Preliminary study on the photoproduction of hydroxyl radicals in aqueous solution with Aldrich humic acid, algae and Fe(III) under high-pressure mercury lamp irradiation

Under a high-pressure mercury lamp (HPML) and using an exposure time of 4 h, the photoproduction of hydroxyl radicals ((OH)-O-.) could be induced in an aqueous solution containing humic acid (HA). Hydroxyl radicals were determined by high-performance liquid chromatography using benzene as a probe. The results showed that (OH)-O-. photoproduction increased from 1.80 to 2.74 muM by increasing the HA concentration from 10 to 40 mg L-1 at an exposure time of 4 h (pH 6.5). Hydroxyl radical photoproduction in aqueous solutions of HA containing algae was greater than that in the aqueous solutions of HA without algae. The photoproduction of (OH)-O-. in the HA solution with Fe(111) was greater than that of the solution without Fe(III) at pH ranging from 4.0 to 8.0. The photoproduction of (OH)-O-. in HA solution with algae with or without Fe(111) under a 250 W HPML was greater than that under a 125 W HPML. The photoproduction of (OH)-O-. in irradiated samples was influenced by the pH. The results showed that HPML exposure for 4 h in the 4-8 pH range led to the highest (OH)-O-. photoproduction at pH 4.0.

Taxonomic studies of parasitic nyctotherans from chinese Anura amphibians III. Wichtermania

Wu-Han Xiao, Jian-Guo Wang and Lian-Xiang Li (2002) Taxonomic studies of parasitic nyctotherans from Chinese Anura amphibians III. Wichtermania. Zoological Studies 41(1): 69-76. This paper describes 6 new species belonging to the genus Wichtermania from Anura amphibians distributed in southern China. The 6 species are Wichtermania multigranularis sp. nov., W. oviformis sp. nov., W vesiformis sp. nov., W. reticulatis sp. nov., W granuliformis sp. nov., and W obliquoides sp. nov. The characteristics for diagnosis of the 6 new species are described in this paper.

LSIS-III VLSI CAD 系统集成的研究

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气态源分子束外延III-V族可见光半导体材料及其性质研究

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III-V半导体低维结构材料分子束外延生长及其性质的研究

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III-V族可见光半导体材料生长及其性质研究

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III-V族和碳杂质对硅中热施主的影响

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III-V族半导体的喇曼散射研究

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六角III-V氮化物量子阱的电子结构和光学性质

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III-V族半导体低维结构材料的平面光学各向异性

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III－V族氮化物的生长及其光学性质

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III族氮化物材料的性质研究

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III-V族半导体低维结构与新型合金材料的光学性质

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III 族氮化物结构与光学性质的研究

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III-V-N 半导体材料光学性质的研究

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