Photoluminescence of rapid-thermal annealed Mg-doped GaN films


Autoria(s): Wang LS; Fong WK; Surya C; Cheah KW; Zheng WH; Wang ZG
Data(s)

2001

Resumo

We report the investigation of temperature and excitation power dependence in photoluminescence spectroscopy measured in Mg-doped GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition, The objective is to examine the effects of rapid-thermal annealing on Mg-related emissions. It is observed that the peak position of the 2.7-2.8 eV emission line is a function of the device temperature and annealing conditions, The phenomenon is attributed to Coulomb-potential fluctuations in the conduction and valence band edge and impurity levels due to the Mg-related complex dissociation. The blue shift of the 2.7-2.8 eV emission line with increasing excitation power provides clear evidence that a donor-acceptor recombination process underlies the observed emission spectrum. In addition, quenching of minor peaks at 3.2 and 3.3 eV are observed and their possible origin is discussed. (C) 2001 Elsevier Science Ltd. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12104

http://www.irgrid.ac.cn/handle/1471x/65022

Idioma(s)

英语

Fonte

Wang LS; Fong WK; Surya C; Cheah KW; Zheng WH; Wang ZG .Photoluminescence of rapid-thermal annealed Mg-doped GaN films ,SOLID-STATE ELECTRONICS,2001 ,45(7):1153-1157

Palavras-Chave #半导体物理 #p-type GaN #metalorganic chemical vapor deposition #photoluminescence #X-ray diffraction #rapid-thermal annealing #P-TYPE GAN #RECOMBINATION #EMISSION #ENERGY #BANDS
Tipo

期刊论文