Construção e caracterização de um sistema de desbastamento iônico

Este trabalho trata do desenvolvimento de um equipamento de desbastamento iônico aplicado ao afinamento de amostras para análise com a técnica de microscopia eletrônica de transmissão (MET). A técnica de MET é uma das mais importantes para a caracterização da microestrutura de praticamente todas as classes de materiais sólidos. Contudo, esta técnica requer amostras suficientemente finas (espessuras típicas da ordem de 100 nm) para que os elétrons transmitidos proporcionem informação relevante da microestrutura. Com exceção do sistema de vácuo, todos os demais componentes do equipamento (fonte de íons, câmara de vácuo, fonte de alta tensão e suporte mecânico das amostras) foram construídos na UFRGS. O equipamento foi testado através da preparação de amostras de silício. As amostras obtidas apresentam áreas de observação amplas e suficientemente finas permitindo uma caracterização microestrutural detalhada mesmo com feixes de elétrons acelerados com potencial de 120 kV. Além disso, os valores de taxa de desbaste em torno de 1,5 mm/h foram obtidos em amostras bombardeadas com íons de Ar+ acelerados com um potencial de 6 kV. Tais resultados mostram que o equipamento tem uma performance semelhante a um equipamento comercial A segunda contribuição do trabalho foi a de introduzir um estudo sistemático sobre a formação de camadas amorfas e a produção de átomos auto intersticiais dentro da região cristalina das amostras de silício. Trata-se de um assunto atual pois tais efeitos ainda não são bem conhecidos. Apesar do estudo ter sido realizado em um material específico (Si), os resultados obtidos podem ser aproveitados como modelo para outros materiais. A formação de camadas amorfas foi caracterizada em função dos parâmetros: ângulo de incidência e energia do feixe de íons de Ar+ e temperatura da amostra durante a irradiação. A produção e/ou injeção de átomos auto intersticiais na região cristalina foi estudada em função do ângulo de incidência e da energia do feixe de íons. Os resultados mostram que a espessura da camada amorfa cresce com o aumento da energia e do ângulo de incidência do feixe e com a diminuição da temperatura do alvo. A taxa de produção de átomos intersticiais dentro da região cristalina apresenta um máximo para ângulos em torno de 15° independentemente da energia do feixe de íons.

Transporte atômico e incorporação de oxigênio em filmes de HfSiO e HfSiON depositados sobre Si

Esse trabalho estuda a estabilidade térmica e o transporte atômico em filmes dielétricos de HfSiO e HfSiON depositados por sputtering reativo sobre c-Si. Esses materiais possuem alta constante dielétrica (high- ) e são candidatos a substituir o óxido de silício como dielétrico de porta em dispositivos do tipo transistor de efeito de campo metal-óxido-semicondutor (MOSFETs). Esses filmes foram submetidos a diferentes seqüências de tratamentos térmicos em atmosferas inerte e de O2, e foram caracterizados através de análises de feixe de íons e espectroscopia de fotoelétrons induzidos por raios-X (XPS). Nesse estudo foi observado que a incorporação de oxigênio se dá através da troca com N ou O previamente existente nos filmes. Em filmes de aproximadamente 50 nm de espessura foi observado que a presença do N limita a difusão de oxigênio de forma que a frente de incorporação avança em direção ao interior do filme com o aumento do tempo de tratamento, enquanto nos filmes de HfSiO/Si o oxigênio é incorporado ao longo de todo o filme, mesmo para o tempo mais curto de tratamento. Diferentemente de outros materiais high- estudados, não foi possível observar migração de Si do substrato em direção a superfície dos filmes de HfSiON/Si com aproximadamente 2,5 nm de espessura. Os resultados obtidos nesse trabalho mostram que filmes de HfSiON/Si são mais estáveis termicamente quando comparados com outros filmes dielétricos depositados sobre Si anteriormente estudados, mas antes que ele se torne o dielético de porta é ainda necessário que se controle a difusão de N em direção ao substrato como observado nesse trabalho.

Caracterização elétrica de estruturas metal/dielétrico high-k/Si

Foram estudadas as propriedades elétricas de estruturas MOS envolvendo materiais com Zr e Hf: Al/HfO2/Si, Al/HfAlO/Si, Al/ZrO2/Si e Al/ZrAlO/Si depositadas por JVD (Jet Vapor Deposition) submetidas a diferentes doses de implantação de nitrogênio e tratamentos térmicos; Au/HfO2/Si e Au/HfxSiyOz/Si preparadas por MOCVD (Metal-Organic Chemical Vapor Deposition) e Au/HfxSiyOz/SiO2/Si preparadas por sputtering reativo em O2 submetidas a tratamentos térmicos distintos. Para isso, além das medidas de C-V e I-V padrão, foi desenvolvido o método da condutância para estudo da densidade de estados na interface dielétrico/Si, o qual mostrou-se mais viável para as estruturas com dielétricos alternativos. A inclusão de Al na camada de dielétrico, bombardeamento por íons de nitrogênio, e tratamentos térmicos rápidos em atmosferas de O2 e N2 foram responsáveis por mudanças nas propriedades das amostras. Diversos mecanismos físicos que influenciam as propriedades elétricas dessas estruturas foram identificados e discutidos. Foi constatado que as interfaces com menores densidades de estados foram as das amostras preparadas por MOCVD e sputtering reativo.

Desenvolvimento de filtros cerâmicos impregnados com nanopartículas de prata para desinfecção de água potável

Brazil has vast amounts of hydric resources, whose quality has been deteriorating due to pollutant dumping. Household waste disposal is one of the main sources of water pollution, stimulating bacteria proliferation and introducing microorganisms, including those from fecal matter. Conventional water disinfection methods are a solution, but on the downside, they lead to the formation byproducts hazardous to human health. In this study, aiming to develop bactericidal filters for the disinfection of drinking water; silver nanoparticles were deposited on alumina foams through three routes: sputtering DC, dip coating and in situ chemical reduction of silver nitrate. The depositions were characterized through X-ray diffraction, scanning electron microscopy and EDS element mapping. The influence of the depositions on permeability and mechanical properties of the ceramic foams was assessed and, in sequence, a preliminary antibacterial efficiency analysis was carried out. Characterization results indicate that the chemical reduction routes were efficient in depositing homogeneously distributed silver particles and that the concentration of the metallic precursor salt affects size and morphology of the particles. The antibacterial efficiency analysis indicates that the chemical reduction filters have potential for water disinfection

Diagnóstico de plasma de cátodo oco: análise da ação de plasma de argônio e Ar-H2 para a deposição de filmes finos de titânio em pós-descarga

Plasma DC hollow cathode has been used for film deposition by sputtering with release of neutral atoms from the cathode. The DC Plasma Ar-H2 hollow cathode currently used in the industry has proven to be effective in cleaning surfaces and thin film deposition when compared to argon plasma. When we wish to avoid the effects of ion bombardment on the substrate discharge, it uses the post-discharge region. Were generated by discharge plasma of argon and hydrogen hollow cathode deposition of thin films of titanium on glass substrate. The optical emission spectroscopy was used for the post-discharge diagnosis. The films formed were analyzed by mechanical profilometry technique. It was observed that in the spectrum of the excitation lines of argon occurred species. There are variations in the rate of deposition of titanium on the glass substrate for different process parameters such as deposition time, distance and discharge working gases. It was noted an increase in intensity of the lines of argon compared with the lines of titanium. Deposition with argon and hydrogen in glass sample observed a higher rate deposition of titanium as more closer the sample was in the discharge

Implementação da técnica de difração de elétrons de baixa energia

The purpose of this study is to describe the implementation of the Low Energy Electron Diffaction (LEED) technique in the Laboratory of Magnetic Nanostructures and Semiconductors of the Department of Theoretical and Experimental Physics of the Universidade Federal do Rio Grande do Norte (UFRN), Natal, Brazil. During this work experimental apparatus were implemented for a complete LEED set-up. A new vacuum system was also set up. This was composed of a mechanical pump, turbomolecular pump and ionic pump for ultra-high vacuum and their respective pressure measurement sensors (Pirani gauge for low vacuum measures and the wide range gauge -WRG); ion cannon maintenance, which is basically mini-sputtering, whose function is sample cleaning; and set-up, maintenance and handling of the quadrupole mass spectrometer, whose main purpose is to investigate gas contamination inside the ultra-high vacuum chamber. It should be pointed out that the main contribution of this Master's thesis was the set-up of the sample heating system; that is, a new sample holder. In addition to the function of sample holder and heater, it was necessary to implement the function of sustaining the ultra-high vacuum environment. This set of actions is essential for the complete functioning of the LEED technique

Efeito Kerr magneto-óptico; Ressonância ferromagnética; Acoplamento bilinear; Acoplamento biquadrático

In this work, we investigated the magnetic properties of a monocrystalline Fe thin film and of Fe(80 Å)/Cr(t)/Fe(80 Å) tri-layers, with the nonmagnetic metallic Cr spacer layer thickness varying between 9 Å < t < 40 Å. The samples were deposited by the DC Sputtering on Magnesium Oxide (MgO) substrates, with (100) crystal orientation. For this investigation, experimental magneto-optical Kerr effect (MOKE) magnetometry and ferromagnetic resonance (FMR) techniques were employeed. In this case, these techniques allowed us to study the static and dynamical magnetization properties of our tri-layers. The experimental results were interpreted based on the phenomenological model that takes into account the relevant energy terms to the magnetic free energy to describe the system behavior. In the case of the monocrystalline Fe film, we performed an analytical discussion on the magnetization curves and developed a numerical simulation based on the Stoner-Wohlfarth model, that enables the numerical adjustment of the experimental magnetization curves and obtainment of the anisotropy field values. On the other hand, for the tri-layers, we analyzed the existence of bilinear and biquadratic couplings between the magnetizations of adjacent ferromagnetic layers from measurements of magnetization curves. With the FMR fields and line width angular dependencies, information on the anisotropy in three layers was obtained and the effects of different magnetic relaxation mechanisms were evidenced. It was also possible to observe the dependence of the epitaxy of the multilayers with growth and sputtering parameters. Additionally it was developed the technique of AC magnetic susceptibility in order to obtain further information during the investigation of magnetic thin films

Propriedades magnéticas quase-estáticas de filmes ferromagnéticos amorfos de FeCuNbSiB

Today, one of the topics that attracts interest of the scientific community is the understanding of magnetic properties of magnetic systems with reduced dimensions, in particular, ferromagnetic thin films. In this case, the comprehension and control of these properties, as well as the development of routes to obtain them, are crucial issues in many aspects of current and future technologies for storage and transmission of information in the electro-electronic industry. There are several materials that exhibit soft magnetic properties, and we highlight the amorphous alloys and that ones obtained by partial crystallization, so-called nanocrystalline materials. The production of these alloys as magnetic ribbons is very common in scientific and technological area, but there are just a few works related to the production of these alloys as thin films. In this work, we studied the quasi-static magnetic properties of ferromagnetic thin films based on FeCuNbSiB in a wide range of thicknesses, from 20 to 500 nm, produced by sputtering. In particular, after the structural characterization performed via X-ray diffraction, the magnetic properties of the sets of samples were investigated using experimental magnetization curve, obtained using a vibrating sample magnetometer, as well as through theoretical curves obtained by theoretical modeling and numerical computation. The modeling process is based on the Stoner Wohlfarth model applied to three dimensions, and adds some energy terms, using as reference experimental results of magnetization. In this case, from the comparison between theoretical and experimental results and the analysis of the constant anisotropy behavior as a function of film thickness, we aim to obtain further information on the magnetization process of the samples, to identify routes for the production of thin films and develop a theoretical to films to use it, in the future, in the obtainment of the theoretical curves of some magnetic measurements, such as magnetoimpedance and magnetoresistance

Montagem e construção de um magnetômetro a efeito Kerr magneto-óptico

n this master s dissertation a Kerr Magneto Optic s magnetometer effect was set up to do characterization of samples type films fine and ultra thin, these samples will be grown after the implementation of the sputtering technique at the magnetism laboratory of of this department. In this work a cooled electromagnet was also built the water and that it reaches close values to 10kOe with a gap of 22 mm including an area of uniform field of 25mm of diameter. The first chapter treats of the construction of this electromagnet from its dimensioning to the operation tests that involve measures of reached maximum field and temperature of the reels when operated during one hour. The second chapter is dedicated to the revision of the magnetism and the magnetization processes as well as it presents a theoretical base regarding the magnetic energies found in films and magnetic multilayer. In the sequence, the third chapter, is especially dedicated the description of the effects magneto opticians the effect kerr in the longitudinal, traverse and polar configurations, using for so much only the classic approach of the electromagnetism and the coefficients of Fresnel. Distinguished the two areas of observation of the effect regarding thickness of the film. The constructive aspects of the experimental apparatus as well as the details of its operation are explained at the room surrender, also presenting the preliminary results of the measures made in one serializes of permalloy films and concluding with the results of the characterization of the first films of iron and permalloy grown here at the theoretical and experimental physics department at UFRN

Disorder effects produced by the Mn and H incorporations on the optical absorption edge of Ga1-xMnxAs:H nanocrystalline films

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Corrosion behavior of Ti-6Al-4V alloy treated by plasma immersion ion implantation process

Ti-6Al-4V alloy is one of the most frequently used Ti alloys with diverse applications in aerospace and biomedical areas due to its favorable mechanical properties, corrosion resistance and biocompatibility. Meanwhile, its surface can stiffer intense corrosion caused by wear processes due to its poor tribological properties. Thus in the present study, PIII processing of Ti-6Al-4V alloy was carried out to evaluate its corrosion resistance in 3.5% NaCl solution. Two different sets of Ti-6Al-4V samples were PIII treated, varying the plasma gases and the treatment time. The corrosion behavior is correlated with the surface morphology, and the nitrogen content. SEM micrographs of the untreated sample reveal a typical two-phase structure. PIII processing promotes surface sputtering and the surface morphology is completely different for samples treated with N-2/H-2 mixture and N-2 only. The highest penetration of nitrogen (similar to 88 nm), corresponding to 33% of N-2 was obtained for the sample treated with N-2/H-2 mixture for 1:30 h. The corrosion behavior of the samples was investigated by a potentiodynamic polarization method. A large passive region of the polarization curves (similar to 1.5 V), associated with the formation of a protective film, was observed for all samples. The passive current density (similar to 3 x 10(-6) A cm(-2)) of the PIII-treated Ti-6Al-4V samples is about 10 times higher than for the untreated sample. This current value is still rather low and maintains good corrosion resistance. The anodic branches of the polarization curves for all treated Ti-6Al-4V samples demonstrate also that the oxide films break down at approximately 1.6 V, forming an active region. Although the sample treated by N-2/H-2 mixture for 1.30 It has thicker nitrogen enriched layer, better corrosion resistance is obtained for the PIII process performed with N, gas only. (c) 2007 Elsevier B.V. All rights reserved.

A Study of the Effect of Nitrogen and Air Plasma Immersion Ion Implantation Treatments on the Properties of Carbon Fiber

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Ability of different restorative materials to prevent in situ secondary caries: analysis by polarized light-microscopy and energy-dispersive X-ray

Secondary caries is the main cause of direct restoration replacement. The purpose of this study was to analyze enamel adjacent to different restorative materials after in situ cariogenic challenge using polarized-light microscopy (PLM), scanning electron microscopy (SEM) and energy-dispersive X-ray analysis (EDS). Twelve volunteers, with a low level of dental plaque, a low level of mutans streptococci, and normal salivary flow, wore removable palatal acrylic appliances containing enamel specimens restored with Z250 composite, Freedom composite, Fuji IX glass-ionomer cement, or Vitremer resin-modified glass-ionomer for 14 days. Volunteers dripped one drop of 20% sucrose solution (n = 10) or distilled water (control group) onto each specimen 8 times per day. Specimens were removed from the appliances and submitted to PLM for examination of the lesion area (in mm(2)), followed by dehydration, gold-sputtering, and submission to SEM and EDS. The calcium (Ca) and phosphorus (P) contents were evaluated in weight per cent (%wt). Differences were found between Z250 and Vitremer, and between Z250 and FujiIX, when analyzed using PLM. Energy-dispersive X-ray analysis results showed differences between the studied materials regarding Ca %wt. In conclusion, enamel adjacent to glass-ionomer cement presented a higher Ca %wt, but this material did not completely prevent enamel secondary caries under in situ cariogenic challenge.

Resistive-Switching Behavior in Polycrystalline CaCu3Ti4O12 Nanorods

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Adaptações em forno de microondas doméstico para utilização em laboratório

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)