence of vacancy-type positron-trapping defects. For as-grown InP, VInH4 complexes are the dominant defects. They dissociate into VInHn(0less than or equal tonless than or equal to3) acceptor vacancies under PP ambience annealing, compensating the residual shallow donors and turning the material semi-insulating. In forming IP SI-InP, diffusion of iron into V-In complexes under IP ambience annealing produces the substitutional compensation defect Fe-In, causing a shorter positron average lifetime. The PICTS measurements show that a group of vacancy-type defects has been suppressed by iron diffusion during the annealing process, which is in good agreement with the PAL results. (C) 2003 American Institute of Physics.

Deep levels in semi-insulating InP obtained by annealing under iron phosphide ambiance

Deep levels in semi-insulating (SI) InP obtained by annealing in iron phosphide (IP) ambiance have been characterized by optical transient current spectroscopy (OTCS). Compared with the OTCS result of the SI InP prepared by annealing in pure phosphorus (PP) ambiance, the IP SI InP presents only two traps with activation energies of 0.20 and 0.63 eV, respectively. The results suggest that the diffusion of Fe-atoms suppresses the formation of a few defects in the IP SI InP. The nature of deep levels in the IP and PP SI InP has been discussed on the basis of these results. The relation between material property and defects in those SI InP has also been revealed. (C) 2002 American Institute of Physics.

Fe-diffusion-induced defects in InP annealed in iron phosphide ambient

Photoluminescence (PL) and photo induced current transient spectroscopy (PICTS) have been used to study deep levels in semi-insulating (SI) InP prepared by annealing undoped InP in pure phosphorus (PP) and iron phosphide (IP) ambient. Defects are much fewer in IP SI-InP than in PP SI-InP. Deep-level-related PL emission could only be detected in IP SI-InP. The results indicate that Fe diffusion inhibits the thermal formation of a number of defects in annealed InP. A complex defect has been formed in the annealing process in the presence of Fe.

Characterization of defects and whole wafer uniformity of annealed undoped semi-insulating InP wafers

Semi-insulating (SI) InP wafers of 2 and 3 in. diameters have been prepared by annealing undoped LEC InP at 930 degreesC for 80 h under pure phosphorus ambient (PP) and iron phosphide ambient (IP). The electrical uniformity of annealed undoped SI wafers, along with a Fe-doped as-grown SI LEC InP wafer, has been characterized by whole wafer PL mapping and radial Hall measurements. Defects in these wafers have been detected by photo-induced current transient spectroscopy (PICTS). The results indicated that the uniformity of IP wafer is much better than that of PP wafer and as-grown Fe-doped Si InP wafer. There are fewer traps in undoped SI InP IP wafer than in as grown Fe-doped and undoped SI InP PP wafer, as evidenced by PICTS. The good uniformity of the IP wafer is related to the nonexistence of high concentration of thermally induced defects. The mechanism for this phenomenon is discussed based on the results. (C) 2002 Elsevier Science B.V. All rights reserved.

Quantum-well anisotropic forbidden transitions induced by a common-atom interface potential

A prominent effect of the interface potential (IP) [E. L. Ivchenko and A. Yu. Kaminski, Phys. Rev. B 54, 5852 (1996); O. Krebs and P. Voisin, Phys. Rev. Lett. 77, 1829 (1996)], the optical anisotropy of the forbidden transitions in quantum wells has been observed by reflectance-difference spectroscopy. Predictions by the heavy-light-hole coupling IP models are qualitatively consistent with all the observed features of the forbidden and the allowed transitions. The fact that the predicted value of the relative, transition strength, which depends on neither the IP strength nor the electric field, disagrees with the observed one indicates that coupling involving X and/or L bands may also be important. [S0163-1829(99)04227-7].

社区宽带综合业务网服务质量保证的研究

社区宽带综合业务网络系统使用交换式以太网技术，在一个物理网络上为社区用户提供Internet接入、数字电视、IP电话等服务，对三网融合进行了实践性探讨。提出并实现了一套保证系统服务质量的方法，并在测试中取得了满意的效果。

三层交换机中DHCP中继代理的改进与实现

社区宽带综合业务网络系统使用交换式以太网技术。为社区用户提供Intemet接入、电视、IP电话等服务。根据系统的实际需求，提出了一种改进的DHCP中继代理机制，并将该机制在系统的核心三层交换机SW1200的驱动程序中实现。

一种多业务以太网接入交换机的关键技术

宽带社区接入网是下一代网络研究的主要领域之一.RBISN(社区宽带综合业务网络系统)研究使用交换式以太网提供数字电视、IP电话和Internet接入服务.需要解决用户隔离、组播、服务质量的问题.本文介绍了这一系统中交换机采用的关键技术.

交换机和路由器一体化的设计与实现

宽带社区接入网是下一代网络研究的主要领域之一.RBISN(社区宽带综合业务网络)研究使用交换式以太网提供电视、IP电话和Internet接入服务,边缘路由设备必不可少.该文分析了该环境下的通信量,在对可用的方案进行对比的基础上,提出了将智能二层VLAN交换机和VLAN路由器一体化的方案.随后给出其模型和设计,加以实现以证明其可行性.

基于路由器编码的自适应包标记

拒绝服务攻击由于其高发性、大危害、难防范而成为因特网上的一大难题.研究人员为此提出了各种各样的对策,其中概率包标记具有较大的潜力.然而,现有的标记方案都存在各种各样的缺点.提出了一个新的标记方案,与其他标记方法相比,该方案具有反映灵敏,误报率低和计算量小的优点.此外,该方法还限制了攻击者伪造追踪信息的能力.

一种开放源代码的网络仿真器的原理与实现

随着互联网的飞速发展,网络拥塞已经成为一个十分重要的问题,网络仿真是一种检测拥塞控制算法有效性的常用方法.该文给出了一种开放源代码的网络仿真器NS2(Network Simulator V2)的原理与实现.首先比较了四种不同仿真器的优缺点,然后详细描述了NS2的模块组成、工作环境、主代码结构以及扩展方法等,最后用RED(Random EarlyDetection)队列调度和移动IP数据传输两个典型实例说明了NS2的应用价值.