Enhanced performance of p-GaN by Mg delta doping

The electrical and structural properties of Mg delta-doped GaN epilayers grown by MOCVD were investigated. Compared to uniform Mg-doping GaN layers, it has been shown that the delta-doping (delta-doping) process could suppress the dislocation density and enhance the p-type performance. The influence of pre-purge step on the structural properties of GaN was also investigated. The hole concentration of p-GaN decreases when using a pre-purge step. These results can be explained convincingly using a simple model of impurity incorporation under Ga-free growth condition. (C) 2007 Elsevier B.V. All rights reserved.

Bioactivity of Mg-ion-implanted zirconia and titanium

Titanium and zirconia are bioinert materials lacking bioactivity. In this work, surface modification of the two typical biomaterials is conducted by Mg-ion-implantation using a MEVVA ion source in an attempt to increase their bioactivity. Mg ions were implanted into zirconia and titanium with fluences ranging from 1 x 10(17) to 3 x 10(17) ions/cm(2) at 40 keV. The Mg-implanted samples, as well as control (unimplanted) samples, were immersed in SBF for 7 days and then removed to identify the presence of calcium and phosphate (Ca-P) coatings and to characterize their morphology and structure by SEM, XRD, and FT-IR. SEM observations confirm that globular aggregates are formed on the surfaces of the Mg-implanted zirconia and titanium while no precipitates are observed on the control samples. XRD and FT-IR analyses reveal that the deposits are carbonated hydroxyapatite (HAp). Our experimental results demonstrate that Mg-implantation improves the bioactivity of zirconia and titanium. Further, it is found that the degree of bioactivity is adjustable by the ion dose. Mechanisms are proposed to interpret the improvement of bioactivity as a result of Mg implantation and the difference in bioactivity between zirconia and titanium. (c) 2006 Elsevier B.V. All rights reserved.

Growth and annealing study of Mg-doped AlGaN and GaN/AlGaN superlattices

Mg-doped AlGaN and GaN/AlGaN superlattice are grown by metalorganic chemical vapour deposition (MOCVD). Rapid thermal annealing (RTA) treatments are carried out on the samples. Hall and high resolution x-ray diffraction measurements are used to characterize the electrical and structural prosperities of the as-grown and annealed samples, respectively. The results of hall measurements show that after annealing, the Mg-doped AlGaN sample can not obtain the distinct hole concentration and can acquire a resistivity of 1.4 x 10(3) Omega cm. However, with the same annealing treatment, the GaN/AlGaN superlattice sample has a hole concentration of 1.7 x 10(17) cm(-3) and of Mg acceptors, which leads to higher hole concentration and lower p-type resistivity.

Study on Mg memory effect in npn type AlGaN/GaN HBT structures grown by MOCVD

AlGaN/GaN npn heterojunction bipolar transistor structures were grown by low-pressure MOCVD. Secondary ion mass spectroscopy (SIMS) measurements were carried out to study the Mg memory effect and redistribution in the emitter-base junction. The results indicated that there is a Mg-rich film formed in the ongrowing layer after the Cp2Mg source is switched off. The Mg-rich film can be confined in the base section by switching off the Cp2Mg source for appropriate time before the end of base growth. Low temperature growth of the undoped GaN spacer suppresses the Mg redistribution from Mg rich film. The delay rate of the Mg profile in sample C with spacer growing in low temperature is about 56 nm/decade, which becomes sharper than 80 nm/decade of the samples A and B without low temperature spacer. (C) 2005 Elsevier Ltd. All rights reserved.

Synthesis and temperature-dependent near-band-edge emission of chain-like Mg-doped ZnO nanoparticles

Chain-like Mg-doped ZnO nanoparticles were prepared using a wet chemical method combined with subsequent heat treatment. The blueshifted near-band-edge emission of the doped ZnO sample with respect to the undoped one was investigated by temperature-dependent photoluminescence. Based on the energy shift of the free-exciton transition, a band gap enlargement of similar to 83 meV was estimated, which seems to result in the equivalent shift of the bound-exciton transition. At 50 K, the transformation from the donor-acceptor-pair to free-to-acceptor emissions was observed for both the undoped and doped samples. The results show that Mg doping leads to the decrease of the acceptor binding energy. (c) 2006 American Institute of Physics.

Photoluminescence of Mg-doped GaN grown by metalorganic chemical vapor deposition

Two Mg-doped GaN films with different doping concentrations were grown by a metalorganic chemical vapor deposition technique. Photoluminescence (PL) experiments were carried out to investigate the optical properties of these films. For highly Mg-doped GaN, the PL spectra at 10 K are composed of a blue luminescence (BL) band at 2.857 eV and two excitonic luminescence lines at 3.342 eV and 3.282 eV, in addition to a L2 phonon replica at 3.212 eV. The intensity of the L1 line decreases monotonously with an increase,in temperature. However, the intensity of the L2 line first slowly increases at first, and then decreases quickly with an increase in temperature. The two lines are attributed to bound excitonic emissions at extended defects. The BL band is most likely due to the transition from deep donor Mg-V-N complex to Mg shallow acceptor. From the temperature dependence of the luminescence peak intensity of the BL band, the activation energy of acceptor Mg was found to be 290 meV. (C) 2003 American Vacuum Society.

Photoluminescence and capacitance transients in highly Mg-doped GaN

Behaviors of the photoluminescence blue-band and near-bandgap peak and the relevant thermal ionization energies of the shallow and deep Mg-related acceptors have been studied, respectively. The 2.989 eV blue-band is attributed to the deep donor-acceptor-pair transitions involving a deep Mg-related acceptor at E-v+0.427 eV. The blueshift with increasing excitation power is explained by variation in the contribution of close and distant donor-acceptor-pairs to the luminescence. The redshift with increasing temperature results from thermal release of carriers from close donor-acceptor-pairs. The 3.26 eV near-bandgap peak is attributed to the shallow donor-acceptor-pair transitions involving a shallow Mg-related acceptor at E-v+0.223 eV. The relevant thermal ionization energies of the shallow and deep Mg-related acceptors, being about E-v+0.16 and E-v+0.50eV, are determined from deep-level transient Fourier spectroscopy measurements.

Photoluminescence of rapid-thermal annealed Mg-doped GaN films

We report the investigation of temperature and excitation power dependence in photoluminescence spectroscopy measured in Mg-doped GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition, The objective is to examine the effects of rapid-thermal annealing on Mg-related emissions. It is observed that the peak position of the 2.7-2.8 eV emission line is a function of the device temperature and annealing conditions, The phenomenon is attributed to Coulomb-potential fluctuations in the conduction and valence band edge and impurity levels due to the Mg-related complex dissociation. The blue shift of the 2.7-2.8 eV emission line with increasing excitation power provides clear evidence that a donor-acceptor recombination process underlies the observed emission spectrum. In addition, quenching of minor peaks at 3.2 and 3.3 eV are observed and their possible origin is discussed. (C) 2001 Elsevier Science Ltd. All rights reserved.

Room-temperature optical transitions in Mg-doped cubic GaN/GaAs(100) grown by metalorganic chemical vapor deposition

The mechanism of room-temperature optical transitions in a Mg-doped cubic GaN epilayer grown on GaAs(100) by metalorganic chemical vapor deposition has been investigated. By examining the dependence of photoluminescence on the excitation intensity (which varied over four orders) at room temperature, four different emissions with different origins were identified. A blue emission at similar to 3.037 eV was associated with a shallow Mg acceptor, while three different lower-energy emissions at similar to 2.895, similar to 2.716, and similar to 2.639 eV were associated with a deep Mg complex. In addition to a shallow acceptor at E congruent to 0.213 eV, three Mg-related deep defect levels were also found at around 215, 374, and 570 meV (from the conduction band). (C) 2000 American Institute of Physics. [S0021-8979(00)01904-6].

Effect of thermal annealing on hole trap levels in Mg-doped GaN grown by metalorganic vapor phase epitaxy

Deep trap levels in a Mg-doped GaN grown by metalorganic vapor phase epitaxy are studied with deep level transient spectroscopy (DLTS). The Mg concentration of the sample was 4.8 x 10(19) cm(-3), but the hole concentration was as low as 1.3x10(17) cm-3 at room temperature. The DLTS spectrum has a dominant peak D-1 with an activation energy of 0.41+/-0.05 eV, accompanied by two additional peaks with activation energies of 0.49+/-0.09 eV (D-2) and 0.59+/-0.05 eV (D-3). It was found that the dominant peak D-1 consists of five peaks, each of which has different activation energy and capture cross section. In order to investigate these deep levels further, we performed heat treatment on the same samples to observe the variations of activation energy, capture cross section, and amplitude of DLTS signals. It was found that the longer the heat treatment duration is, the lower the amplitude of DLTS peaks become. This suggests that the decrease of the DLTS signal originates from hydrogen atom outgoing from the film during the annealing process. The possible originality of multiple trap levels was discussed in terms of the Mg-N-H complex. (C) 2000 American Vacuum Society. [S0734-2101(00)01701-2].

Pulsed excimer laser annealing of Mg-doped cubic GaN

A KrF (248 nm) excimer laser with a 38 ns pulse width was used to study pulsed laser annealing (PLA) on Mg-doped cubic GaN alms. The laser-induced changes were monitored by photoluminescence (PL) measurement. It indicated that deep levels in as-grown cubic GaN : Mg films were neutralized by H and PLA treatment could break Mg-H-N complex. The evolution of emissions around 426 and 468 nm with different PLA conditions reflected the different activation of the involved deep levels. Rapid thermal annealing (RTA) in N-2 atmosphere reverts the luminescence of laser annealed samples to that of the pre-annealing state. The reason is that most H atoms still remained in the epilayers after PLA due to the short duration of the pulses and reoccupied the original locations during RTA. (C) 2000 Elsevier Science B.V. All rights reserved. PACS: 61.72.Vv; 61.72.Cc; 18.55. -m.

Hole trap levels in Mg-doped GaN grown by metalorganic vapor phase epitaxy

Hole trap levels in a Mg-doped GaN grown by metalorganic vapor phase epitaxy (MOVPE) are studied with deep level transient spectroscopy (DLTS). The Mg concentration of the sample was 4.8 x 10(19) cm(-3), but the hole concentration was as low as 1.3 x 10(17) cm(-3) at room temperature. The DLTS spectrum has a dominant peak D-1 with activation energy of 0.41+/-0.05 eV, accompanied by two additional peaks with activation energies of 0.49+/-0.09 eV (D-2) and 0.59+/-0.05 eV (D-3). It was found that the dominant peak D-1 consists of five peaks, each of which has different activation energy and capture cross section. A relevant model for these levels is presented in relation to the Mg-N-H complexes. (C) 1998 American Institute of Physics. [S0003-6951(98)04340-X].

耐热Mg-Gd基合金的研究和应用

本研究从二元Mg-Gd体系出发，研究了添加不同稀土元素对Mg-Gd基合金的组织、时效行为和力学性能的影响。优化出多种力学性能优异、加工性能良好和耐热性突出的新型Mg-Gd-RE-Zn-Zr系合金。在探讨Mg-Gd基合金强化机理的同时，提出了强化模型，并进行了定量分析。 在Mg-Gd二元体系中，通过对不同Gd含量的合金组织，时效行为和力学性能的研究，发现Gd不仅可以细化晶粒，还可以细化枝晶。合金中Gd的含量大于8 wt.%开始表现出时效硬化现象，Gd含量超过12wt.％时效硬化效果显著。在二元体系研究结果的基础上，选用Mg-8Gd基合金，研究了不同轻稀土元素LRE(La, Ce和Nd)和重稀土元素HRE (Y, Dy, Ho 和Er)对合金组织和性能的影响。结果表明，轻稀土中Nd的作用效果最好，其次为Ce和La。重稀土中Y和Dy的作用效果较好，其次为Ho和Er。将轻、重稀土综合考虑，在Mg-8Gd-3RE(Nd+Y)-Zr合金中，变化Nd和Y的添加量，发现Nd和Y的添加量分别为1 和2或2和1时，能够明显改善合金的综合力学性能。 研究了Mg-8Gd-2Y-1Nd-0.3Zn和Mg-8Gd-1Dy-0.3Zn压铸合金的组织和性能。研究表明，两种合金的铸造性能好，而且具有优异的抗拉性能和蠕变性能，可以满足在250℃~275℃环境下使用。进一步研究了挤压变形Mg-8Gd-2Y-1Nd-0.3Zn合金。合金成形性能好，抗拉强度和伸长率明显提高，而且改善了合金的高温抗蠕变性能，比压铸合金提高了近一个数量级。 发明了一种新型的分步固溶处理方法——振荡热处理方法，这种方法比传统的T6热处理方法更加有效，振荡热处理的主要作用是改变了凝固过程中析出相的尺寸和分布。 研究了Mg-Gd基合金凝固过程中的相析出和相转变。在合金的凝固过程中，容易生成块状的化学组成为Mg5RE（fcc结构）的共晶相；加入Zn后，凝固中容易出现片状的Mg3RE（14H型）沉淀；时效强化的主要原因是在过饱和固溶体时效过程中析出针状的50 nm~100 nm的Mg15RE3相，它与基体具有半共格的位相关系，能够有效阻止位错滑移。但随着时效时间的延长，针状析出相长大，共格关系被破坏，导致强化作用降低。而对于压铸和挤压变形合金，合金析出相的种类不变，主要的不同是挤压变形合金析出化合物的分布更加均匀，尺寸更小。 开发了高强度耐热Mg-12Gd-4Y-2Nd-0.4Zn-0.6Zr合金，这种合金经过热处理后，力学性能优良，热稳定性突出。在300 ℃的抗拉强度约为300 MPa，400 ℃的抗拉强度在100 MPa以上。本合金流动性能良好，适合于砂型铸造，在具有高温、高强度要求的镁合金制品方面极具潜力。 从金属材料强化原理出发，建立了Mg-Gd基合金的强化模型，并进行了定量分析。结果表明，析出强化是Mg-Gd基合金的主要强化方式，但实际试验值和理论值略有偏差，分析认为主要是由于β'相体积分数的变化区间较宽，且合金制备过程中不可避免地产生一些微观缺陷所致。 采用新型合金制备出了一些工业用品部件，探索了该类合金在机械、汽车和高技术等工业领域中的潜在应用

Mg-Al-Mn-RE系合金组织与性能研究

利用金属型铸造制备了Mg-5Al-0.3Mn-xRE (x = 0~4, wt%，RE = Ce, Nd, Sm, Y和(CeLa)混合稀土)系列合金，研究了铸态合金的组织和力学性能。利用轧制和挤压技术对优化出的合金进行了变形加工处理，并研究了合金加工后的组织和力学性能。 对于铸态合金，稀土元素不仅可以细化合金的晶粒，而且形成不同类型的Al-RE化合物，含Ce的合金中生成Al11Ce3相，含Nd或Sm的合金中，主要生成Al11Nd3 (Al11Sm3)相和少量的Al2Nd (Al2Sm)相，含Y的合金中生成Al2Y相。另外，添加稀土可以改变Mg17Al12相的形貌，使其变得更加细小、弥散。添加适量的稀土可以明显提高铸态合金在室温和150℃下的力学性能，Mg-5Al-0.3Mn-1.5Ce, Mg-5Al-0.3Mn-2Nd和Mg-5Al-0.3Mn-2Sm合金在各自的体系中具有最佳的综合力学性能。合金力学性能提高的主要原因是细晶强化、Al-RE化合物第二相强化以及减弱Mg17Al12相对合金高温力学性能的不利影响。 对Mg-5Al-0.3Mn-(1.0, 1.5, 2.0)Ce，Mg-5Al-0.3Mn-2Nd，Mg-5Al-0.3Mn-1.5(CeLa)和Mg-5Al-0.3Mn-3Y合金在300-400℃下进行了热轧制或挤压变形，与铸态合金相比，轧制和挤压合金具有更高的力学性能。轧制合金的室温抗拉强度为290-340 MPa，较铸态合金提高约50％，屈服强度约为210-260 MPa，较铸态合金提高约2倍。挤压态合金的抗拉强度为260-270 MPa，屈服强度为160-190MPa，伸长率为20-22％；150℃的力学性能也得到了明显改善。 结合热力学计算、合金化元素之间的电负性差、化合物相的生成焓数据以及相图计算，阐述了稀土化合物相的生成机制，稀土元素与Al元素之间的电负性差大于其与Mg之间的电负性差，且Al-RE相的生成焓远低于Mg-RE和Mg-Al相的生成焓，因此在Mg-Al合金中加入RE后，RE优先与Al形成Al-RE化合物。从晶粒细化、化合物强化相的生成和演变、变形加工处理的位错交互作用等方面讨论了合金的强化机制，认为细晶强化、第二相强化及形变强化是提高合金力学性能的主要机制。

新型绿色荧光体ABLa(PO_4)_2:Ce, Tb研究(A = K, Na; B = Mg, Zn)

本工作完成了磷酸盐化合物ABLa(PO_4)_2的合成，这些磷盐均可在900 ℃左右合成；对其进行了结构测试与表征，发现这些磷酸盐属于单斜晶系独居石结构，与LaPO_4同构，具有很相近的晶胞参数；系统地研究了RE~(3+)离子(RE = Ce,Tb,Dy)在ABLa(PO_4)_2基质中的发光与能量传递规律，研究了Ce~(3+)、Tb~(3+)离子发光中心与基质晶格之间的相互作用，计算了这些稀土离子之间能量传递的临界距离Rc(dd)，结果表明ABLa(PO_4)_2基质中Ce~(3+)离子与基质晶格之间的相互作用属于中等程度耦合，Tb~(3+)离子与基质晶格之间的相互作用属于无辐射多声子过程，Ce~(3+)→Ce~(3+)、Ce~(3+)→Tb~(3+)能量迁移临界距离均与LaPO_4中相近，Ce~(3+) → Ce~(3+)相对于Ce~(3+) → Tb~(3+)属于快过程，Ce~(3+) → Ce~(3+)能量传递对ABLa(PO_4)_2:Ce,Tb荧光体的Tb~(3+)绿色发光起了重要的作用，ABLa(PO_4)_2基质是Ce~(3+)，Ce~(3+)-Tb~(3+)，Ce~(3+)-Dy~(3+)的优良发光基质；最后探讨了绿色荧光体ABLa(PO_4)_2:Ce，Tb的调制途径，主要研究了Ce~(3+)、Tb~(3+)离子的浓度效应，掺杂B_2O_3、Dy~(3+)、SiO_2对荧光体发光的影响及NH_4Cl的作用，结果表明Ce~(3+)、Tb~(3+)离子的适宜浓度分别为0.2～0.5和0.08～0.2，掺杂适量的B_2O_3、Dy~(3+)能很好地提高荧光体的发光，掺杂SiO_2、NH_4Cl不利荧光体发光。