Anisotropy of thermal stresses in confined dusty plasmas

Anisotropy of thermal stresses in confined dusty plasmas is considered. It is shown that in a multi-component low-temperature plasma containing electrons, ions and dust, the complicated dependence of the ion viscosity on ion temperature gradients leads to a plasma equilibrium state with anisotropic pressure. This pressure anisotropy can be of the order of the ion pressure in some limiting cases, in which the ion Larmor radius or the ion mean free path are of the order of the characteristic length of the plasma nonuniformity. For a sufficiently large dust number density, they contribute to the plasma pressure anisotropy and to its spatial dependence. Currently, it is not yet clear whether this equilibrium state is stable or not. Under these conditions, some convective plasma flows can arise in confinement devices. Therefore, this question needs special consideration.

Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

Thin silicon nitride films were prepared at 350 degrees C by inductively coupled plasma chemical vapor deposition on Si(100) substrates under different NH(3)/SiH(4) or N(2)/SiH(4) gas mixture. The chemical composition and bonding structure of the deposited films were investigated as a function of the process parameters, such as the gas flow ratio NH(3)/SiH(4) or N(2)/SiH(4) and the RF power, using X-ray photoelectron spectroscopy (XPS). The gas flow ratio was 1.4, 4.3, 7.2 or 9.5 and the RF power, 50 or 100 W. Decomposition results of Si 2p XPS spectra indicated the presence of bulk Si, under-stoichiometric nitride, stoichiometric nitride Si(3)N(4), oxynitride SiN(x)O(y), and stoichiometric oxide SiO(2), and the amounts of these compounds were strongly influenced by the two process parameters. These results were consistent with those obtained from N 1s XPS spectra. The chemical composition ratio N/Si in the film increased with increasing the gas flow ratio until the gas flow ratio reached 4.3, reflecting the high reactivity of nitrogen, and stayed almost constant for further increase in gas flow ratio, the excess nitrogen being rejected from the growing film. A considerable and unexpected incorporation of contaminant oxygen and carbon into the depositing film was observed and attributed to their high chemical reactivity. (C) 2010 Elsevier B.V. All rights reserved.

Adesão, proliferação e genotoxicidade celular de celulose bacteriana modificada por plasma

Bacterial cellulose (BC) has a wide range of potential applications, namely as temporary substitute skin in the treatment of skin wounds, such as burns, ulcers and grafts. Surface properties determine the functional response of cells, an important factor for the successful development of biomaterials. This work evaluates the influence of bacterial cellulose surface treatment by plasma (BCP) on the cellular behavior and its genotoxicity potential. The modified surface was produced by plasma discharge in N2 and O2 atmosphere, and the roughness produced by ion bombardment characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Cell adhesion, viability and proliferation on BCP were analysed using crystal violet staining and the 3-[4,5-dimethylthiazol-2-yl]-2,5-diphenyl-tetrazolium (MTT) method. Genotoxicity was evaluated using the comet and cytokinesis block micronucleus assay. The results show that the plasma treatment changed surface roughness, producing an ideal cell attachment, evidenced by more elongated cell morphology and improved proliferation. The excellent biocompatibility of BCP was confirmed by genotoxicity tests, which showed no significant DNA damage. The BCP has therefore great potential as a new artificial implant

Diagnóstico de plasma de cátodo oco: análise da ação de plasma de argônio e Ar-H2 para a deposição de filmes finos de titânio em pós-descarga

Plasma DC hollow cathode has been used for film deposition by sputtering with release of neutral atoms from the cathode. The DC Plasma Ar-H2 hollow cathode currently used in the industry has proven to be effective in cleaning surfaces and thin film deposition when compared to argon plasma. When we wish to avoid the effects of ion bombardment on the substrate discharge, it uses the post-discharge region. Were generated by discharge plasma of argon and hydrogen hollow cathode deposition of thin films of titanium on glass substrate. The optical emission spectroscopy was used for the post-discharge diagnosis. The films formed were analyzed by mechanical profilometry technique. It was observed that in the spectrum of the excitation lines of argon occurred species. There are variations in the rate of deposition of titanium on the glass substrate for different process parameters such as deposition time, distance and discharge working gases. It was noted an increase in intensity of the lines of argon compared with the lines of titanium. Deposition with argon and hydrogen in glass sample observed a higher rate deposition of titanium as more closer the sample was in the discharge

Desenvolvimento e teste de um protótipo de reator de plasma com gaiola catódica rotatória para nitretação em lote de pequenas peças

The technique of ion nitriding, despite being fully consolidated in the industry, has great limitations when applied to the treatment of small parts. This is because effects that occur due to non-uniformity of the electric field, generate localized heating in parts, damaging the uniformity of nitrided layer. In addition, because the samples are treated static parts thereof are untreated. To expand the use of plasma nitriding, this work presents the development, assembly and testing of a prototype plasma reactor with rotatory cathodic cage [patent pending], able to meet these needs, giving the material a uniform treatment and opening doors to industrial scale production. The samples tested with hexagonal nuts are 6.0 mm in diameter, made of stainless steel AISI 304 nitrided at a pressure of 1 mbar in an atmosphere of 20% H2 + 80% N2 for 1 h. After treatment, testing visual inspection, optical microscopy and microhardness were carried out to check the effectiveness of the process for uniformity and hardness of the parts. All samples exhibited uniform color, and matte brownish, unlike the untreated samples, silver color and gloss. The hardness of the surface (top and sides) was 65% and even higher than the original hardness. The nitrided layer showed great uniformity in microstructure and thickness. It is concluded, therefore, that the unit was effective constructed for the purposes for which it was designed

Effect of helium implantation on the properties of plasma polymer films

Polymer films, deposited from acetylene and argon plasma mixtures, were bombarded with 150 keV He+ ions, varying the fluence, Phi, from 10(18) to 10(21) ions/m(2). Molecular structure and optical gap of the samples were investigated by infrared and ultraviolet-visible spectroscopies, respectively. Two-point probe was employed to determine the electrical resistivity while hardness was measured by nanoindentation technique. It was verified modification of the molecular structure and composition of the films. There was loss of H and increment in the concentration of unsaturated carbon bonds with Phi. Optical gap and electrical resistivity decreased while hardness increased with Phi. Interpretation of these results is proposed in terms of chain crosslinking and unsaturation. (C) 2002 Elsevier B.V. B.V. All rights reserved.

Material processing by plasma shock wave generated in an inverse Z-pinch plasma expander

The applicability of plasma shock wave for material processing was investigated using modified inverse Z-pinch device. Shock wave expanding speed and plasma spectral analysis were studied using an internal magnetic,probe and spatially collimated light spectroscopy. The material processing capability of the device was shown by many different surface analysis techniques such as AES, IRS, EPM and SEM. The interactions between a plasma shock wave of similar to4x10(6) cm/s speed with a Si substrate surface shows some ion implantation capability using a nitrogen plasma and thin film formation using a methane plasma.

Treatment of PVC using an alternative low energy ion bombardment procedure

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Corrosion resistance enhancement of SAE 1020 steel after Chromium implantation by nitrogen ion recoil

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Surface Corrosion of Ti-16Si-4B Powder Alloy Implanted With Nitrogen by Plasma-Based Technique

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Espectrometria de emissão óptica com plasma indutivamente acoplado aliada à quimiometria na determinação de íons metálicos no molusco Mytella falcata para discriminação de estuários potiguares

This work examined the possibility of using mussel Mytella falcata as bioindicator sample to detect metal ions in several estuaries potiguares, since species substances that accumulate in their tissues due to its characteristics filter feeders have been used for environmental monitoring. The chemometrics by principal components analysis was used to reduce the size of the original data in order to establish a pattern of distribution of metal ion. Samples were collected at three different points in the estuaries Curimataú, Guaraíra-Papeba, Potengi, Galinhos-Guamaré and Piranhas-Assu having been marked with the location using GPS (Global Positioning System). The determination of humidity content and digestion of the samples were performed using methods described in the Compendium of analytical standards of the Institute Adofo Lutz (2005) and the determination of metal ions of the elements Al, Ba, Cd, Cr, Cu, Mn, Ni, Pb, Sn and Zn were performed by optical emission spectrometry with inductively coupled plasma as described by USEPA method 6010C. The results show that it is possible to use this molluscum Mytella falcata in the estuaries of Rio Grande do Norte for the determination of metal ions. The data were subjected to principal components analysis (PCA) which enabled us to verify the distribution pattern of the metal ions studied in several estuaries potiguares and group them according to the metal ions in common with and relate them to the activities in each region

Disappearance of squeezed back-to-back correlations: a new signal of hadron freeze-out from a supercooled quark gluon plasma

We briefly discuss four different possible types of transitions from quark to hadronic matter and their characteristic signatures in terms of correlations. We also highlight the effects arising from mass modification of hadrons in hot and dense hadronic matter, as well as their quantum statistical consequences: the appearance of squeezed quantum states and the associated experimental signatures, i.e., the back-to-back correlations of particle-antiparticle pairs. We briefly review the theoretical results of these squeezed quanta, generated by in-medium modified masses, starting from the first indication of the existence of surprising particle-antiparticle correlations, and ending by considering the effects of chiral dynamics on these correlation patterns. Nevertheless, a prerequisite for such a signature is the experimental verification of its observability. Therefore, the experimental observation of back-to-back correlations in high energy heavy ion reactions would be a unique signature, proving the existence of in-medium mass modification of hadronic states. on the other hand, their disappearance at some threshold centrality or collision energy would indicate that the hadron formation mechanism would have qualitatively changed: asymptotic hadrons above such a threshold are not formed from medium modified hadrons anymore, but rather by new degrees of freedom characterizing the medium. Furthermore, the disappearance of the squeezed BBC could also serve as a signature of a sudden, non-equilibrium hadronization scenario from a supercooled quark-gluon plasma phase.

XPS investigation of plasma-deposited polysiloxane films irradiated with helium ions

This work describes an XPS investigation of plasma-deposited polysiloxane films irradiated with 170 keV He+ ions at fluences, Phi, ranging from 1 x 10(14) to 1 x 10(16) cm(-2). Modifications in the atomic concentrations of the surface atoms with (D were revealed by changes in the [O]/[Si], [O]/[C] and [C]/[Si] atomic ratios. Surface chemical structure modifications were evidenced by the increasing C1s peak width and asymmetry as Phi was increased, due to the formation of ether and carboxyl functionalities. Moreover, structural transformations were indicated by the positive binding energy shift of the Si2p peaks, due to the increasing Si oxidation. Correlations of the XPS data with other results from previous work on polysiloxanes illustrate the role of ion beam-induced bond breaking on the structural modifications.

The acid-base impact of free water removal from, and addition to, plasma

Water, compared with plasma at a pH of 7.4, is a weak acid. The addition of free water to a patient should have an acidifying effect (dilutional acidosis) and the removal of it, an alkalinizing effect (concentrational alkalosis). The specific effects of free water loss or gain in a relatively complex fluid such as plasma has, to the authors' knowledge, not been reported. This information would be useful in the interpretation of the effect of changes in free water in patients. Plasma samples from goats were either evaporated in a tonometer to 80% of baseline volume or hydrated by the addition of distilled water to 120% of baseline volume. The pH and partial pressure of carbon dioxide, sodium, potassium, ionized calcium, chloride, lactate, phosphorous, albumin, and total protein concentrations were measured. Actual base excess (ABE), standard bicarbonate, anion gap, strong ion difference, strong ion gap, unmeasured anions, and the effects of sodium, chloride, phosphate, and albumin changes on ABE were calculated. Most parameters changed 20% in proportion to the magnitude of dehydration or hydration. Bicarbonate concentration, however, increased only 11% in the evaporation trial and decreased only -2% in the dehydration trial. The evaporation trial was associated with a mild, but significant, metabolic alkalotic effect (ABE increased 3.2 mM/L), whereas the hydration trial was associated with a slight, insignificant metabolic acidotic effect (ABE decreased only 0.6 mM/L). The calculated free water ABE effect (change in sodium concentration) was offset by opposite changes in calculated chloride, lactate, phosphate, and albumin ABE effects.

Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

This work illustrates the advantages of using p-polarized radiation at an incidence angle of 70 degrees in contrast to the conventional unpolarized beam at normal (or near-normal) incidence for the infrared spectroscopic study of polycarbosilane, polysilazane and polysiloxane thin films synthesized by plasma enhanced chemical vapor deposition (PECVD) and subsequently irradiated with 170 keV He+ ions at fluences from 1 x 10(14) to 1 x 10(16) cm(-2). Several bands not seen using the conventional mode could be observed in the polarized mode. (c) 2006 Elsevier B.V. All rights reserved.